MX9303080A - Composicion de capa protectora positiva. - Google Patents
Composicion de capa protectora positiva.Info
- Publication number
- MX9303080A MX9303080A MX9303080A MX9303080A MX9303080A MX 9303080 A MX9303080 A MX 9303080A MX 9303080 A MX9303080 A MX 9303080A MX 9303080 A MX9303080 A MX 9303080A MX 9303080 A MX9303080 A MX 9303080A
- Authority
- MX
- Mexico
- Prior art keywords
- protective layer
- positive protective
- composition
- layer composition
- positive
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Photoreceptors In Electrophotography (AREA)
- Optical Filters (AREA)
- Formation Of Insulating Films (AREA)
Abstract
Se describe una composición de capa protectora positiva que comprende un compuesto de quinonadiazida y una resina soluble en álcali (A) obtenible por medio de una reacción de condensación de por lo menos un compuesto representado por la fórmula general (I). Esta composición de capa protectora positiva es excelente en propiedades tales como perfil, resolución, resistencia al calor, etc.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4134863A JPH05323605A (ja) | 1992-05-27 | 1992-05-27 | ポジ型レジスト組成物 |
Publications (1)
Publication Number | Publication Date |
---|---|
MX9303080A true MX9303080A (es) | 1994-02-28 |
Family
ID=15138238
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX9303080A MX9303080A (es) | 1992-05-27 | 1993-05-26 | Composicion de capa protectora positiva. |
Country Status (8)
Country | Link |
---|---|
US (1) | US5451484A (es) |
EP (1) | EP0571989B1 (es) |
JP (1) | JPH05323605A (es) |
KR (1) | KR100255879B1 (es) |
CA (1) | CA2096317A1 (es) |
DE (1) | DE69308634T2 (es) |
MX (1) | MX9303080A (es) |
TW (1) | TW275670B (es) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3424341B2 (ja) * | 1994-04-11 | 2003-07-07 | 住友化学工業株式会社 | 感光性樹脂組成物 |
EP0706090B1 (en) * | 1994-10-05 | 2001-01-03 | JSR Corporation | Radiation sensitive resin composition |
EP0831370A4 (en) * | 1995-01-17 | 1999-08-18 | Nippon Zeon Co | POSITIVELY WORKING PHOTO PAINT COMPOSITION |
JP3427562B2 (ja) * | 1995-05-09 | 2003-07-22 | 住友化学工業株式会社 | ポジ型レジスト組成物 |
US6191197B1 (en) * | 1996-09-23 | 2001-02-20 | Bridgestone Corporation | Extended polymer compostion derived from blends of elastomers and syndiotactic polystyrene |
JP3666839B2 (ja) * | 1998-01-23 | 2005-06-29 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物およびその製造方法 |
JP5535869B2 (ja) * | 2010-10-21 | 2014-07-02 | 明和化成株式会社 | ノボラック型フェノール樹脂およびこれを含むフォトレジスト組成物 |
JP2013195497A (ja) * | 2012-03-16 | 2013-09-30 | Sumitomo Bakelite Co Ltd | フォトレジスト用樹脂組成物 |
US8822123B2 (en) | 2012-07-13 | 2014-09-02 | Momentive Specialty Chemicals Inc. | Polymeric materials and methods for making the polymeric materials |
WO2017069063A1 (ja) * | 2015-10-19 | 2017-04-27 | 日産化学工業株式会社 | 長鎖アルキル基含有ノボラックを含むレジスト下層膜形成組成物 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5238774A (en) * | 1985-08-07 | 1993-08-24 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive composition containing 1,2-quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent |
JPH0654384B2 (ja) * | 1985-08-09 | 1994-07-20 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物 |
JP2577908B2 (ja) * | 1987-04-20 | 1997-02-05 | 日本ゼオン株式会社 | ポジ型フオトレジスト組成物 |
NO891063L (no) * | 1988-03-31 | 1989-10-02 | Thiokol Morton Inc | Novolakharpikser av blandede aldehyder og positive fotoresistmaterialer fremstilt fra slike harpikser. |
DE68928823T2 (de) * | 1988-07-07 | 1999-02-25 | Sumitomo Chemical Co | Strahlungsempfindliche, positiv arbeitende Resistzusammensetzung |
CA2024312A1 (en) * | 1989-09-05 | 1991-03-06 | Haruyoshi Osaki | Radiation-sensitive positive resist composition |
JP2814721B2 (ja) * | 1989-09-05 | 1998-10-27 | 住友化学工業株式会社 | ポジ型感放射線性レジスト組成物 |
US5215856A (en) * | 1989-09-19 | 1993-06-01 | Ocg Microelectronic Materials, Inc. | Tris-(hydroxyphenyl) lower alkane compounds as sensitivity enhancers for o-quinonediazide containing radiation-sensitive compositions and elements |
JP2567282B2 (ja) * | 1989-10-02 | 1996-12-25 | 日本ゼオン株式会社 | ポジ型レジスト組成物 |
JPH061377B2 (ja) * | 1989-12-28 | 1994-01-05 | 日本ゼオン株式会社 | ポジ型レジスト組成物 |
-
1992
- 1992-05-27 JP JP4134863A patent/JPH05323605A/ja active Pending
-
1993
- 1993-05-14 CA CA002096317A patent/CA2096317A1/en not_active Abandoned
- 1993-05-18 TW TW082103879A patent/TW275670B/zh active
- 1993-05-22 KR KR1019930008879A patent/KR100255879B1/ko not_active IP Right Cessation
- 1993-05-26 MX MX9303080A patent/MX9303080A/es not_active IP Right Cessation
- 1993-05-26 EP EP93108525A patent/EP0571989B1/en not_active Expired - Lifetime
- 1993-05-26 DE DE69308634T patent/DE69308634T2/de not_active Expired - Fee Related
- 1993-05-27 US US08/067,933 patent/US5451484A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69308634D1 (de) | 1997-04-17 |
EP0571989A3 (en) | 1994-11-02 |
US5451484A (en) | 1995-09-19 |
KR100255879B1 (ko) | 2000-06-01 |
JPH05323605A (ja) | 1993-12-07 |
DE69308634T2 (de) | 1997-07-10 |
EP0571989B1 (en) | 1997-03-12 |
EP0571989A2 (en) | 1993-12-01 |
TW275670B (es) | 1996-05-11 |
KR930023767A (ko) | 1993-12-21 |
CA2096317A1 (en) | 1993-11-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG | Grant or registration | ||
MM | Annulment or lapse due to non-payment of fees |