MX9301211A - Composicion de capa protectora de tipo positiva. - Google Patents

Composicion de capa protectora de tipo positiva.

Info

Publication number
MX9301211A
MX9301211A MX9301211A MX9301211A MX9301211A MX 9301211 A MX9301211 A MX 9301211A MX 9301211 A MX9301211 A MX 9301211A MX 9301211 A MX9301211 A MX 9301211A MX 9301211 A MX9301211 A MX 9301211A
Authority
MX
Mexico
Prior art keywords
protective layer
layer composition
positive type
type protective
alkali
Prior art date
Application number
MX9301211A
Other languages
English (en)
Inventor
Haruyoshi Osaki
Hiroshi Moriuma
Yasunori Uetani
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of MX9301211A publication Critical patent/MX9301211A/es

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

La presente invención se refiere a una composición de capa protectora, de tipo positivo, que comprende una resina soluble en alcali y un compuesto de quinondiazida, en donde la resina soluble en alcali contiene resina (A), se obtiene a través de una reacción de condensación con al menos un compuesto fenol.
MX9301211A 1992-03-05 1993-03-04 Composicion de capa protectora de tipo positiva. MX9301211A (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4048438A JPH05249666A (ja) 1992-03-05 1992-03-05 ポジ型レジスト組成物

Publications (1)

Publication Number Publication Date
MX9301211A true MX9301211A (es) 1993-09-30

Family

ID=12803359

Family Applications (1)

Application Number Title Priority Date Filing Date
MX9301211A MX9301211A (es) 1992-03-05 1993-03-04 Composicion de capa protectora de tipo positiva.

Country Status (8)

Country Link
US (1) US5326665A (es)
EP (1) EP0559204B1 (es)
JP (1) JPH05249666A (es)
KR (1) KR100247825B1 (es)
CA (1) CA2089634A1 (es)
DE (1) DE69321274T2 (es)
MX (1) MX9301211A (es)
TW (1) TW296440B (es)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0660186A1 (en) * 1993-12-20 1995-06-28 Mitsubishi Chemical Corporation Photosensitive resin composition and method for forming a pattern using the composition
JPH07281428A (ja) * 1994-04-07 1995-10-27 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JP3424341B2 (ja) * 1994-04-11 2003-07-07 住友化学工業株式会社 感光性樹脂組成物
JP3230925B2 (ja) * 1994-04-12 2001-11-19 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP3427562B2 (ja) * 1995-05-09 2003-07-22 住友化学工業株式会社 ポジ型レジスト組成物
US5985507A (en) * 1998-02-18 1999-11-16 Olin Microelectronic Chemicals, Inc. Selected high thermal novolaks and positive-working radiation-sensitive compositions
KR100708249B1 (ko) 2002-08-30 2007-04-16 아사히 유키자이 고교 가부시키가이샤 노볼락형 페놀 수지의 제조방법
EP1649322A4 (en) 2003-07-17 2007-09-19 Honeywell Int Inc PLANARIZATION FILMS FOR ADVANCED MICROELECTRONIC DEVICES AND APPLICATIONS AND METHODS FOR PRODUCING SAID FILMS
JP5586707B2 (ja) 2010-12-07 2014-09-10 三菱電機株式会社 電力変換回路内蔵モーター、この電力変換回路内蔵モーターを搭載した流体ポンプ、この流体ポンプを搭載した空気調和機、給湯器、電力変換回路内蔵モーターを搭載した機器
JP7176844B2 (ja) * 2015-10-19 2022-11-22 日産化学株式会社 長鎖アルキル基含有ノボラックを含むレジスト下層膜形成組成物

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0654384B2 (ja) * 1985-08-09 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
DE3751743T2 (de) * 1986-03-28 1996-11-14 Japan Synthetic Rubber Co Ltd Positiv arbeitende photoempfindliche Kunststoffzusammensetzung
DE3811040A1 (de) * 1988-03-31 1989-10-19 Ciba Geigy Ag Im nahen uv hochaufloesende positiv-fotoresists
US5177172A (en) * 1988-05-31 1993-01-05 Ocg Microelectronic Materials, Inc. Selected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositions
CA1337626C (en) * 1988-07-07 1995-11-28 Haruyoshi Osaki Radiation-sensitive positive resist composition
US5200293A (en) * 1989-02-23 1993-04-06 Ciba-Geigy Corporation Photoresist composition containing specific amounts of a naphthoquinone diazide sulfonyl ester of tetrahydroxy diphenyl sulfide and a polyhydroxy compound
JPH02272457A (ja) * 1989-04-13 1990-11-07 Fuji Photo Film Co Ltd 感電離放射線性樹脂組成物
CA2023791A1 (en) * 1989-08-24 1991-02-25 Ayako Ida Radiation-sensitive positive resist composition
JPH087435B2 (ja) * 1989-12-28 1996-01-29 日本ゼオン株式会社 ポジ型レジスト組成物
JPH0450851A (ja) * 1990-06-14 1992-02-19 Sumitomo Chem Co Ltd ポジ型感放射線性レジスト組成物
US5413896A (en) * 1991-01-24 1995-05-09 Japan Synthetic Rubber Co., Ltd. I-ray sensitive positive resist composition

Also Published As

Publication number Publication date
EP0559204B1 (en) 1998-09-30
KR100247825B1 (ko) 2000-06-01
JPH05249666A (ja) 1993-09-28
EP0559204A1 (en) 1993-09-08
TW296440B (es) 1997-01-21
DE69321274T2 (de) 1999-02-18
CA2089634A1 (en) 1993-09-06
KR930020225A (ko) 1993-10-19
DE69321274D1 (de) 1998-11-05
US5326665A (en) 1994-07-05

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Legal Events

Date Code Title Description
FG Grant or registration
MM Annulment or lapse due to non-payment of fees