DE69027192D1 - Strahlungsempfindliche, positivarbeitende Schutzlackzusammensetzung - Google Patents

Strahlungsempfindliche, positivarbeitende Schutzlackzusammensetzung

Info

Publication number
DE69027192D1
DE69027192D1 DE69027192T DE69027192T DE69027192D1 DE 69027192 D1 DE69027192 D1 DE 69027192D1 DE 69027192 T DE69027192 T DE 69027192T DE 69027192 T DE69027192 T DE 69027192T DE 69027192 D1 DE69027192 D1 DE 69027192D1
Authority
DE
Germany
Prior art keywords
radiation sensitive
protective lacquer
positive working
lacquer composition
working protective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69027192T
Other languages
English (en)
Other versions
DE69027192T2 (de
Inventor
Takeshi Hioki
Seiko Kurio
Yasunori Uetani
Yasunori Doi
Hiroshi Moriuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Publication of DE69027192D1 publication Critical patent/DE69027192D1/de
Application granted granted Critical
Publication of DE69027192T2 publication Critical patent/DE69027192T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE69027192T 1989-12-27 1990-12-21 Strahlungsempfindliche, positivarbeitende Schutzlackzusammensetzung Expired - Fee Related DE69027192T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP34146389 1989-12-27
JP17569890 1990-07-02
JP17896890 1990-07-05

Publications (2)

Publication Number Publication Date
DE69027192D1 true DE69027192D1 (de) 1996-07-04
DE69027192T2 DE69027192T2 (de) 1997-01-23

Family

ID=27324152

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69027192T Expired - Fee Related DE69027192T2 (de) 1989-12-27 1990-12-21 Strahlungsempfindliche, positivarbeitende Schutzlackzusammensetzung

Country Status (7)

Country Link
US (1) US5407780A (de)
EP (1) EP0435181B1 (de)
JP (1) JP3063148B2 (de)
KR (1) KR910012818A (de)
CA (1) CA2032884A1 (de)
DE (1) DE69027192T2 (de)
MX (1) MX172758B (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2927014B2 (ja) * 1990-02-20 1999-07-28 ジェイエスアール株式会社 感放射線性樹脂組成物
JP2743697B2 (ja) * 1991-04-26 1998-04-22 日本ゼオン株式会社 ポジ型レジスト組成物
JP3182823B2 (ja) * 1991-12-27 2001-07-03 住友化学工業株式会社 ポジ型レジスト組成物
JP3329026B2 (ja) * 1993-10-19 2002-09-30 住友化学工業株式会社 ポジ型フォトレジスト組成物
DE4401940A1 (de) * 1994-01-24 1995-07-27 Hoechst Ag Positiv arbeitendes Aufzeichnungsmaterial mit verbesserter Entwickelbarkeit
JP3278306B2 (ja) * 1994-10-31 2002-04-30 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
US5750632A (en) * 1994-12-30 1998-05-12 Clariant Finance (Bvi) Limited Isolation of novolak resin by low temperature sub surface forced steam distillation
JPH0990622A (ja) * 1995-09-22 1997-04-04 Fuji Photo Film Co Ltd ポジ型フォトレジスト組成物
JP3076523B2 (ja) * 1996-03-25 2000-08-14 東京応化工業株式会社 ポジ型ホトレジスト組成物
US6733949B2 (en) * 2002-04-11 2004-05-11 Clariant Finance (Bvi) Limited Novolak resin mixtures and photosensitive compositions comprising the same
JP4317875B2 (ja) * 2003-03-11 2009-08-19 フジフィルム・エレクトロニック・マテリアルズ・ユーエスエイ・インコーポレイテッド 新規な感光性樹脂組成物

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4123279A (en) * 1974-03-25 1978-10-31 Fuji Photo Film Co., Ltd. Light-sensitive o-quinonediazide containing planographic printing plate
JPS5723253B2 (de) * 1974-03-25 1982-05-18
JPS54116218A (en) * 1978-03-02 1979-09-10 Oji Paper Co Photosensitive composition
US4308368A (en) * 1979-03-16 1981-12-29 Daicel Chemical Industries Ltd. Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide
JPS55123614A (en) * 1979-03-16 1980-09-24 Daicel Chem Ind Ltd Photosensitive resin and positive type-photosensitive resin composition
JPS55127553A (en) * 1979-03-27 1980-10-02 Daicel Chem Ind Ltd Photosensitive composition
JPS5723253A (en) * 1980-07-17 1982-02-06 Toshiba Corp Semiconductor device
DE3174017D1 (en) * 1980-12-17 1986-04-10 Konishiroku Photo Ind Photosensitive compositions
JPS616647A (ja) * 1984-06-20 1986-01-13 Konishiroku Photo Ind Co Ltd ポジ型感光性平版印刷版用感光性組成物
JPH0654384B2 (ja) * 1985-08-09 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
JPS6260407A (ja) * 1985-09-09 1987-03-17 株式会社東芝 ガス絶縁開閉装置
DE3751743T2 (de) * 1986-03-28 1996-11-14 Japan Synthetic Rubber Co Ltd Positiv arbeitende photoempfindliche Kunststoffzusammensetzung
JPH0654386B2 (ja) * 1986-03-28 1994-07-20 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物
JPS62230146A (ja) * 1986-03-31 1987-10-08 Toshiba Electric Equip Corp 呼び出し・応答機能を有する親子式電話システム
JPH0654388B2 (ja) * 1986-05-02 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
JPH0654387B2 (ja) * 1986-05-02 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
JPH0656487B2 (ja) * 1986-05-02 1994-07-27 東京応化工業株式会社 ポジ型ホトレジスト用組成物
JP2590342B2 (ja) * 1986-11-08 1997-03-12 住友化学工業株式会社 ポジ型フォトレジスト用ノボラック樹脂及びそれを含有するポジ型フォトレジスト組成物
JP2555620B2 (ja) * 1987-08-21 1996-11-20 日本合成ゴム株式会社 感放射線性樹脂組成物
JP2693472B2 (ja) * 1987-11-26 1997-12-24 株式会社東芝 レジスト
JPH01180535A (ja) * 1988-01-12 1989-07-18 Konica Corp 感光性組成物
US4920028A (en) * 1988-03-31 1990-04-24 Morton Thiokol, Inc. High contrast high thermal stability positive photoresists with mixed cresol and hydroxybenzaldehyde prepared novolak and photosensitive diazoquinone
US4983492A (en) * 1988-06-06 1991-01-08 Shipley Company Inc. Positive dye photoresist compositions with 2,4-bis(phenylazo)resorcinol
EP0358871B1 (de) * 1988-07-07 1998-09-30 Sumitomo Chemical Company, Limited Strahlungsempfindliche, positiv arbeitende Resistzusammensetzung
US5001040A (en) * 1988-07-11 1991-03-19 Olin Hunt Specialty Products Inc. Process of forming resist image in positive photoresist with thermally stable phenolic resin
JP2646701B2 (ja) * 1988-09-28 1997-08-27 三菱化学株式会社 ポリアルケニルフエノール化合物

Also Published As

Publication number Publication date
CA2032884A1 (en) 1991-06-28
MX172758B (es) 1994-01-11
EP0435181A2 (de) 1991-07-03
JPH04174438A (ja) 1992-06-22
KR910012818A (ko) 1991-08-08
EP0435181B1 (de) 1996-05-29
US5407780A (en) 1995-04-18
DE69027192T2 (de) 1997-01-23
EP0435181A3 (en) 1991-11-06
JP3063148B2 (ja) 2000-07-12

Similar Documents

Publication Publication Date Title
DE68928823D1 (de) Strahlungsempfindliche, positiv arbeitende Resistzusammensetzung
FR2655413B1 (fr) Blindage de protection balistique.
DE69026340T2 (de) Strahlungsempfindliche Harzzusammensetzung
DE69014182T3 (de) Schutzlack-Zusammensetzung.
DE69408761D1 (de) Strahlungsempfindliche Zusammensetzung
DE68907271T2 (de) Schutzbekleidung.
DE69015571D1 (de) Strahlungshärtbare Beschichtungszusammensetzung.
DE68916614D1 (de) Kolbenschutzkappe.
DE69027192T2 (de) Strahlungsempfindliche, positivarbeitende Schutzlackzusammensetzung
DE69130896T2 (de) Strahlungsempfindliche positiv arbeitende Lackzusammensetzung
DE69016757D1 (de) Strahlenschutzaufbau.
NO892943L (no) Beskyttelseshjelm.
DE68927315D1 (de) Schutzlack-Zusammensetzung
DE68913898D1 (de) Strahlungsempfindliche Harzzusammensetzungen.
DE69007207D1 (de) Korrosionsschutzpigment.
DE69030699T2 (de) Positiv arbeitende strahlungsempfindliche Harzzusammensetzung
DE69032830T2 (de) Strahlungsempfindliche positiv-arbeitende Resistmasse
ATA275989A (de) Schutzverbauung, insbesondere gegen lawinen
IT9022097A0 (it) Calotta di protezione
DE68908146T2 (de) Schutzstoff gegen strahleneffekte.
DE59002626D1 (de) Schutzkappe.
DE59006835D1 (de) Temporärer Schutzüberzug.
DE9018115U1 (de) Schutzhaube
SE8800543D0 (sv) Stralningsskydd for ogon
NO893127D0 (no) Vernehjelm.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee