EP0295626A3 - Photosensitive composition - Google Patents

Photosensitive composition Download PDF

Info

Publication number
EP0295626A3
EP0295626A3 EP88109468A EP88109468A EP0295626A3 EP 0295626 A3 EP0295626 A3 EP 0295626A3 EP 88109468 A EP88109468 A EP 88109468A EP 88109468 A EP88109468 A EP 88109468A EP 0295626 A3 EP0295626 A3 EP 0295626A3
Authority
EP
European Patent Office
Prior art keywords
sensitizer
diazonaphthoquinone
oxo
ester
photosensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP88109468A
Other languages
German (de)
French (fr)
Other versions
EP0295626A2 (en
Inventor
Toshihiko Tanaka
Michiaki Hashimoto
Shigeru Koibuchi
Hiroshi Fukuda
Norio Hasegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Publication of EP0295626A2 publication Critical patent/EP0295626A2/en
Publication of EP0295626A3 publication Critical patent/EP0295626A3/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

A photoresist pattern exhibiting high resolution for an i-line exposure and having a steep sectional profile can be formed by making use of a photosensitive composition comprising a cresol novolac resin and a sensitizer blended therewith wherein(i) the cresol novolac resin has a meta to para ratio of 50/50 to 70/30 and a standard polystyrene equivalent weight-average molecular weight of 5,000 to 50,000 and(ii) the sensitizer comprises an ester of 1-oxo-2-diazonaphthoquinone-5-sulfonic acid with 2,3,4-trihydroxybenzophenone and/or an ester of 1-oxo-2-diazonaphthoquinone-5-sulfonic acid with 2,3,4,4′-tetrahydroxybenzophenone and the content of said sensitizer is 14 to 35 % by weight based on said polymer compound.
EP88109468A 1987-06-15 1988-06-14 Photosensitive composition Withdrawn EP0295626A3 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP147066/87 1987-06-15
JP62147066A JPS63311350A (en) 1987-06-15 1987-06-15 Photosensitive composition

Publications (2)

Publication Number Publication Date
EP0295626A2 EP0295626A2 (en) 1988-12-21
EP0295626A3 true EP0295626A3 (en) 1990-07-18

Family

ID=15421712

Family Applications (1)

Application Number Title Priority Date Filing Date
EP88109468A Withdrawn EP0295626A3 (en) 1987-06-15 1988-06-14 Photosensitive composition

Country Status (3)

Country Link
EP (1) EP0295626A3 (en)
JP (1) JPS63311350A (en)
KR (1) KR910004841B1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5069996A (en) * 1989-07-24 1991-12-03 Ocg Microelectronic Materials, Inc. Process for developing selected positive photoresists
DE4111445A1 (en) * 1991-04-09 1992-10-15 Hoechst Ag RADIATION-SENSITIVE MIXTURE WITH ESTERS OF 1,2-NAPHTHOQUINONE-2-DIAZIDE SULFONIC ACID AND A RADIATION-SENSITIVE RECORDING MATERIAL PRODUCED THEREFOR
KR100523768B1 (en) * 2002-06-01 2005-10-26 강승진 Photosensitive composition
TWI678596B (en) 2018-09-13 2019-12-01 新應材股份有限公司 Positive photoresist composition and method of forming patterned polyimide layer

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3603372A1 (en) * 1985-02-13 1986-08-14 Mitsubishi Chemical Industries Ltd., Tokio/Tokyo POSITIVE PHOTORESIST MIX
GB2190090A (en) * 1986-05-02 1987-11-11 Tokyo Ohka Kogyo Co Ltd A positive-working photoresist composition

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0658529B2 (en) * 1983-08-17 1994-08-03 三菱化成株式会社 Positive-type cresol lunovolak photoresist composition
JPS62143045A (en) * 1985-11-29 1987-06-26 Mitsubishi Chem Ind Ltd Positive type photosensitive lithographic plate

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3603372A1 (en) * 1985-02-13 1986-08-14 Mitsubishi Chemical Industries Ltd., Tokio/Tokyo POSITIVE PHOTORESIST MIX
GB2190090A (en) * 1986-05-02 1987-11-11 Tokyo Ohka Kogyo Co Ltd A positive-working photoresist composition

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 11, no. 373 (P-643)(2820) 05 December 1987, & JP-A-62 143045 (MITSUBISHI CHEM IND LTD) 26 June 1987, *
PATENT ABSTRACTS OF JAPAN vol. 9, no. 167 (P-372)(1890) 12 July 1985, & JP-A-60 042 753 (MITSUBISHI KASEI KOGYO K.K.) 07 March 1985, *

Also Published As

Publication number Publication date
KR910004841B1 (en) 1991-07-13
JPS63311350A (en) 1988-12-20
EP0295626A2 (en) 1988-12-21
KR890000928A (en) 1989-03-17

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