MX9302019A - Compuestos de carbonato ciclicos, proceso para su produccion y composicion de capa fotosensible que comprende tales compuestos. - Google Patents

Compuestos de carbonato ciclicos, proceso para su produccion y composicion de capa fotosensible que comprende tales compuestos.

Info

Publication number
MX9302019A
MX9302019A MX9302019A MX9302019A MX9302019A MX 9302019 A MX9302019 A MX 9302019A MX 9302019 A MX9302019 A MX 9302019A MX 9302019 A MX9302019 A MX 9302019A MX 9302019 A MX9302019 A MX 9302019A
Authority
MX
Mexico
Prior art keywords
compounds
cyclic carbonate
production
photosensitive layer
layer composition
Prior art date
Application number
MX9302019A
Other languages
English (en)
Inventor
Takehiro Kusumoto
Yuji Ueda
Naoki Takeyama
Hiromi Ueki
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of MX9302019A publication Critical patent/MX9302019A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/96—Esters of carbonic or haloformic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

Esta invención se refiere a un procedimiento para la producción de un compuesto de carbonato cíclico, representado por la siguiente (I), o similar , que es útil como un inhibidor de disolución para el uso en una substancia fotoendurecible, positiva, que comprende el compuesto de carbonato cíclico, una resina soluble en álcali y un precursor de ácido fotoinducido. Esta composición de una sustancia fotoendurecible positiva, excelente en las efectividades tales como la resolución, perfil, sensibilidad, etc.
MX9302019A 1992-04-10 1993-04-07 Compuestos de carbonato ciclicos, proceso para su produccion y composicion de capa fotosensible que comprende tales compuestos. MX9302019A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP9077092 1992-04-10
JP5005792A JPH0692909A (ja) 1992-04-10 1993-01-18 炭酸エステル環状化合物、その製造方法及びそれを用いてなるポジ型フォトレジスト組成物

Publications (1)

Publication Number Publication Date
MX9302019A true MX9302019A (es) 1994-06-30

Family

ID=26339792

Family Applications (1)

Application Number Title Priority Date Filing Date
MX9302019A MX9302019A (es) 1992-04-10 1993-04-07 Compuestos de carbonato ciclicos, proceso para su produccion y composicion de capa fotosensible que comprende tales compuestos.

Country Status (8)

Country Link
US (2) US5397679A (es)
EP (1) EP0569707B1 (es)
JP (1) JPH0692909A (es)
KR (1) KR930021602A (es)
CA (1) CA2092783A1 (es)
DE (1) DE69303973T2 (es)
MX (1) MX9302019A (es)
TW (1) TW268107B (es)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0537524A1 (en) 1991-10-17 1993-04-21 Shipley Company Inc. Radiation sensitive compositions and methods
DE4336009A1 (de) * 1992-10-21 1994-04-28 Fuji Photo Film Co Ltd Lichtempfindliche Zusammensetzung vom Positiv-Typ
US5876895A (en) * 1992-12-24 1999-03-02 Sumitomo Chemical Company, Limited Photosensitive resin composition for color filter
JPH06214395A (ja) * 1993-01-18 1994-08-05 Sumitomo Chem Co Ltd ポジ型フォトレジスト組成物
KR960015081A (ko) * 1993-07-15 1996-05-22 마쯔모또 에이이찌 화학증폭형 레지스트 조성물
JP3393915B2 (ja) * 1994-03-04 2003-04-07 住友化学工業株式会社 化学増幅型レジスト組成物
US5824451A (en) * 1994-07-04 1998-10-20 Fuji Photo Film Co., Ltd. Positive photosensitive composition
JPH0934112A (ja) * 1995-05-12 1997-02-07 Sumitomo Chem Co Ltd フォトレジスト組成物
JP3382081B2 (ja) * 1995-06-01 2003-03-04 株式会社東芝 レジストおよびこれを用いたパターン形成方法
JPH0962005A (ja) * 1995-06-14 1997-03-07 Fuji Photo Film Co Ltd ネガ型感光性組成物
US6200725B1 (en) 1995-06-28 2001-03-13 Fujitsu Limited Chemically amplified resist compositions and process for the formation of resist patterns
JPH09166871A (ja) 1995-12-15 1997-06-24 Sumitomo Chem Co Ltd フォトレジスト組成物
US5821345A (en) * 1996-03-12 1998-10-13 Shipley Company, L.L.C. Thermodynamically stable photoactive compound
JP3376222B2 (ja) * 1996-10-25 2003-02-10 クラリアント インターナショナル リミテッド 放射線感応性組成物
JP3353292B2 (ja) * 1999-03-29 2002-12-03 日本電気株式会社 化学増幅系レジスト
US8158329B2 (en) * 2008-12-11 2012-04-17 Sumitomo Chemical Company, Limited Compound and chemically amplified resist composition containing the same

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0388343B1 (en) * 1989-03-14 1996-07-17 International Business Machines Corporation Chemically amplified photoresist
JP2715327B2 (ja) * 1990-01-19 1998-02-18 富士写真フイルム株式会社 感光性樹脂組成物
JPH04230754A (ja) * 1990-05-24 1992-08-19 Sumitomo Chem Co Ltd ポジ型レジスト用組成物
DE69121790T2 (de) * 1990-05-24 1997-04-10 Sumitomo Chemical Co Positivresistzusammensetzung
JP2961947B2 (ja) * 1990-06-05 1999-10-12 住友化学工業株式会社 ポジ型レジスト組成物
JPH0534914A (ja) * 1991-08-01 1993-02-12 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JP2655384B2 (ja) * 1991-11-08 1997-09-17 富士写真フイルム株式会社 ポジ型レジスト組成物
US5242734A (en) * 1991-11-19 1993-09-07 Rubin Richard J Information-conveying protective strip assembly

Also Published As

Publication number Publication date
KR930021602A (ko) 1993-11-22
EP0569707A2 (en) 1993-11-18
DE69303973D1 (de) 1996-09-19
DE69303973T2 (de) 1997-03-27
EP0569707A3 (es) 1994-01-05
CA2092783A1 (en) 1993-10-11
EP0569707B1 (en) 1996-08-14
US5397679A (en) 1995-03-14
US5420331A (en) 1995-05-30
TW268107B (es) 1996-01-11
JPH0692909A (ja) 1994-04-05

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Legal Events

Date Code Title Description
FG Grant or registration
MM Annulment or lapse due to non-payment of fees