DE69130265T2 - Positive arbeitende Photolackzusammensetzung - Google Patents

Positive arbeitende Photolackzusammensetzung

Info

Publication number
DE69130265T2
DE69130265T2 DE1991630265 DE69130265T DE69130265T2 DE 69130265 T2 DE69130265 T2 DE 69130265T2 DE 1991630265 DE1991630265 DE 1991630265 DE 69130265 T DE69130265 T DE 69130265T DE 69130265 T2 DE69130265 T2 DE 69130265T2
Authority
DE
Germany
Prior art keywords
photoresist composition
positive working
working photoresist
positive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE1991630265
Other languages
English (en)
Other versions
DE69130265D1 (de
Inventor
Yasumasa Kawabe
Fumiyuki Nishiyama
Shiro Tan
Reiko Kuboyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE69130265D1 publication Critical patent/DE69130265D1/de
Publication of DE69130265T2 publication Critical patent/DE69130265T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
DE1991630265 1990-02-20 1991-02-19 Positive arbeitende Photolackzusammensetzung Expired - Fee Related DE69130265T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3929990A JPH03242650A (ja) 1990-02-20 1990-02-20 ポジ型フオトレジスト組成物

Publications (2)

Publication Number Publication Date
DE69130265D1 DE69130265D1 (de) 1998-11-05
DE69130265T2 true DE69130265T2 (de) 1999-05-12

Family

ID=12549253

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1991630265 Expired - Fee Related DE69130265T2 (de) 1990-02-20 1991-02-19 Positive arbeitende Photolackzusammensetzung

Country Status (3)

Country Link
EP (1) EP0443533B1 (de)
JP (1) JPH03242650A (de)
DE (1) DE69130265T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5305269A (en) 1991-05-31 1994-04-19 Thunderbird Technologies, Inc. Differential latching inverter and random access memory using same
JPH0643636A (ja) * 1992-07-22 1994-02-18 Fuji Photo Film Co Ltd 感光性平版印刷版
EP0644460B1 (de) * 1993-09-20 1999-12-08 Fuji Photo Film Co., Ltd. Positiv arbeitende Photoresistzusammensetzung
DE69604114T2 (de) * 1995-04-10 2000-03-02 Shipley Co Gemische von photoaktiven Zusammensetzungen enthaltendes Fotoresist
US6905809B2 (en) 2003-04-01 2005-06-14 Clariant Finance (Bvi) Limited Photoresist compositions
US6790582B1 (en) 2003-04-01 2004-09-14 Clariant Finance Bvi Limited Photoresist compositions
PL1748767T3 (pl) 2004-05-28 2012-08-31 Unigen Inc 1-(3-metylo-2,4-dimetoksyfenylo)-3-(2',4'-dihydroksyfenylo)-propan jako silny inhibitor tyrozynazy
JP2011528719A (ja) * 2008-07-21 2011-11-24 ユニジェン・インコーポレーテッド スキンホワイトニング（色を薄くする）化合物系列
KR102113823B1 (ko) 2011-03-24 2020-05-21 유니젠, 인크. 디아릴프로판의 제조를 위한 화합물 및 방법

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5562444A (en) * 1978-11-02 1980-05-10 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS61118744A (ja) * 1984-11-15 1986-06-06 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
JPH0648382B2 (ja) * 1986-05-29 1994-06-22 日本合成ゴム株式会社 半導体デバイス製造用ポジ型感放射線性樹脂組成物
JPS63161449A (ja) * 1986-12-24 1988-07-05 Sumitomo Chem Co Ltd 高コントラストなフオトレジスト組成物
JPS63178228A (ja) * 1987-01-20 1988-07-22 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
DE3727443A1 (de) * 1987-08-18 1989-03-02 Hoechst Ag Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden und hiermit hergestelltes kopiermaterial
JP2552891B2 (ja) * 1988-01-26 1996-11-13 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JPH02205850A (ja) * 1989-02-04 1990-08-15 Tosoh Corp ポジ型フォトレジスト組成物

Also Published As

Publication number Publication date
EP0443533A2 (de) 1991-08-28
JPH03242650A (ja) 1991-10-29
EP0443533A3 (en) 1991-12-11
DE69130265D1 (de) 1998-11-05
EP0443533B1 (de) 1998-09-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee