DE69012475D1 - Lichtempfindliche Zusammensetzungen. - Google Patents

Lichtempfindliche Zusammensetzungen.

Info

Publication number
DE69012475D1
DE69012475D1 DE69012475T DE69012475T DE69012475D1 DE 69012475 D1 DE69012475 D1 DE 69012475D1 DE 69012475 T DE69012475 T DE 69012475T DE 69012475 T DE69012475 T DE 69012475T DE 69012475 D1 DE69012475 D1 DE 69012475D1
Authority
DE
Germany
Prior art keywords
photosensitive compositions
photosensitive
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69012475T
Other languages
English (en)
Other versions
DE69012475T2 (de
Inventor
Kazuyoshi Mizutani
Toshiaki Aoai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE69012475D1 publication Critical patent/DE69012475D1/de
Publication of DE69012475T2 publication Critical patent/DE69012475T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
DE1990612475 1989-07-28 1990-07-26 Lichtempfindliche Zusammensetzungen. Expired - Fee Related DE69012475T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19610889A JP2648969B2 (ja) 1989-07-28 1989-07-28 感光性組成物

Publications (2)

Publication Number Publication Date
DE69012475D1 true DE69012475D1 (de) 1994-10-20
DE69012475T2 DE69012475T2 (de) 1995-02-09

Family

ID=16352370

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1990612475 Expired - Fee Related DE69012475T2 (de) 1989-07-28 1990-07-26 Lichtempfindliche Zusammensetzungen.

Country Status (4)

Country Link
US (1) US5143816A (de)
EP (1) EP0410760B1 (de)
JP (1) JP2648969B2 (de)
DE (1) DE69012475T2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5252686A (en) * 1989-07-12 1993-10-12 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
EP0410606B1 (de) * 1989-07-12 1996-11-13 Fuji Photo Film Co., Ltd. Polysiloxane und positiv arbeitende Resistmasse
US5278273A (en) * 1989-07-12 1994-01-11 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
GB9516723D0 (en) * 1995-08-15 1995-10-18 Horsell Plc Water-less lithographic plates
DE19803564A1 (de) 1998-01-30 1999-08-05 Agfa Gevaert Ag Polymere mit Einheiten aus N-substituiertem Maleimid und deren Verwendung in strahlungsempfindlichen Gemischen
US6352811B1 (en) 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6451505B1 (en) 2000-08-04 2002-09-17 Kodak Polychrome Graphics Llc Imageable element and method of preparation thereof
US6699636B2 (en) 2001-12-12 2004-03-02 Kodak Polychrome Graphics Llc Imaging element comprising a thermally activated crosslinking agent
US20040023160A1 (en) * 2002-07-30 2004-02-05 Kevin Ray Method of manufacturing imaging compositions
US6849372B2 (en) * 2002-07-30 2005-02-01 Kodak Polychrome Graphics Method of manufacturing imaging compositions
EP1662322B1 (de) 2004-11-26 2017-01-11 Toray Industries, Inc. Positive lichtempfindliche Siloxanzusammensetzung, damit gebildeter Härtungsfilm und Vorrichtung mit dem Härtungsfilm
JP5136777B2 (ja) 2008-04-25 2013-02-06 信越化学工業株式会社 ポリオルガノシロキサン化合物、これを含む樹脂組成物及びこれらのパターン形成方法
US20100227269A1 (en) 2009-03-04 2010-09-09 Simpson Christopher D Imageable elements with colorants
DE102009019745A1 (de) * 2009-05-02 2010-11-11 Karlsruher Institut für Technologie Verfahren zur Strukturierung einer Schicht aus Silikon und Verwendung einer hierfür entwickelten Mischung
TWI459145B (zh) * 2013-04-26 2014-11-01 Chi Mei Corp 光硬化性聚矽氧烷組成物、保護膜及具有保護膜的元件
TWI506374B (zh) * 2013-09-10 2015-11-01 Chi Mei Corp 感光性聚矽氧烷組成物、保護膜及具有保護膜的元件
TWI540396B (zh) 2014-02-18 2016-07-01 奇美實業股份有限公司 感光性聚矽氧烷組成物、保護膜及具有保護膜的元件
TWI551951B (zh) 2014-05-07 2016-10-01 奇美實業股份有限公司 感光性組成物、保護膜以及具有保護膜的元件
TWI524150B (zh) * 2014-06-27 2016-03-01 奇美實業股份有限公司 感光性樹脂組成物、保護膜及具有保護膜之元件

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3130928A1 (de) * 1981-08-05 1983-02-17 Chemische Werke Hüls AG, 4370 Marl Verfahren zur stabilisierung von niedermolekularen polymerisaten auf basis von 1,3-butadien mit reaktiven silylgruppen gegen vernetzung
US4381396A (en) * 1982-07-07 1983-04-26 General Electric Company Silynorbornane anhydrides and method for making
US4507384A (en) * 1983-04-18 1985-03-26 Nippon Telegraph & Telephone Public Corporation Pattern forming material and method for forming pattern therewith
US4603195A (en) * 1983-12-30 1986-07-29 International Business Machines Corporation Organosilicon compound and use thereof in photolithography
JPS6178793A (ja) * 1984-09-25 1986-04-22 Fumimori Satou ４−置換−１，２，３，６−テトラヒドロ無水フタル酸及びその製造法
JPS61144639A (ja) * 1984-12-19 1986-07-02 Hitachi Ltd 放射線感応性組成物及びそれを用いたパタ−ン形成法
US4745169A (en) * 1985-05-10 1988-05-17 Hitachi, Ltd. Alkali-soluble siloxane polymer, silmethylene polymer, and polyorganosilsesquioxane polymer
US4822716A (en) * 1985-12-27 1989-04-18 Kabushiki Kaisha Toshiba Polysilanes, Polysiloxanes and silicone resist materials containing these compounds
JPH0772799B2 (ja) * 1986-08-13 1995-08-02 ソニー株式会社 レジスト材料
JPS6375741A (ja) * 1986-09-19 1988-04-06 Nippon Oil Co Ltd ケイ素含有レジスト材料
US4788127A (en) * 1986-11-17 1988-11-29 Eastman Kodak Company Photoresist composition comprising an interpolymer of a silicon-containing monomer and an hydroxystyrene
DE3811242A1 (de) * 1988-04-02 1989-10-19 Hoechst Ag Im waessrigem alkali loesliche, silanylgruppen in der seitenkette enthaltende bindemittel, verfahren zu deren herstellung sowie lichtempfindliches gemisch, enthaltend diese verbindungen
JPH0344644A (ja) * 1989-07-13 1991-02-26 Fuji Photo Film Co Ltd 感光性組成物
JP2598998B2 (ja) * 1989-07-12 1997-04-09 富士写真フイルム株式会社 感光性組成物
DE3927312A1 (de) * 1989-08-18 1991-02-21 Wacker Chemie Gmbh Anhydridfunktionelle organo(poly)siloxane, verfahren zu ihrer herstellung und verwendung dieser organo(poly)siloxane

Also Published As

Publication number Publication date
EP0410760A2 (de) 1991-01-30
EP0410760A3 (en) 1991-08-21
EP0410760B1 (de) 1994-09-14
US5143816A (en) 1992-09-01
DE69012475T2 (de) 1995-02-09
JPH0359667A (ja) 1991-03-14
JP2648969B2 (ja) 1997-09-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee