DE69303650D1 - Positiv arbeitende Fotolackzusammensetzung - Google Patents

Positiv arbeitende Fotolackzusammensetzung

Info

Publication number
DE69303650D1
DE69303650D1 DE69303650T DE69303650T DE69303650D1 DE 69303650 D1 DE69303650 D1 DE 69303650D1 DE 69303650 T DE69303650 T DE 69303650T DE 69303650 T DE69303650 T DE 69303650T DE 69303650 D1 DE69303650 D1 DE 69303650D1
Authority
DE
Germany
Prior art keywords
photoresist composition
positive working
working photoresist
positive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69303650T
Other languages
English (en)
Other versions
DE69303650T2 (de
Inventor
Yuji Ueda
Naoki Takeyama
Hiromi Ueki
Takehiro Kusumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP5005793A external-priority patent/JPH05341531A/ja
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Application granted granted Critical
Publication of DE69303650D1 publication Critical patent/DE69303650D1/de
Publication of DE69303650T2 publication Critical patent/DE69303650T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
DE69303650T 1992-04-10 1993-04-02 Positiv arbeitende Fotolackzusammensetzung Expired - Fee Related DE69303650T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP9077192 1992-04-10
JP5005793A JPH05341531A (ja) 1992-04-10 1993-01-18 ポジ型フォトレジスト組成物

Publications (2)

Publication Number Publication Date
DE69303650D1 true DE69303650D1 (de) 1996-08-22
DE69303650T2 DE69303650T2 (de) 1996-11-28

Family

ID=26339796

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69303650T Expired - Fee Related DE69303650T2 (de) 1992-04-10 1993-04-02 Positiv arbeitende Fotolackzusammensetzung

Country Status (5)

Country Link
US (1) US5800966A (de)
EP (1) EP0564997B1 (de)
CA (1) CA2092774A1 (de)
DE (1) DE69303650T2 (de)
MX (1) MX9302015A (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0628599B1 (de) * 1992-12-24 1998-12-09 Sumitomo Chemical Company Limited Lichtempfindliche harzzusammensetzung für farbfilter
US5876895A (en) * 1992-12-24 1999-03-02 Sumitomo Chemical Company, Limited Photosensitive resin composition for color filter
JPH06214395A (ja) * 1993-01-18 1994-08-05 Sumitomo Chem Co Ltd ポジ型フォトレジスト組成物
JPH09166871A (ja) 1995-12-15 1997-06-24 Sumitomo Chem Co Ltd フォトレジスト組成物
JP3638086B2 (ja) * 1998-08-21 2005-04-13 東京応化工業株式会社 ポジ型レジスト組成物及びそれを用いたレジストパターン形成方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4371605A (en) * 1980-12-09 1983-02-01 E. I. Du Pont De Nemours And Company Photopolymerizable compositions containing N-hydroxyamide and N-hydroxyimide sulfonates
DE69027799T2 (de) * 1989-03-14 1997-01-23 Ibm Chemisch amplifizierter Photolack
US5120633A (en) * 1990-04-10 1992-06-09 E. I. Du Pont De Nemours And Company Resist material for use in thick film resists
DE69121475T2 (de) * 1990-06-05 1997-01-23 Sumitomo Chemical Co Positivresistzusammensetzung
TW207009B (de) * 1991-01-31 1993-06-01 Sumitomo Chemical Co

Also Published As

Publication number Publication date
DE69303650T2 (de) 1996-11-28
EP0564997A2 (de) 1993-10-13
EP0564997B1 (de) 1996-07-17
MX9302015A (es) 1994-03-31
EP0564997A3 (de) 1993-11-03
CA2092774A1 (en) 1993-10-11
US5800966A (en) 1998-09-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee