DE69129955D1 - Photolackzusammensetzung - Google Patents

Photolackzusammensetzung

Info

Publication number
DE69129955D1
DE69129955D1 DE69129955T DE69129955T DE69129955D1 DE 69129955 D1 DE69129955 D1 DE 69129955D1 DE 69129955 T DE69129955 T DE 69129955T DE 69129955 T DE69129955 T DE 69129955T DE 69129955 D1 DE69129955 D1 DE 69129955D1
Authority
DE
Germany
Prior art keywords
photoresist composition
photoresist
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69129955T
Other languages
English (en)
Other versions
DE69129955T2 (de
Inventor
Mineo Nishi
Koji Nakano
Tadashi Kusumoto
Keisuke Nakano
Yoshihiro Takada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm and Haas Electronic Materials LLC
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Application granted granted Critical
Publication of DE69129955D1 publication Critical patent/DE69129955D1/de
Publication of DE69129955T2 publication Critical patent/DE69129955T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
DE69129955T 1990-05-02 1991-04-30 Photolackzusammensetzung Expired - Fee Related DE69129955T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP11647690 1990-05-02
JP18381490 1990-07-11
JP22895090 1990-08-30

Publications (2)

Publication Number Publication Date
DE69129955D1 true DE69129955D1 (de) 1998-09-17
DE69129955T2 DE69129955T2 (de) 1998-12-24

Family

ID=27313159

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69129955T Expired - Fee Related DE69129955T2 (de) 1990-05-02 1991-04-30 Photolackzusammensetzung

Country Status (4)

Country Link
US (1) US5279918A (de)
EP (1) EP0455228B1 (de)
KR (1) KR100242148B1 (de)
DE (1) DE69129955T2 (de)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5753406A (en) * 1988-10-18 1998-05-19 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition
JP3064595B2 (ja) * 1991-04-26 2000-07-12 住友化学工業株式会社 ポジ型レジスト組成物
US5372909A (en) * 1991-09-24 1994-12-13 Mitsubishi Kasei Corporation Photosensitive resin composition comprising an alkali-soluble resin made from a phenolic compound and at least 2 different aldehydes
JP3466218B2 (ja) * 1992-06-04 2003-11-10 住友化学工業株式会社 ポジ型レジスト組成物
JPH06204162A (ja) * 1992-12-28 1994-07-22 Mitsubishi Electric Corp 半導体装置の製造方法および該方法に用いられるレジスト組成物
JP3010963B2 (ja) * 1993-02-17 2000-02-21 信越化学工業株式会社 レジスト組成物
KR100305333B1 (ko) * 1993-10-28 2001-11-22 마티네즈 길러모 감광성수지조성물및이를사용한패턴의형성방법
EP0660186A1 (de) * 1993-12-20 1995-06-28 Mitsubishi Chemical Corporation Lichtempfindliche Harzzusammensetzung und Verfahren zur Bildherstellung damit
DE69519153T2 (de) * 1994-12-27 2001-05-10 Mitsubishi Chem Corp Fotoempfindliche Harzzusammensetzung und Verfahren zum Herstellen von Fotoresistmustern, das dieselbe benutzt
US5529880A (en) * 1995-03-29 1996-06-25 Shipley Company, L.L.C. Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide compound
US5589553A (en) * 1995-03-29 1996-12-31 Shipley Company, L.L.C. Esterification product of aromatic novolak resin with quinone diazide sulfonyl group
EP0737895B1 (de) * 1995-04-10 1999-09-08 Shipley Company LLC Gemische von photoaktiven Zusammensetzungen enthaltendes Fotoresist
RU2153986C2 (ru) 1996-04-23 2000-08-10 Хорселл Грэфик Индастриз Лимитед Термочувствительная композиция и способ ее применения для изготовления литографической печатной формы
JP3287234B2 (ja) * 1996-09-19 2002-06-04 信越化学工業株式会社 リフトオフ法用ポジ型レジスト組成物及びパターン形成方法
US5705308A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element
US5705322A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Method of providing an image using a negative-working infrared photosensitive element
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US5858626A (en) 1996-09-30 1999-01-12 Kodak Polychrome Graphics Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
WO1999001796A2 (en) 1997-07-05 1999-01-14 Kodak Polychrome Graphics Llc Pattern-forming methods
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
KR100573560B1 (ko) * 1997-10-30 2006-08-30 가오가부시끼가이샤 레지스트용현상액
TWI221946B (en) 1999-01-07 2004-10-11 Kao Corp Resist developer
JP3705332B2 (ja) * 1999-01-11 2005-10-12 信越化学工業株式会社 感光性樹脂組成物及びその製造方法
JP4068253B2 (ja) * 1999-01-27 2008-03-26 Ａｚエレクトロニックマテリアルズ株式会社 ポジ型感光性樹脂組成物
US6545797B2 (en) 2001-06-11 2003-04-08 Sipix Imaging, Inc. Process for imagewise opening and filling color display components and color displays manufactured thereof
US20040192876A1 (en) * 2002-11-18 2004-09-30 Nigel Hacker Novolac polymer planarization films with high temparature stability
US6905809B2 (en) 2003-04-01 2005-06-14 Clariant Finance (Bvi) Limited Photoresist compositions
US6790582B1 (en) * 2003-04-01 2004-09-14 Clariant Finance Bvi Limited Photoresist compositions
KR101020164B1 (ko) * 2003-07-17 2011-03-08 허니웰 인터내셔날 인코포레이티드 진보된 마이크로전자적 응용을 위한 평탄화 막, 및 이를제조하기 위한 장치 및 방법
DE102004063416A1 (de) * 2004-12-23 2006-07-06 Az Electronic Materials (Germany) Gmbh Verfahren zur Herstellung einer Photoresistlösung
WO2012063635A1 (ja) * 2010-11-10 2012-05-18 Dic株式会社 ポジ型フォトレジスト組成物
IT201900022233A1 (it) 2019-11-27 2021-05-27 Epta Inks S P A Inchiostro fotosensibile e embossabile

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE506677A (de) * 1950-10-31
US3635709A (en) * 1966-12-15 1972-01-18 Polychrome Corp Light-sensitive lithographic plate
US4308368A (en) * 1979-03-16 1981-12-29 Daicel Chemical Industries Ltd. Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide
JPS561045A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS561044A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
EP0054258B1 (de) * 1980-12-17 1986-03-05 Konica Corporation Lichtempfindliche Zusammensetzungen
DE3100077A1 (de) * 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
US4350753A (en) * 1981-06-15 1982-09-21 Polychrome Corporation Positive acting composition yielding pre-development high visibility image after radiation exposure comprising radiation sensitive diazo oxide and haloalkyl-s-triazine with novolak and dyestuff
JPS58134631A (ja) * 1982-01-08 1983-08-10 Konishiroku Photo Ind Co Ltd 感光性組成物
US4460644A (en) * 1982-12-27 1984-07-17 Beecham Inc. Polyurethane foam impregnated with or coated with fabric conditioning agent, anti-microbial agent and anti-discolorant
JPS59148784A (ja) * 1983-02-10 1984-08-25 Konishiroku Photo Ind Co Ltd ５―置換―２―ハロメチル―１，３，４―オキサジアゾール化合物及び該化合物を含有する光反応開始剤
JPS61185741A (ja) * 1985-02-13 1986-08-19 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
JPS61205933A (ja) * 1985-03-08 1986-09-12 Konishiroku Photo Ind Co Ltd 感光性平版印刷版
JPS6210646A (ja) * 1985-07-09 1987-01-19 Kanto Kagaku Kk ポジ型フオトレジスト組成物
JPH0719049B2 (ja) * 1985-12-04 1995-03-06 コニカ株式会社 感光性平版印刷版材料
EP0227487B1 (de) * 1985-12-27 1992-07-15 Japan Synthetic Rubber Co., Ltd. Strahlungsempfindliche positiv arbeitende Kunststoffzusammensetzung
JPS6443045A (en) * 1987-08-10 1989-02-15 Shibaura Eng Works Ltd Motor
EP0403580B1 (de) * 1988-08-10 1997-01-08 Hoechst Celanese Corporation Lichtempfindliche novolak-harze
JP2623778B2 (ja) * 1988-10-18 1997-06-25 日本合成ゴム株式会社 感放射線性樹脂組成物

Also Published As

Publication number Publication date
KR910020495A (ko) 1991-12-20
EP0455228A1 (de) 1991-11-06
DE69129955T2 (de) 1998-12-24
KR100242148B1 (ko) 2000-02-01
US5279918A (en) 1994-01-18
EP0455228B1 (de) 1998-08-12

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: SHIPLEY COMPANY, L.L.C., MARLBOROUGH, MASS., US

8339 Ceased/non-payment of the annual fee