DE69032830T2 - Strahlungsempfindliche positiv-arbeitende Resistmasse - Google Patents

Strahlungsempfindliche positiv-arbeitende Resistmasse

Info

Publication number
DE69032830T2
DE69032830T2 DE69032830T DE69032830T DE69032830T2 DE 69032830 T2 DE69032830 T2 DE 69032830T2 DE 69032830 T DE69032830 T DE 69032830T DE 69032830 T DE69032830 T DE 69032830T DE 69032830 T2 DE69032830 T2 DE 69032830T2
Authority
DE
Germany
Prior art keywords
radiation sensitive
positive working
working resist
sensitive positive
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69032830T
Other languages
English (en)
Other versions
DE69032830D1 (de
Inventor
Haruyoshi Osaki
Yasunori Uetani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Application granted granted Critical
Publication of DE69032830D1 publication Critical patent/DE69032830D1/de
Publication of DE69032830T2 publication Critical patent/DE69032830T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
DE69032830T 1989-09-05 1990-09-04 Strahlungsempfindliche positiv-arbeitende Resistmasse Expired - Fee Related DE69032830T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23116589 1989-09-05

Publications (2)

Publication Number Publication Date
DE69032830D1 DE69032830D1 (de) 1999-01-28
DE69032830T2 true DE69032830T2 (de) 1999-05-12

Family

ID=16919333

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69032830T Expired - Fee Related DE69032830T2 (de) 1989-09-05 1990-09-04 Strahlungsempfindliche positiv-arbeitende Resistmasse

Country Status (5)

Country Link
EP (1) EP0416544B1 (de)
KR (1) KR910006779A (de)
CA (1) CA2024312A1 (de)
DE (1) DE69032830T2 (de)
MX (1) MX22224A (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5296330A (en) * 1991-08-30 1994-03-22 Ciba-Geigy Corp. Positive photoresists containing quinone diazide photosensitizer, alkali-soluble resin and tetra(hydroxyphenyl) alkane additive
JP2753912B2 (ja) * 1992-02-12 1998-05-20 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5318875A (en) * 1992-02-12 1994-06-07 Fuji Photo Film Co., Ltd. Positive quinonediazide photoresist composition containing select hydroxyphenol additive
JPH05323605A (ja) * 1992-05-27 1993-12-07 Sumitomo Chem Co Ltd ポジ型レジスト組成物
JPH05323604A (ja) * 1992-05-27 1993-12-07 Sumitomo Chem Co Ltd ポジ型レジスト組成物
US5275911A (en) * 1993-02-01 1994-01-04 Ocg Microelectronic Materials, Inc. Sesamol/aldehyde condensation products as sensitivity enhancers for radiation sensitive mixtures
EP0632003B1 (de) * 1993-06-30 1998-01-14 Fuji Photo Film Co., Ltd. Phenolverbindungen, die Methoxymethylgruppen oder Hydroxymethylgruppen enthalten

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06434B2 (ja) * 1985-05-24 1994-01-05 旭電化工業株式会社 感熱記録体
JPS63261265A (ja) * 1987-04-18 1988-10-27 Oki Electric Ind Co Ltd 電子写真用感光体
JPS63261256A (ja) * 1987-04-20 1988-10-27 Nippon Zeon Co Ltd ポジ型フオトレジスト組成物
JP2577908B2 (ja) * 1987-04-20 1997-02-05 日本ゼオン株式会社 ポジ型フオトレジスト組成物

Also Published As

Publication number Publication date
KR910006779A (ko) 1991-04-30
MX22224A (es) 1993-10-01
EP0416544A3 (en) 1991-11-13
EP0416544B1 (de) 1998-12-16
EP0416544A2 (de) 1991-03-13
DE69032830D1 (de) 1999-01-28
CA2024312A1 (en) 1991-03-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee