DE69032204D1 - Positiv arbeitende photoresistzusammensetzung - Google Patents

Positiv arbeitende photoresistzusammensetzung

Info

Publication number
DE69032204D1
DE69032204D1 DE69032204T DE69032204T DE69032204D1 DE 69032204 D1 DE69032204 D1 DE 69032204D1 DE 69032204 T DE69032204 T DE 69032204T DE 69032204 T DE69032204 T DE 69032204T DE 69032204 D1 DE69032204 D1 DE 69032204D1
Authority
DE
Germany
Prior art keywords
photoresist composition
working photoresist
positively working
positively
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69032204T
Other languages
English (en)
Other versions
DE69032204T2 (de
Inventor
Yasunori Uetani
Hirotoshi Nakanishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Publication of DE69032204D1 publication Critical patent/DE69032204D1/de
Application granted granted Critical
Publication of DE69032204T2 publication Critical patent/DE69032204T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
DE69032204T 1989-12-20 1990-12-20 Positiv arbeitende photoresistzusammensetzung Expired - Lifetime DE69032204T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1331995A JP2629990B2 (ja) 1989-12-20 1989-12-20 ポジ型レジスト用組成物
PCT/JP1990/001659 WO1991009346A1 (en) 1989-12-20 1990-12-20 Positive resist composition

Publications (2)

Publication Number Publication Date
DE69032204D1 true DE69032204D1 (de) 1998-05-07
DE69032204T2 DE69032204T2 (de) 1998-07-23

Family

ID=18249965

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69032204T Expired - Lifetime DE69032204T2 (de) 1989-12-20 1990-12-20 Positiv arbeitende photoresistzusammensetzung

Country Status (7)

Country Link
US (2) US5290657A (de)
EP (1) EP0458988B1 (de)
JP (1) JP2629990B2 (de)
KR (1) KR0166368B1 (de)
CA (1) CA2046908A1 (de)
DE (1) DE69032204T2 (de)
WO (1) WO1991009346A1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3039048B2 (ja) * 1991-11-01 2000-05-08 住友化学工業株式会社 ポジ型感放射線性レジスト組成物
JP3391471B2 (ja) * 1992-02-25 2003-03-31 住友化学工業株式会社 ポジ型レジスト組成物
US5726257A (en) * 1994-08-30 1998-03-10 Sumitomo Chemical Company, Ltd. Esterified resorcinol-carbonyl compound condensates and epoxy resins therewith
JPH0954437A (ja) 1995-06-05 1997-02-25 Fuji Photo Film Co Ltd 化学増幅型ポジレジスト組成物
JP3562673B2 (ja) 1996-01-22 2004-09-08 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
TW475926B (en) * 1996-06-06 2002-02-11 Sumitomo Chemical Co Novel ester compound and thermosetting resin composition using the same
SG78412A1 (en) 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
JP3931486B2 (ja) 1999-06-24 2007-06-13 住友化学株式会社 ポジ型レジスト組成物
WO2002032891A1 (en) * 2000-10-18 2002-04-25 Ribotargets Limited Flavan compounds, their preparation and their use in therapy
TWI263864B (en) 2001-01-17 2006-10-11 Tokyo Ohka Kogyo Co Ltd Positive photoresist composition
DE602004022677D1 (de) 2003-07-16 2009-10-01 Tokyo Ohka Kogyo Co Ltd Positivphotoresistzusammensetzung und verfahren zur ausbildung einer resiststruktur
WO2011030737A1 (ja) 2009-09-11 2011-03-17 Jsr株式会社 感放射線性組成物及び新規化合物
CN107207456B (zh) 2015-02-02 2021-05-04 巴斯夫欧洲公司 潜酸及其用途
US9740097B2 (en) 2015-03-31 2017-08-22 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4626492A (en) * 1985-06-04 1986-12-02 Olin Hunt Specialty Products, Inc. Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound
DK556286A (da) * 1985-11-27 1987-05-28 Int Flavors & Fragrances Inc Fremgangsmaade til fremstilling af frugt- groensags- eller krydderidsserter.
US4732836A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
DE3784549D1 (de) * 1986-05-02 1993-04-15 Hoechst Celanese Corp Positiv-arbeitendes lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial.
US4732837A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
DE3718416A1 (de) * 1987-06-02 1988-12-15 Hoechst Ag Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden, daraus hergestelltes aufzeichnungsmaterial und dessen verwendung
JPH0814696B2 (ja) * 1987-09-17 1996-02-14 富士写真フイルム株式会社 感光性樹脂組成物
JP2625883B2 (ja) * 1988-05-17 1997-07-02 住友化学工業株式会社 ポジ型レジスト組成物
JP2625882B2 (ja) * 1988-05-17 1997-07-02 住友化学工業株式会社 ポジ型レジスト用組成物
JPH061377B2 (ja) * 1989-12-28 1994-01-05 日本ゼオン株式会社 ポジ型レジスト組成物
JPH06224241A (ja) * 1993-01-25 1994-08-12 Toyota Autom Loom Works Ltd 樹脂封止回路装置の成形方法
JPH06324244A (ja) * 1993-05-11 1994-11-25 Canon Inc 駆動装置

Also Published As

Publication number Publication date
EP0458988B1 (de) 1998-04-01
US5374742A (en) 1994-12-20
DE69032204T2 (de) 1998-07-23
KR920701869A (ko) 1992-08-12
WO1991009346A1 (en) 1991-06-27
JP2629990B2 (ja) 1997-07-16
EP0458988A1 (de) 1991-12-04
CA2046908A1 (en) 1991-06-21
EP0458988A4 (en) 1992-07-01
JPH03191351A (ja) 1991-08-21
US5290657A (en) 1994-03-01
KR0166368B1 (ko) 1999-01-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: SUMITOMO CHEMICAL CO. LTD., TOKIO/TOKYO, JP