KR950009350A - 감방사선성 조성물 - Google Patents

감방사선성 조성물 Download PDF

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Publication number
KR950009350A
KR950009350A KR1019940023956A KR19940023956A KR950009350A KR 950009350 A KR950009350 A KR 950009350A KR 1019940023956 A KR1019940023956 A KR 1019940023956A KR 19940023956 A KR19940023956 A KR 19940023956A KR 950009350 A KR950009350 A KR 950009350A
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KR
South Korea
Prior art keywords
sensitive composition
radiation sensitive
pigment
radiation
relates
Prior art date
Application number
KR1019940023956A
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English (en)
Other versions
KR100332326B1 (ko
Inventor
유우스께 다지마
노부오 벳쇼
히로아끼 네모또
후미네 시따니
Original Assignee
마쯔모또 에이이찌
니혼 고오세이 고무 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 마쯔모또 에이이찌, 니혼 고오세이 고무 가부시끼가이샤 filed Critical 마쯔모또 에이이찌
Publication of KR950009350A publication Critical patent/KR950009350A/ko
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Publication of KR100332326B1 publication Critical patent/KR100332326B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

본 발명은 (A) (A-1) 알콜성 히드록시기를 함유하는 모노머 및 (A-3) 이들과 공중합 가능한 다른 모노머의 공중합체인 바인더 폴리머, (B) 안료, 및 (C) 감방사선성 화합물을 함유하는 감방사선성 조성물에 관한 것으로서, 바탕 오염이 발생되기 어려우며, 형성된 화소가 유리 기판으로의 밀착성에 우수한 안료 분산형 컬러 필터용 조성물로서 바람직하게 사용되는 감방사선성 조성물을 제공한다.

Description

감방사선성 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (1)

  1. (A) (A-1)알콜성 히드록시기를 함유하는 모노머,(A-2) 매크로 모노머 및(A-3)이들과 공중합 가능한 다른 모노머의 공중합체인 바인더 폴리머, (B) 안료 및 (C)감방사선성 화합물을 함유하는 것을 특징으로 하는 감방사선 조성물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940023956A 1993-09-24 1994-09-23 감방사선성조성물 KR100332326B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP93-261877 1993-09-24
JP26187793 1993-09-24

Publications (2)

Publication Number Publication Date
KR950009350A true KR950009350A (ko) 1995-04-21
KR100332326B1 KR100332326B1 (ko) 2002-11-30

Family

ID=17368008

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940023956A KR100332326B1 (ko) 1993-09-24 1994-09-23 감방사선성조성물

Country Status (4)

Country Link
US (1) US5847015A (ko)
EP (1) EP0645678B1 (ko)
KR (1) KR100332326B1 (ko)
DE (1) DE69408761T2 (ko)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140089917A (ko) 2013-01-08 2014-07-16 동우 화인켐 주식회사 착색 감광성 수지 조성물
KR20180051291A (ko) 2016-11-08 2018-05-16 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 화상표시장치
KR20190107370A (ko) 2018-03-12 2019-09-20 동우 화인켐 주식회사 녹색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치

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JP3824285B2 (ja) * 1997-03-14 2006-09-20 富士写真フイルム株式会社 感放射線性着色組成物
EP1033625A1 (en) * 1997-07-24 2000-09-06 JSR Corporation Radiation sensitive composition
US6642963B1 (en) * 1998-06-29 2003-11-04 Intel Corporation Silylation layer for optical devices
US6162842A (en) * 1999-05-18 2000-12-19 The Goodyear Tire & Rubber Company Radiation curable coating composition
US20040058276A1 (en) * 2002-09-23 2004-03-25 Dueber Thomas E. Halo resistent, photoimagable coverlay compositions, having, advantageous application and removal properties, and methods relating thereto
JP2005228997A (ja) * 2004-02-13 2005-08-25 Matsushita Electric Ind Co Ltd 固体撮像装置およびその製造方法
KR100839046B1 (ko) * 2006-12-14 2008-06-19 제일모직주식회사 액정표시소자용 감광성 수지 조성물, 이를　이용하여제조된 칼럼 스페이서 및 그 칼럼 스페이서를 포함하는디스플레이 장치
EP2116527A4 (en) 2007-01-23 2011-09-14 Fujifilm Corp OXIME COMPOUND, PHOTOSENSITIVE COMPOSITION, COLOR FILTER, METHOD FOR MANUFACTURING THE COLOR FILTER, AND LIQUID CRYSTAL DISPLAY ELEMENT
JP2008241744A (ja) 2007-03-23 2008-10-09 Fujifilm Corp カラーフィルタの製造方法
KR101526619B1 (ko) 2007-05-11 2015-06-05 바스프 에스이 옥심 에스테르 광개시제
US8911921B2 (en) 2007-05-11 2014-12-16 Ciba Corporation Oxime ester photoinitiators
US20090086064A1 (en) * 2007-09-27 2009-04-02 Micron Technology, Inc. Dynamic adaptive color filter array
WO2010108835A1 (en) 2009-03-23 2010-09-30 Basf Se Photoresist composition
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
TWI520940B (zh) 2010-10-05 2016-02-11 巴地斯顏料化工廠 肟酯
WO2012101245A1 (en) 2011-01-28 2012-08-02 Basf Se Polymerizable composition comprising an oxime sulfonate as thermal curing agent
CN103998427A (zh) 2011-12-07 2014-08-20 巴斯夫欧洲公司 肟酯光敏引发剂
WO2013167515A1 (en) 2012-05-09 2013-11-14 Basf Se Oxime ester photoinitiators
US10234761B2 (en) 2013-07-08 2019-03-19 Basf Se Oxime ester photoinitiators
WO2015036910A1 (en) 2013-09-10 2015-03-19 Basf Se Oxime ester photoinitiators
JP6664383B2 (ja) 2014-08-29 2020-03-13 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ オキシムスルホネート誘導体
TWI675907B (zh) 2015-01-21 2019-11-01 日商Ｊｓｒ股份有限公司 固體攝像裝置
CN107207456B (zh) 2015-02-02 2021-05-04 巴斯夫欧洲公司 潜酸及其用途
US10272426B2 (en) 2015-04-21 2019-04-30 Jsr Corporation Method of producing microfluidic device, microfluidic device, and photosensitive resin composition
US20220121113A1 (en) 2019-01-23 2022-04-21 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
JP2023517304A (ja) 2020-03-04 2023-04-25 ベーアーエスエフ・エスエー オキシムエステル光開始剤

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US3759875A (en) * 1971-10-12 1973-09-18 J Guthrie Curable liquid pigment composition and method
JPS543482B2 (ko) * 1972-10-14 1979-02-23
US4673705A (en) * 1985-04-05 1987-06-16 Desoto, Inc. Radiation-curable coatings containing reactive pigment dispersants
DE3706561A1 (de) * 1987-02-28 1988-09-08 Basf Ag Lichtempfindliches aufzeichnungsmaterial mit erhoehter flexibilitaet
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JP3094403B2 (ja) * 1992-03-27 2000-10-03 ジェイエスアール株式会社 顔料分散型カラーフィルター用組成物

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140089917A (ko) 2013-01-08 2014-07-16 동우 화인켐 주식회사 착색 감광성 수지 조성물
KR20180051291A (ko) 2016-11-08 2018-05-16 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 화상표시장치
KR20190107370A (ko) 2018-03-12 2019-09-20 동우 화인켐 주식회사 녹색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치
KR20230026369A (ko) 2018-03-12 2023-02-24 동우 화인켐 주식회사 녹색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치

Also Published As

Publication number Publication date
DE69408761D1 (de) 1998-04-09
US5847015A (en) 1998-12-08
DE69408761T2 (de) 1998-08-27
EP0645678A1 (en) 1995-03-29
EP0645678B1 (en) 1998-03-04
KR100332326B1 (ko) 2002-11-30

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