DE68927315D1 - Schutzlack-Zusammensetzung - Google Patents
Schutzlack-ZusammensetzungInfo
- Publication number
- DE68927315D1 DE68927315D1 DE68927315T DE68927315T DE68927315D1 DE 68927315 D1 DE68927315 D1 DE 68927315D1 DE 68927315 T DE68927315 T DE 68927315T DE 68927315 T DE68927315 T DE 68927315T DE 68927315 D1 DE68927315 D1 DE 68927315D1
- Authority
- DE
- Germany
- Prior art keywords
- protective lacquer
- lacquer composition
- composition
- protective
- lacquer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Phenolic Resins Or Amino Resins (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63182434A JP2636348B2 (ja) | 1988-07-20 | 1988-07-20 | ポジ型レジスト用組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68927315D1 true DE68927315D1 (de) | 1996-11-14 |
DE68927315T2 DE68927315T2 (de) | 1997-02-20 |
Family
ID=16118201
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE68927315T Expired - Fee Related DE68927315T2 (de) | 1988-07-20 | 1989-07-20 | Schutzlack-Zusammensetzung |
Country Status (6)
Country | Link |
---|---|
US (1) | US5124228A (de) |
EP (1) | EP0351849B1 (de) |
JP (1) | JP2636348B2 (de) |
KR (1) | KR0131761B1 (de) |
CA (1) | CA1337627C (de) |
DE (1) | DE68927315T2 (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2715480B2 (ja) * | 1988-10-13 | 1998-02-18 | 住友化学工業株式会社 | ポジ型レジスト用組成物 |
JP2700918B2 (ja) * | 1989-04-26 | 1998-01-21 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
US5322757A (en) * | 1989-09-08 | 1994-06-21 | Ocg Microelectronic Materials, Inc. | Positive photoresists comprising a novolak resin made from 2,3-dimethyl phenol,2,3,5-trimethylphenol and aldehyde with no meta-cresol present |
EP0525185B1 (de) * | 1991-01-11 | 1997-07-16 | Sumitomo Chemical Company Limited | Positivresistzusammensetzung |
DE4209343A1 (de) * | 1992-03-23 | 1993-09-30 | Hoechst Ag | 1,2-Naphthochinon-2-diazid-sulfonsäureester, damit hergestelltes strahlungsempfindliches Gemisch und strahlungsempfindliches Aufzeichnungsmaterial |
US6280910B1 (en) | 1992-11-23 | 2001-08-28 | Pioneer Electronic Corporation | Photoresist for optical disc and method of preparing optical disc utilizing photoresist |
US5592143A (en) * | 1994-07-25 | 1997-01-07 | Romney; Julie B. | Pulsed-tone timing exercise method |
EP0695740B1 (de) | 1994-08-05 | 2000-11-22 | Sumitomo Chemical Company Limited | Sulfonsäurechinondiazidester und diese enthaltende positiv-arbeitende Fotolackzusammensetzungen |
KR100354730B1 (ko) * | 1994-09-12 | 2003-10-17 | 지멘스 악티엔게젤샤프트 | 구조를형성하는포토리소그래피방법 |
EP0797792B1 (de) * | 1994-09-12 | 1998-11-18 | Siemens Aktiengesellschaft | Photolithographische strukturerzeugung |
US5619663A (en) * | 1994-09-16 | 1997-04-08 | Philips Electronics North America Corp. | Computer instruction prefetch system |
KR20060090519A (ko) * | 2005-02-07 | 2006-08-11 | 삼성전자주식회사 | 포토레지스트 조성물, 상기 포토레지스트 조성물을 이용한층상 부재 형성 방법 및 박막 트랜지스터 표시판의 제조방법 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3100077A1 (de) * | 1981-01-03 | 1982-08-05 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters |
JPS58150948A (ja) * | 1982-03-03 | 1983-09-07 | Dainippon Ink & Chem Inc | 感光性組成物 |
US4526856A (en) * | 1983-05-23 | 1985-07-02 | Allied Corporation | Low striation positive diazoketone resist composition with cyclic ketone(s) and aliphatic alcohol as solvents |
JPS60121445A (ja) * | 1983-12-06 | 1985-06-28 | Japan Synthetic Rubber Co Ltd | 集積回路作製用ポジ型感光性樹脂組成物 |
US4626492A (en) * | 1985-06-04 | 1986-12-02 | Olin Hunt Specialty Products, Inc. | Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound |
JPH0654381B2 (ja) * | 1985-12-24 | 1994-07-20 | 日本合成ゴム株式会社 | 集積回路作製用ポジ型レジスト |
JPS62153950A (ja) * | 1985-12-27 | 1987-07-08 | Japan Synthetic Rubber Co Ltd | ポジ型感放射線性樹脂組成物 |
JP2568827B2 (ja) * | 1986-10-29 | 1997-01-08 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
JP2590342B2 (ja) * | 1986-11-08 | 1997-03-12 | 住友化学工業株式会社 | ポジ型フォトレジスト用ノボラック樹脂及びそれを含有するポジ型フォトレジスト組成物 |
JP2558716B2 (ja) * | 1987-07-10 | 1996-11-27 | 東洋合成工業株式会社 | ポジ型ホトレジスト組成物 |
US4837121A (en) * | 1987-11-23 | 1989-06-06 | Olin Hunt Specialty Products Inc. | Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin |
JP2569650B2 (ja) * | 1987-12-15 | 1997-01-08 | 日本合成ゴム株式会社 | 感放射線性樹脂組成物 |
-
1988
- 1988-07-20 JP JP63182434A patent/JP2636348B2/ja not_active Expired - Fee Related
-
1989
- 1989-07-18 US US07/381,298 patent/US5124228A/en not_active Expired - Fee Related
- 1989-07-19 CA CA000606171A patent/CA1337627C/en not_active Expired - Fee Related
- 1989-07-20 EP EP89113345A patent/EP0351849B1/de not_active Expired - Lifetime
- 1989-07-20 DE DE68927315T patent/DE68927315T2/de not_active Expired - Fee Related
- 1989-07-20 KR KR1019890010311A patent/KR0131761B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP2636348B2 (ja) | 1997-07-30 |
KR0131761B1 (ko) | 1998-04-13 |
US5124228A (en) | 1992-06-23 |
JPH0232352A (ja) | 1990-02-02 |
EP0351849A2 (de) | 1990-01-24 |
EP0351849A3 (de) | 1991-04-03 |
KR900002125A (ko) | 1990-02-28 |
EP0351849B1 (de) | 1996-10-09 |
DE68927315T2 (de) | 1997-02-20 |
CA1337627C (en) | 1995-11-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |