DE69028476D1 - Positive arbeitende Fotolackzusammensetzungen - Google Patents
Positive arbeitende FotolackzusammensetzungenInfo
- Publication number
- DE69028476D1 DE69028476D1 DE69028476T DE69028476T DE69028476D1 DE 69028476 D1 DE69028476 D1 DE 69028476D1 DE 69028476 T DE69028476 T DE 69028476T DE 69028476 T DE69028476 T DE 69028476T DE 69028476 D1 DE69028476 D1 DE 69028476D1
- Authority
- DE
- Germany
- Prior art keywords
- photoresist compositions
- positive working
- working photoresist
- positive
- compositions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB898923459A GB8923459D0 (en) | 1989-10-18 | 1989-10-18 | Positive-acting photoresist compositions |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69028476D1 true DE69028476D1 (de) | 1996-10-17 |
DE69028476T2 DE69028476T2 (de) | 1997-03-13 |
Family
ID=10664768
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1990628476 Expired - Fee Related DE69028476T2 (de) | 1989-10-18 | 1990-10-17 | Positive arbeitende Fotolackzusammensetzungen |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0424124B1 (de) |
JP (1) | JPH03167249A (de) |
DE (1) | DE69028476T2 (de) |
GB (1) | GB8923459D0 (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2599007B2 (ja) * | 1989-11-13 | 1997-04-09 | 富士写真フイルム株式会社 | ポジ型感光性組成物 |
JPH0480758A (ja) * | 1990-07-23 | 1992-03-13 | Fuji Photo Film Co Ltd | 感光性組成物 |
DE59107712D1 (de) * | 1990-09-13 | 1996-05-30 | Ocg Microelectronic Materials | Säurelabile Lösungsinhibitoren und darauf basierende positiv und negativ arbeitende strahlungsempfindliche Zusammensetzung |
US5085972A (en) * | 1990-11-26 | 1992-02-04 | Minnesota Mining And Manufacturing Company | Alkoxyalkyl ester solubility inhibitors for phenolic resins |
GB9105750D0 (en) * | 1991-03-19 | 1991-05-01 | Minnesota Mining & Mfg | Speed stabilised positive-acting photoresist compositions |
JP2655369B2 (ja) * | 1991-06-28 | 1997-09-17 | 富士写真フイルム株式会社 | 感光性組成物 |
JP2764771B2 (ja) * | 1991-10-01 | 1998-06-11 | 富士写真フイルム株式会社 | 感光性組成物 |
JP2655384B2 (ja) * | 1991-11-08 | 1997-09-17 | 富士写真フイルム株式会社 | ポジ型レジスト組成物 |
JP3010607B2 (ja) * | 1992-02-25 | 2000-02-21 | ジェイエスアール株式会社 | 感放射線性樹脂組成物 |
US5384229A (en) * | 1992-05-07 | 1995-01-24 | Shipley Company Inc. | Photoimageable compositions for electrodeposition |
JP2944327B2 (ja) * | 1992-09-14 | 1999-09-06 | 富士写真フイルム株式会社 | ポジ型感光性平版印刷版 |
US5364740A (en) * | 1992-12-30 | 1994-11-15 | Minnesota Mining And Manufacturing Company | Bleaching of dyes in photosensitive systems |
EP0691575B1 (de) * | 1994-07-04 | 2002-03-20 | Fuji Photo Film Co., Ltd. | Positiv-photoresistzusammensetzung |
US5593812A (en) * | 1995-02-17 | 1997-01-14 | International Business Machines Corporation | Photoresist having increased sensitivity and use thereof |
US6165673A (en) * | 1995-12-01 | 2000-12-26 | International Business Machines Corporation | Resist composition with radiation sensitive acid generator |
US5585220A (en) * | 1995-12-01 | 1996-12-17 | International Business Machines Corporation | Resist composition with radiation sensitive acid generator |
JP3024128B2 (ja) * | 1998-11-27 | 2000-03-21 | ジェイエスアール株式会社 | ポジ型感放射線性樹脂組成物 |
US11852972B2 (en) * | 2020-10-30 | 2023-12-26 | Rohm And Haas Electronic Materials Llc | Photoresist compositions and pattern formation methods |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3779778A (en) * | 1972-02-09 | 1973-12-18 | Minnesota Mining & Mfg | Photosolubilizable compositions and elements |
CH621416A5 (de) * | 1975-03-27 | 1981-01-30 | Hoechst Ag | |
GB8333901D0 (en) * | 1983-12-20 | 1984-02-01 | Minnesota Mining & Mfg | Radiationsensitive compositions |
JPH02248953A (ja) * | 1989-03-22 | 1990-10-04 | Toshiba Corp | 感光性組成物 |
-
1989
- 1989-10-18 GB GB898923459A patent/GB8923459D0/en active Pending
-
1990
- 1990-10-17 DE DE1990628476 patent/DE69028476T2/de not_active Expired - Fee Related
- 1990-10-17 EP EP19900311399 patent/EP0424124B1/de not_active Expired - Lifetime
- 1990-10-18 JP JP2280545A patent/JPH03167249A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE69028476T2 (de) | 1997-03-13 |
JPH03167249A (ja) | 1991-07-19 |
EP0424124A3 (en) | 1992-02-26 |
EP0424124A2 (de) | 1991-04-24 |
GB8923459D0 (en) | 1989-12-06 |
EP0424124B1 (de) | 1996-09-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |