MX9302015A - Composicion de capa fotosensible positiva. - Google Patents
Composicion de capa fotosensible positiva.Info
- Publication number
- MX9302015A MX9302015A MX9302015A MX9302015A MX9302015A MX 9302015 A MX9302015 A MX 9302015A MX 9302015 A MX9302015 A MX 9302015A MX 9302015 A MX9302015 A MX 9302015A MX 9302015 A MX9302015 A MX 9302015A
- Authority
- MX
- Mexico
- Prior art keywords
- photosensitive layer
- layer composition
- positive photosensitive
- soluble resin
- alkali soluble
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
Abstract
Esta invención proporciona una composición fotoendurecible o de capa fotosensible positiva, que comprende una resina soluble enálcali, un inhibidor de disolución y un precursor ácido fotoinducido, en donde la resina soluble en álcali es obtenible a través de una reacción de condensación de un compuesto representado por la fórmula general (I).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9077192 | 1992-04-10 | ||
JP5005793A JPH05341531A (ja) | 1992-04-10 | 1993-01-18 | ポジ型フォトレジスト組成物 |
Publications (1)
Publication Number | Publication Date |
---|---|
MX9302015A true MX9302015A (es) | 1994-03-31 |
Family
ID=26339796
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX9302015A MX9302015A (es) | 1992-04-10 | 1993-04-07 | Composicion de capa fotosensible positiva. |
Country Status (5)
Country | Link |
---|---|
US (1) | US5800966A (es) |
EP (1) | EP0564997B1 (es) |
CA (1) | CA2092774A1 (es) |
DE (1) | DE69303650T2 (es) |
MX (1) | MX9302015A (es) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0628599B1 (en) * | 1992-12-24 | 1998-12-09 | Sumitomo Chemical Company Limited | Photosensitive resin composition for color filter |
US5876895A (en) * | 1992-12-24 | 1999-03-02 | Sumitomo Chemical Company, Limited | Photosensitive resin composition for color filter |
JPH06214395A (ja) * | 1993-01-18 | 1994-08-05 | Sumitomo Chem Co Ltd | ポジ型フォトレジスト組成物 |
JPH09166871A (ja) | 1995-12-15 | 1997-06-24 | Sumitomo Chem Co Ltd | フォトレジスト組成物 |
JP3638086B2 (ja) * | 1998-08-21 | 2005-04-13 | 東京応化工業株式会社 | ポジ型レジスト組成物及びそれを用いたレジストパターン形成方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4371605A (en) * | 1980-12-09 | 1983-02-01 | E. I. Du Pont De Nemours And Company | Photopolymerizable compositions containing N-hydroxyamide and N-hydroxyimide sulfonates |
DE69027799T2 (de) * | 1989-03-14 | 1997-01-23 | Ibm | Chemisch amplifizierter Photolack |
US5120633A (en) * | 1990-04-10 | 1992-06-09 | E. I. Du Pont De Nemours And Company | Resist material for use in thick film resists |
DE69121475T2 (de) * | 1990-06-05 | 1997-01-23 | Sumitomo Chemical Co | Positivresistzusammensetzung |
TW207009B (es) * | 1991-01-31 | 1993-06-01 | Sumitomo Chemical Co |
-
1993
- 1993-03-26 CA CA002092774A patent/CA2092774A1/en not_active Abandoned
- 1993-04-02 DE DE69303650T patent/DE69303650T2/de not_active Expired - Fee Related
- 1993-04-02 EP EP93105500A patent/EP0564997B1/en not_active Expired - Lifetime
- 1993-04-07 MX MX9302015A patent/MX9302015A/es not_active IP Right Cessation
- 1993-04-09 US US08/044,487 patent/US5800966A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69303650T2 (de) | 1996-11-28 |
EP0564997A2 (en) | 1993-10-13 |
EP0564997B1 (en) | 1996-07-17 |
DE69303650D1 (de) | 1996-08-22 |
EP0564997A3 (en) | 1993-11-03 |
CA2092774A1 (en) | 1993-10-11 |
US5800966A (en) | 1998-09-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG | Grant or registration | ||
MM | Annulment or lapse due to non-payment of fees |