MX172758B - Composicion de capa protectora positiva - Google Patents

Composicion de capa protectora positiva

Info

Publication number
MX172758B
MX172758B MX023939A MX2393990A MX172758B MX 172758 B MX172758 B MX 172758B MX 023939 A MX023939 A MX 023939A MX 2393990 A MX2393990 A MX 2393990A MX 172758 B MX172758 B MX 172758B
Authority
MX
Mexico
Prior art keywords
protective layer
layer composition
positive protective
positive
resin
Prior art date
Application number
MX023939A
Other languages
English (en)
Inventor
Yasunori Doi
Hiroshi Moriuma
Takeshi Hioki
Seiko Kurio
Yasunori Uetani
Original Assignee
Sumitomo Chemcal Company Limit
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemcal Company Limit filed Critical Sumitomo Chemcal Company Limit
Publication of MX172758B publication Critical patent/MX172758B/es

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

La presente invención se refiere a una composición de capa protectora positiva, caracterizada porque comprende un compuesto de diazida de 1,2-quinona y una resina soluble en álcali, la cual comprende una resina (I) obtenible a traves de una reacción de condensación de una mezcla fenólica que contiene m-cresol y 2-tert-butil-5-metilfenol con un aldehído.
MX023939A 1989-12-27 1990-12-26 Composicion de capa protectora positiva MX172758B (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP34146389 1989-12-27
JP17569890 1990-07-02
JP17896890 1990-07-05

Publications (1)

Publication Number Publication Date
MX172758B true MX172758B (es) 1994-01-11

Family

ID=27324152

Family Applications (1)

Application Number Title Priority Date Filing Date
MX023939A MX172758B (es) 1989-12-27 1990-12-26 Composicion de capa protectora positiva

Country Status (7)

Country Link
US (1) US5407780A (es)
EP (1) EP0435181B1 (es)
JP (1) JP3063148B2 (es)
KR (1) KR910012818A (es)
CA (1) CA2032884A1 (es)
DE (1) DE69027192T2 (es)
MX (1) MX172758B (es)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2927014B2 (ja) * 1990-02-20 1999-07-28 ジェイエスアール株式会社 感放射線性樹脂組成物
JP2743697B2 (ja) * 1991-04-26 1998-04-22 日本ゼオン株式会社 ポジ型レジスト組成物
JP3182823B2 (ja) * 1991-12-27 2001-07-03 住友化学工業株式会社 ポジ型レジスト組成物
JP3329026B2 (ja) * 1993-10-19 2002-09-30 住友化学工業株式会社 ポジ型フォトレジスト組成物
DE4401940A1 (de) * 1994-01-24 1995-07-27 Hoechst Ag Positiv arbeitendes Aufzeichnungsmaterial mit verbesserter Entwickelbarkeit
JP3278306B2 (ja) * 1994-10-31 2002-04-30 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
US5750632A (en) * 1994-12-30 1998-05-12 Clariant Finance (Bvi) Limited Isolation of novolak resin by low temperature sub surface forced steam distillation
JPH0990622A (ja) * 1995-09-22 1997-04-04 Fuji Photo Film Co Ltd ポジ型フォトレジスト組成物
JP3076523B2 (ja) * 1996-03-25 2000-08-14 東京応化工業株式会社 ポジ型ホトレジスト組成物
US6733949B2 (en) * 2002-04-11 2004-05-11 Clariant Finance (Bvi) Limited Novolak resin mixtures and photosensitive compositions comprising the same
US7195849B2 (en) * 2003-03-11 2007-03-27 Arch Specialty Chemicals, Inc. Photosensitive resin compositions

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5723253B2 (es) * 1974-03-25 1982-05-18
US4123279A (en) * 1974-03-25 1978-10-31 Fuji Photo Film Co., Ltd. Light-sensitive o-quinonediazide containing planographic printing plate
JPS54116218A (en) * 1978-03-02 1979-09-10 Oji Paper Co Photosensitive composition
DE3009873A1 (de) * 1979-03-16 1980-09-25 Daicel Chem Photoempfindliche masse
JPS55127553A (en) * 1979-03-27 1980-10-02 Daicel Chem Ind Ltd Photosensitive composition
JPS55123614A (en) * 1979-03-16 1980-09-24 Daicel Chem Ind Ltd Photosensitive resin and positive type-photosensitive resin composition
JPS5723253A (en) * 1980-07-17 1982-02-06 Toshiba Corp Semiconductor device
EP0054258B1 (en) * 1980-12-17 1986-03-05 Konica Corporation Photosensitive compositions
JPS616647A (ja) * 1984-06-20 1986-01-13 Konishiroku Photo Ind Co Ltd ポジ型感光性平版印刷版用感光性組成物
JPH0654384B2 (ja) * 1985-08-09 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
JPS6260407A (ja) * 1985-09-09 1987-03-17 株式会社東芝 ガス絶縁開閉装置
JPH0654386B2 (ja) * 1986-03-28 1994-07-20 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物
DE3751743T2 (de) * 1986-03-28 1996-11-14 Japan Synthetic Rubber Co Ltd Positiv arbeitende photoempfindliche Kunststoffzusammensetzung
JPS62230146A (ja) * 1986-03-31 1987-10-08 Toshiba Electric Equip Corp 呼び出し・応答機能を有する親子式電話システム
JPH0654387B2 (ja) * 1986-05-02 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
JPH0656487B2 (ja) * 1986-05-02 1994-07-27 東京応化工業株式会社 ポジ型ホトレジスト用組成物
JPH0654388B2 (ja) * 1986-05-02 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
JP2590342B2 (ja) * 1986-11-08 1997-03-12 住友化学工業株式会社 ポジ型フォトレジスト用ノボラック樹脂及びそれを含有するポジ型フォトレジスト組成物
JP2555620B2 (ja) * 1987-08-21 1996-11-20 日本合成ゴム株式会社 感放射線性樹脂組成物
JP2693472B2 (ja) * 1987-11-26 1997-12-24 株式会社東芝 レジスト
JPH01180535A (ja) * 1988-01-12 1989-07-18 Konica Corp 感光性組成物
US4920028A (en) * 1988-03-31 1990-04-24 Morton Thiokol, Inc. High contrast high thermal stability positive photoresists with mixed cresol and hydroxybenzaldehyde prepared novolak and photosensitive diazoquinone
US4983492A (en) * 1988-06-06 1991-01-08 Shipley Company Inc. Positive dye photoresist compositions with 2,4-bis(phenylazo)resorcinol
CA1337626C (en) * 1988-07-07 1995-11-28 Haruyoshi Osaki Radiation-sensitive positive resist composition
US5001040A (en) * 1988-07-11 1991-03-19 Olin Hunt Specialty Products Inc. Process of forming resist image in positive photoresist with thermally stable phenolic resin
JP2646701B2 (ja) * 1988-09-28 1997-08-27 三菱化学株式会社 ポリアルケニルフエノール化合物

Also Published As

Publication number Publication date
EP0435181A2 (en) 1991-07-03
KR910012818A (ko) 1991-08-08
CA2032884A1 (en) 1991-06-28
JPH04174438A (ja) 1992-06-22
EP0435181B1 (en) 1996-05-29
DE69027192T2 (de) 1997-01-23
EP0435181A3 (en) 1991-11-06
US5407780A (en) 1995-04-18
DE69027192D1 (de) 1996-07-04
JP3063148B2 (ja) 2000-07-12

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