MX9201327A - Compuesto de fenol polihidrico y composicion de capa protectora positiva que comprende tal compuesto. - Google Patents

Compuesto de fenol polihidrico y composicion de capa protectora positiva que comprende tal compuesto.

Info

Publication number
MX9201327A
MX9201327A MX9201327A MX9201327A MX9201327A MX 9201327 A MX9201327 A MX 9201327A MX 9201327 A MX9201327 A MX 9201327A MX 9201327 A MX9201327 A MX 9201327A MX 9201327 A MX9201327 A MX 9201327A
Authority
MX
Mexico
Prior art keywords
composition
polyhydrical
phenol
compound
protective layer
Prior art date
Application number
MX9201327A
Other languages
English (en)
Inventor
Jun Tomioka
Yasunori Uetani
Hirotoshi Nakanishi
Ryotaro Hanawa
Ayako Ida
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of MX9201327A publication Critical patent/MX9201327A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D311/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
    • C07D311/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D311/04—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D311/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
    • C07D311/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D311/04—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring
    • C07D311/58—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring other than with oxygen or sulphur atoms in position 2 or 4
    • C07D311/64—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring other than with oxygen or sulphur atoms in position 2 or 4 with oxygen atoms directly attached in position 8
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Pyrane Compounds (AREA)
MX9201327A 1991-03-25 1992-03-25 Compuesto de fenol polihidrico y composicion de capa protectora positiva que comprende tal compuesto. MX9201327A (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3060024A JP3070116B2 (ja) 1991-03-25 1991-03-25 多価フェノール化合物およびそれを用いてなるポジ型レジスト組成物

Publications (1)

Publication Number Publication Date
MX9201327A true MX9201327A (es) 1992-10-30

Family

ID=13130088

Family Applications (1)

Application Number Title Priority Date Filing Date
MX9201327A MX9201327A (es) 1991-03-25 1992-03-25 Compuesto de fenol polihidrico y composicion de capa protectora positiva que comprende tal compuesto.

Country Status (7)

Country Link
US (3) US5436107A (es)
EP (1) EP0505987B1 (es)
JP (1) JP3070116B2 (es)
KR (1) KR100198185B1 (es)
CA (1) CA2062861A1 (es)
DE (1) DE69216884T2 (es)
MX (1) MX9201327A (es)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5342734A (en) * 1992-02-25 1994-08-30 Morton International, Inc. Deep UV sensitive photoresist resistant to latent image decay
JP3232673B2 (ja) * 1992-08-07 2001-11-26 住友化学工業株式会社 多価フェノール化合物の製造方法
JP3528242B2 (ja) * 1994-06-23 2004-05-17 住友化学工業株式会社 ヒドロキシフラバン化合物の製造方法
DE69519455T2 (de) 1994-08-05 2001-06-28 Sumitomo Chemical Co., Ltd. Chinondiazidsulfonsäureester und diese enthaltende,positiv arbeitende Photoresistzusammensetzungen
US5726257A (en) * 1994-08-30 1998-03-10 Sumitomo Chemical Company, Ltd. Esterified resorcinol-carbonyl compound condensates and epoxy resins therewith
JP3444562B2 (ja) * 1995-03-28 2003-09-08 東京応化工業株式会社 レジスト溶液の調製方法
JP3427562B2 (ja) * 1995-05-09 2003-07-22 住友化学工業株式会社 ポジ型レジスト組成物
TW475926B (en) * 1996-06-06 2002-02-11 Sumitomo Chemical Co Novel ester compound and thermosetting resin composition using the same
US6040107A (en) * 1998-02-06 2000-03-21 Olin Microelectronic Chemicals, Inc. Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures
US7604151B2 (en) * 2007-03-15 2009-10-20 Ethicon Endo-Surgery, Inc. Surgical stapling systems and staple cartridges for deploying surgical staples with tissue compression features
EP3110305B1 (en) 2014-02-27 2021-09-01 University Surgical Associates, Inc. Interactive display for surgery

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE68927140T2 (de) * 1988-06-13 1997-04-30 Sumitomo Chemical Co Photolackzusammensetzung
JP2715480B2 (ja) * 1988-10-13 1998-02-18 住友化学工業株式会社 ポジ型レジスト用組成物

Also Published As

Publication number Publication date
JP3070116B2 (ja) 2000-07-24
DE69216884D1 (de) 1997-03-06
US5587492A (en) 1996-12-24
US5436107A (en) 1995-07-25
KR100198185B1 (ko) 1999-06-15
EP0505987B1 (en) 1997-01-22
DE69216884T2 (de) 1997-06-26
CA2062861A1 (en) 1992-09-26
JPH04295472A (ja) 1992-10-20
US5714620A (en) 1998-02-03
EP0505987A1 (en) 1992-09-30
KR920018040A (ko) 1992-10-21

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