DE69421982T2 - Positiv arbeitende Photoresistzusammensetzung - Google Patents

Positiv arbeitende Photoresistzusammensetzung

Info

Publication number
DE69421982T2
DE69421982T2 DE1994621982 DE69421982T DE69421982T2 DE 69421982 T2 DE69421982 T2 DE 69421982T2 DE 1994621982 DE1994621982 DE 1994621982 DE 69421982 T DE69421982 T DE 69421982T DE 69421982 T2 DE69421982 T2 DE 69421982T2
Authority
DE
Germany
Prior art keywords
photoresist composition
positive working
working photoresist
positive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE1994621982
Other languages
English (en)
Other versions
DE69421982D1 (de
Inventor
Yasumasa Kawabe
Kenichiro Satoh
Toshiaki Aoai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP25178193A external-priority patent/JPH07104465A/ja
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69421982D1 publication Critical patent/DE69421982D1/de
Application granted granted Critical
Publication of DE69421982T2 publication Critical patent/DE69421982T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/20—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with polyhydric phenols
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
DE1994621982 1993-09-20 1994-09-19 Positiv arbeitende Photoresistzusammensetzung Expired - Lifetime DE69421982T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP23353793 1993-09-20
JP23353893 1993-09-20
JP25178193A JPH07104465A (ja) 1993-10-07 1993-10-07 ポジ型フオトレジスト組成物
JP25178093 1993-10-07

Publications (2)

Publication Number Publication Date
DE69421982D1 DE69421982D1 (de) 2000-01-13
DE69421982T2 true DE69421982T2 (de) 2000-03-30

Family

ID=27477535

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1994621982 Expired - Lifetime DE69421982T2 (de) 1993-09-20 1994-09-19 Positiv arbeitende Photoresistzusammensetzung

Country Status (2)

Country Link
EP (1) EP0644460B1 (de)
DE (1) DE69421982T2 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5529880A (en) * 1995-03-29 1996-06-25 Shipley Company, L.L.C. Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide compound
KR101720717B1 (ko) * 2014-04-10 2017-03-28 제일모직 주식회사 포지티브형 감광성 수지 조성물, 감광성 수지막, 및 이를 이용한 표시 소자
MA52119A (fr) 2015-10-19 2018-08-29 Ncyte Corp Composés hétérocycliques utilisés comme immunomodulateurs
SG11201804152RA (en) 2015-11-19 2018-06-28 Incyte Corp Heterocyclic compounds as immunomodulators
WO2017112730A1 (en) 2015-12-22 2017-06-29 Incyte Corporation Heterocyclic compounds as immunomodulators
ES2906460T3 (es) 2016-05-06 2022-04-18 Incyte Corp Compuestos heterocíclicos como inmunomoduladores
ES2905980T3 (es) 2016-05-26 2022-04-12 Incyte Corp Compuestos heterocíclicos como inmunomoduladores
PL3472167T3 (pl) 2016-06-20 2022-12-19 Incyte Corporation Związki heterocykliczne jako immunomodulatory
ES2930092T3 (es) 2016-07-14 2022-12-07 Incyte Corp Compuestos heterocíclicos como inmunomoduladores
ES2941716T3 (es) 2016-08-29 2023-05-25 Incyte Corp Compuestos heterocíclicos como inmunomoduladores
BR112019012993A2 (pt) 2016-12-22 2019-12-03 Incyte Corp derivados de benzo-oxazol como imunomoduladores
CR20190317A (es) 2016-12-22 2019-09-13 Incyte Corp Compuestos inmunomodulares y métodos de uso
EP3558973B1 (de) 2016-12-22 2021-09-15 Incyte Corporation Pyridinderivate als immunmodulatoren
US20180179201A1 (en) 2016-12-22 2018-06-28 Incyte Corporation Heterocyclic compounds as immunomodulators
AU2019245288C1 (en) 2018-03-30 2024-01-18 Incyte Corporation Heterocyclic compounds as immunomodulators
CA3099994A1 (en) 2018-05-11 2019-11-04 Incyte Corporation Tetrahydro-imidazo[4,5-c]pyridine derivatives as pd-l1 immunomodulators
AR119624A1 (es) 2019-08-09 2021-12-29 Incyte Corp Sales de un inhibidor de pd-1 / pd-l1
JP2022549375A (ja) 2019-09-30 2022-11-24 インサイト・コーポレイション 免疫調節剤としてのピリド［３，２－ｄ］ピリミジン化合物
MX2022005651A (es) 2019-11-11 2022-07-27 Incyte Corp Sales y formas cristalinas de un inhibidor de la proteina de muerte celular programada 1 (pd-1)/ligando de muerte celular programada 1 (pd-l1).
TW202233616A (zh) 2020-11-06 2022-09-01 美商英塞特公司 用於製備ｐｄ－１／ｐｄ－ｌ１抑制劑以及其鹽及結晶形式之方法
TW202233615A (zh) 2020-11-06 2022-09-01 美商英塞特公司 Ｐｄ—１／ｐｄ—ｌ１抑制劑之結晶形式
WO2022099018A1 (en) 2020-11-06 2022-05-12 Incyte Corporation Process of preparing a pd-1/pd-l1 inhibitor

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2700918B2 (ja) * 1989-04-26 1998-01-21 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP2631744B2 (ja) * 1989-05-11 1997-07-16 日本ゼオン株式会社 ポジ型レジスト組成物
JP2761786B2 (ja) * 1990-02-01 1998-06-04 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JPH03242650A (ja) * 1990-02-20 1991-10-29 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物

Also Published As

Publication number Publication date
EP0644460B1 (de) 1999-12-08
EP0644460A1 (de) 1995-03-22
DE69421982D1 (de) 2000-01-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP