DE69327678D1 - Positiv arbeitende Resistzusammensetzung - Google Patents
Positiv arbeitende ResistzusammensetzungInfo
- Publication number
- DE69327678D1 DE69327678D1 DE69327678T DE69327678T DE69327678D1 DE 69327678 D1 DE69327678 D1 DE 69327678D1 DE 69327678 T DE69327678 T DE 69327678T DE 69327678 T DE69327678 T DE 69327678T DE 69327678 D1 DE69327678 D1 DE 69327678D1
- Authority
- DE
- Germany
- Prior art keywords
- resist composition
- positive working
- working resist
- positive
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Paints Or Removers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP03775092A JP3391471B2 (ja) | 1992-02-25 | 1992-02-25 | ポジ型レジスト組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69327678D1 true DE69327678D1 (de) | 2000-03-02 |
DE69327678T2 DE69327678T2 (de) | 2000-09-07 |
Family
ID=12506155
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69327678T Expired - Fee Related DE69327678T2 (de) | 1992-02-25 | 1993-02-25 | Positiv arbeitende Resistzusammensetzung |
Country Status (8)
Country | Link |
---|---|
US (1) | US5424167A (de) |
EP (1) | EP0557991B1 (de) |
JP (1) | JP3391471B2 (de) |
KR (1) | KR100264691B1 (de) |
CA (1) | CA2089110A1 (de) |
DE (1) | DE69327678T2 (de) |
MX (1) | MX9300968A (de) |
TW (1) | TW430754B (de) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3329026B2 (ja) * | 1993-10-19 | 2002-09-30 | 住友化学工業株式会社 | ポジ型フォトレジスト組成物 |
JP3230925B2 (ja) * | 1994-04-12 | 2001-11-19 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
WO1996022563A1 (fr) * | 1995-01-17 | 1996-07-25 | Nippon Zeon Co., Ltd. | Composition de resist positif |
JP3427562B2 (ja) * | 1995-05-09 | 2003-07-22 | 住友化学工業株式会社 | ポジ型レジスト組成物 |
US5514515A (en) * | 1995-05-24 | 1996-05-07 | Shipley Company, L.L.C. | Photoactive compounds having a heterocyclic group used in photoresist compositions |
US5618932A (en) * | 1995-05-24 | 1997-04-08 | Shipley Company, L.L.C. | Photoactive compounds and compositions |
JP3076523B2 (ja) * | 1996-03-25 | 2000-08-14 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物 |
JP3796982B2 (ja) * | 1998-06-02 | 2006-07-12 | 住友化学株式会社 | ポジ型レジスト組成物 |
JP3945556B2 (ja) * | 1998-12-17 | 2007-07-18 | 東京応化工業株式会社 | 液晶素子製造用ポジ型ホトレジスト塗布液及びそれを用いた基材 |
JP3931486B2 (ja) | 1999-06-24 | 2007-06-13 | 住友化学株式会社 | ポジ型レジスト組成物 |
US7052824B2 (en) * | 2000-06-30 | 2006-05-30 | E. I. Du Pont De Nemours And Company | Process for thick film circuit patterning |
WO2005007719A2 (en) | 2003-07-16 | 2005-01-27 | Tokyo Ohka Kogyo Co., Ltd. | Positive photoresist composition and method of forming resist pattern |
KR101020164B1 (ko) | 2003-07-17 | 2011-03-08 | 허니웰 인터내셔날 인코포레이티드 | 진보된 마이크로전자적 응용을 위한 평탄화 막, 및 이를제조하기 위한 장치 및 방법 |
US20050221222A1 (en) * | 2004-03-22 | 2005-10-06 | Canon Kabushiki Kaisha | Photosensitive resin composition, resist pattern forming method, substrate processing method, and device manufacturing method |
JP4678195B2 (ja) * | 2005-02-03 | 2011-04-27 | 三菱瓦斯化学株式会社 | フェナントレンキノン誘導体及びその製造方法 |
KR100725023B1 (ko) | 2006-10-16 | 2007-06-07 | 제일모직주식회사 | 카도계 수지를 함유한 수지 조성물 및 그에 의한 패턴의 제조방법, 이를 이용한 컬러필터 |
KR101333698B1 (ko) | 2009-11-10 | 2013-11-27 | 제일모직주식회사 | 포지티브형 감광성 수지 조성물 |
WO2011096273A1 (ja) * | 2010-02-03 | 2011-08-11 | Dic株式会社 | フェノール樹脂組成物、その製造方法、硬化性樹脂組成物、その硬化物、及びプリント配線基板 |
KR101799396B1 (ko) | 2010-05-18 | 2017-11-21 | 삼성디스플레이 주식회사 | 포토레지스트 조성물 및 이를 이용한 패턴의 형성 방법 |
CN102436142B (zh) | 2010-09-29 | 2013-11-06 | 第一毛织株式会社 | 黑色光敏树脂组合物以及使用其的光阻层 |
KR101367253B1 (ko) | 2010-10-13 | 2014-03-13 | 제일모직 주식회사 | 감광성 수지 조성물 및 이를 이용한 차광층 |
KR101486560B1 (ko) | 2010-12-10 | 2015-01-27 | 제일모직 주식회사 | 감광성 수지 조성물 및 이를 이용한 차광층 |
KR20120066923A (ko) | 2010-12-15 | 2012-06-25 | 제일모직주식회사 | 신규 페놀 화합물 및 이를 포함하는 포지티브형 감광성 수지 조성물 |
KR101423539B1 (ko) | 2010-12-20 | 2014-07-25 | 삼성전자 주식회사 | 포지티브형 감광성 수지 조성물 |
KR101453769B1 (ko) | 2010-12-24 | 2014-10-22 | 제일모직 주식회사 | 감광성 수지 조성물 및 이를 이용한 컬러 필터 |
KR101344786B1 (ko) | 2011-12-02 | 2013-12-26 | 제일모직주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터 |
KR20140076320A (ko) | 2012-12-12 | 2014-06-20 | 제일모직주식회사 | 감광성 수지 조성물 및 이를 이용한 블랙 스페이서 |
CN110804173B (zh) * | 2019-12-02 | 2022-07-22 | 珠海宏昌电子材料有限公司 | 聚苯醚中间体、聚苯醚衍生物及其制备方法和应用 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL247588A (de) * | 1959-01-21 | |||
DE3039926A1 (de) * | 1980-10-23 | 1982-05-27 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial |
DE3107109A1 (de) * | 1981-02-26 | 1982-09-09 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial |
JPS58203434A (ja) * | 1982-05-24 | 1983-11-26 | Kanto Kagaku Kk | ポジ型フオトレジスト組成物 |
DE3718416A1 (de) * | 1987-06-02 | 1988-12-15 | Hoechst Ag | Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden, daraus hergestelltes aufzeichnungsmaterial und dessen verwendung |
JP2629990B2 (ja) * | 1989-12-20 | 1997-07-16 | 住友化学工業株式会社 | ポジ型レジスト用組成物 |
TW202504B (de) * | 1990-02-23 | 1993-03-21 | Sumitomo Chemical Co | |
EP0445819B1 (de) * | 1990-03-08 | 2001-08-22 | Fuji Photo Film Co., Ltd. | Positiv arbeitende Photolackzusammensetzung |
-
1992
- 1992-02-25 JP JP03775092A patent/JP3391471B2/ja not_active Expired - Fee Related
-
1993
- 1993-02-09 CA CA002089110A patent/CA2089110A1/en not_active Abandoned
- 1993-02-22 TW TW082101241A patent/TW430754B/zh not_active IP Right Cessation
- 1993-02-22 KR KR1019930002423A patent/KR100264691B1/ko not_active IP Right Cessation
- 1993-02-23 MX MX9300968A patent/MX9300968A/es not_active IP Right Cessation
- 1993-02-25 US US08/022,488 patent/US5424167A/en not_active Expired - Lifetime
- 1993-02-25 EP EP93102960A patent/EP0557991B1/de not_active Expired - Lifetime
- 1993-02-25 DE DE69327678T patent/DE69327678T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR100264691B1 (ko) | 2000-09-01 |
TW430754B (en) | 2001-04-21 |
DE69327678T2 (de) | 2000-09-07 |
MX9300968A (es) | 1993-09-01 |
US5424167A (en) | 1995-06-13 |
JPH05232697A (ja) | 1993-09-10 |
EP0557991B1 (de) | 2000-01-26 |
KR930018325A (ko) | 1993-09-21 |
JP3391471B2 (ja) | 2003-03-31 |
CA2089110A1 (en) | 1993-08-26 |
EP0557991A1 (de) | 1993-09-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69329408T2 (de) | Positiv arbeitende Photolackzusammensetzung | |
DE69327678D1 (de) | Positiv arbeitende Resistzusammensetzung | |
DE69126834D1 (de) | Positiv arbeitende Photoresistzusammensetzung | |
DE69423800D1 (de) | Positiv arbeitende fotoempfindliche Zusammensetzung | |
DE69130125T2 (de) | Positiv arbeitende Photolackzusammensetzung | |
DE69027099T2 (de) | Positiv arbeitende Photolackzusammensetzung | |
DE69232042D1 (de) | Positiv-arbeitende lichtempfindliche Zusammensetzung | |
DE69033212D1 (de) | Positiv arbeitende Photolack-Zusammensetzung | |
DE69421982T2 (de) | Positiv arbeitende Photoresistzusammensetzung | |
DE69229332D1 (de) | Positiv-arbeitende Resistzusammensetzung | |
DE69424884T2 (de) | Positiv arbeitende Photoresistzusammensetzung | |
DE69301273D1 (de) | Positiv arbeitende Photolackzusammensetzung | |
DE69220612T2 (de) | Positivarbeitende Photoresistzusammensetzung | |
DE69309769D1 (de) | Positivarbeitende Resistzusammensetzung | |
DE69121001T2 (de) | Positiv arbeitende Fotolackzusammensetzung | |
DE69308634T2 (de) | Positiv arbeitende Photolackzusammensetzung | |
DE69321274T2 (de) | Positiv arbeitende Resistzusammensetzung | |
DE69132694T2 (de) | Positiv arbeitende Photolackzusammensetzung | |
DE69209356T2 (de) | Positiv-arbeitende Resistzusammensetzung | |
DE69513433T2 (de) | Positiv arbeitende Photoresistzusammensetzung | |
DE69303650D1 (de) | Positiv arbeitende Fotolackzusammensetzung | |
DE69223083T2 (de) | Positivarbeitende Resistzusammensetzung | |
DE69416927D1 (de) | Positivarbeitende Resistzusammensetzung | |
DE69413925D1 (de) | Positiv arbeitende Resistzusammensetzung | |
DE69213996T2 (de) | Positivarbeitende Resistzusammensetzung |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |