MX9306980A - Composicion de capa protectora positiva. - Google Patents
Composicion de capa protectora positiva.Info
- Publication number
- MX9306980A MX9306980A MX9306980A MX9306980A MX9306980A MX 9306980 A MX9306980 A MX 9306980A MX 9306980 A MX9306980 A MX 9306980A MX 9306980 A MX9306980 A MX 9306980A MX 9306980 A MX9306980 A MX 9306980A
- Authority
- MX
- Mexico
- Prior art keywords
- protective layer
- positive protective
- compound
- cresol
- layer composition
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
De conformidad con la siguiente invención, se proporciona la siguientecomposición de capa protectora positiva, la cual tiene propiedadesexcelentes tales como resolución, perfil, profundidad de foco, etc., ylibre de escoria: una composición de capa protectora positiva quecomprende (a) una resina novolac obtenida a través de una reacción decondensación de un compuesto de aldehído y una mezcla de compuestos defenol que comprende el m-cresol, el p-cresol y el 2,5-xilenol, b) unmaterial de quinonadiazida, sensible a la luz, que contiene el diester delácido quinonadiazidasulfónico del compuesto que tiene no menos de tresgrupos hidroxilo fenólicos en una cantidad de 40% o más, como se expresaen términos del área de la gráfica mediada mediante cromatografía líquidade alta resolución, y c) un compuesto soluble en álcali, que tiene un pesomolecular menor que 900.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30090292 | 1992-11-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MX9306980A true MX9306980A (es) | 1995-01-31 |
Family
ID=17890507
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MX9306980A MX9306980A (es) | 1992-11-11 | 1993-11-09 | Composicion de capa protectora positiva. |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0598320A3 (es) |
| KR (1) | KR100277365B1 (es) |
| CA (1) | CA2102148A1 (es) |
| MX (1) | MX9306980A (es) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5609982A (en) * | 1993-12-17 | 1997-03-11 | Fuji Photo Film Co., Ltd. | Positive-working photoresist composition |
| US5726257A (en) * | 1994-08-30 | 1998-03-10 | Sumitomo Chemical Company, Ltd. | Esterified resorcinol-carbonyl compound condensates and epoxy resins therewith |
| KR100334484B1 (ko) * | 1994-12-28 | 2002-12-06 | 제온 코포레이션 | 포지티브형레지스트조성물 |
| WO1996022563A1 (fr) * | 1995-01-17 | 1996-07-25 | Nippon Zeon Co., Ltd. | Composition de resist positif |
| TW475926B (en) * | 1996-06-06 | 2002-02-11 | Sumitomo Chemical Co | Novel ester compound and thermosetting resin composition using the same |
| DE10315290A1 (de) * | 2003-04-04 | 2004-10-14 | Bayer Materialscience Ag | Hochverzweigte Polycarbonate und Copolycarbonate mit verbesserter Fließfähigkeit, ihre Herstellung und Verwendung |
| WO2005007719A2 (en) | 2003-07-16 | 2005-01-27 | Tokyo Ohka Kogyo Co., Ltd. | Positive photoresist composition and method of forming resist pattern |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61185741A (ja) * | 1985-02-13 | 1986-08-19 | Mitsubishi Chem Ind Ltd | ポジ型フオトレジスト組成物 |
| JPH0812423B2 (ja) * | 1987-05-14 | 1996-02-07 | 三菱化学株式会社 | ポジ型フォトレジスト組成物 |
| JP2569669B2 (ja) * | 1987-12-28 | 1997-01-08 | 日本合成ゴム株式会社 | 感放射線性樹脂組成物 |
| JP2715480B2 (ja) * | 1988-10-13 | 1998-02-18 | 住友化学工業株式会社 | ポジ型レジスト用組成物 |
| JPH03155554A (ja) * | 1989-11-14 | 1991-07-03 | Japan Synthetic Rubber Co Ltd | 放射線感応性樹脂組成物 |
-
1993
- 1993-10-30 KR KR1019930022837A patent/KR100277365B1/ko not_active IP Right Cessation
- 1993-11-01 CA CA002102148A patent/CA2102148A1/en not_active Abandoned
- 1993-11-09 MX MX9306980A patent/MX9306980A/es not_active IP Right Cessation
- 1993-11-10 EP EP19930118217 patent/EP0598320A3/en not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| CA2102148A1 (en) | 1994-05-12 |
| EP0598320A3 (en) | 1994-11-30 |
| EP0598320A2 (en) | 1994-05-25 |
| KR940012050A (ko) | 1994-06-22 |
| KR100277365B1 (ko) | 2001-09-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FG | Grant or registration | ||
| MM | Annulment or lapse due to non-payment of fees |