DE69033212T2 - Positiv arbeitende Photolack-Zusammensetzung - Google Patents

Positiv arbeitende Photolack-Zusammensetzung

Info

Publication number
DE69033212T2
DE69033212T2 DE69033212T DE69033212T DE69033212T2 DE 69033212 T2 DE69033212 T2 DE 69033212T2 DE 69033212 T DE69033212 T DE 69033212T DE 69033212 T DE69033212 T DE 69033212T DE 69033212 T2 DE69033212 T2 DE 69033212T2
Authority
DE
Germany
Prior art keywords
photoresist composition
positive working
working photoresist
positive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69033212T
Other languages
English (en)
Other versions
DE69033212D1 (de
Inventor
Kazuya Uenishi
Shinji Sakaguchi
Tadayoshi Kokubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69033212D1 publication Critical patent/DE69033212D1/de
Application granted granted Critical
Publication of DE69033212T2 publication Critical patent/DE69033212T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
DE69033212T 1989-04-26 1990-04-26 Positiv arbeitende Photolack-Zusammensetzung Expired - Fee Related DE69033212T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1107013A JP2700918B2 (ja) 1989-04-26 1989-04-26 ポジ型フオトレジスト組成物

Publications (2)

Publication Number Publication Date
DE69033212D1 DE69033212D1 (de) 1999-08-26
DE69033212T2 true DE69033212T2 (de) 1999-11-18

Family

ID=14448292

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69033212T Expired - Fee Related DE69033212T2 (de) 1989-04-26 1990-04-26 Positiv arbeitende Photolack-Zusammensetzung

Country Status (4)

Country Link
US (1) US5173389A (de)
EP (1) EP0395049B1 (de)
JP (1) JP2700918B2 (de)
DE (1) DE69033212T2 (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2631744B2 (ja) * 1989-05-11 1997-07-16 日本ゼオン株式会社 ポジ型レジスト組成物
JP2761786B2 (ja) * 1990-02-01 1998-06-04 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US6340552B1 (en) * 1990-12-27 2002-01-22 Kabushiki Kaisha Toshiba Photosensitive composition containing a dissolution inhibitor and an acid releasing compound
JP2919142B2 (ja) * 1990-12-27 1999-07-12 株式会社東芝 感光性組成物およびそれを用いたパターン形成方法
JPH04296754A (ja) * 1991-03-26 1992-10-21 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
DE4137325A1 (de) * 1991-11-13 1993-05-19 Hoechst Ag Lichtempfindliches gemisch auf der basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches material
JP2761822B2 (ja) * 1992-02-12 1998-06-04 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5221592A (en) * 1992-03-06 1993-06-22 Hoechst Celanese Corporation Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester
US5368977A (en) * 1992-03-23 1994-11-29 Nippon Oil Co. Ltd. Positive type photosensitive quinone diazide phenolic resin composition
US5384228A (en) * 1992-04-14 1995-01-24 Tokyo Ohka Kogyo Co., Ltd. Alkali-developable positive-working photosensitive resin composition
JP3094652B2 (ja) * 1992-05-18 2000-10-03 住友化学工業株式会社 ポジ型レジスト組成物
JP3466218B2 (ja) * 1992-06-04 2003-11-10 住友化学工業株式会社 ポジ型レジスト組成物
EP0644460B1 (de) * 1993-09-20 1999-12-08 Fuji Photo Film Co., Ltd. Positiv arbeitende Photoresistzusammensetzung
US5554481A (en) * 1993-09-20 1996-09-10 Fuji Photo Film Co., Ltd. Positive working photoresist composition
EP0886183A1 (de) * 1993-12-17 1998-12-23 Fuji Photo Film Co., Ltd. Positiv-arbeitende Fotolackzusammensetzung
JP3271728B2 (ja) * 1994-02-14 2002-04-08 日本電信電話株式会社 ポジ型レジスト組成物
JP3503839B2 (ja) 1994-05-25 2004-03-08 富士写真フイルム株式会社 ポジ型感光性組成物
EP0695740B1 (de) 1994-08-05 2000-11-22 Sumitomo Chemical Company Limited Sulfonsäurechinondiazidester und diese enthaltende positiv-arbeitende Fotolackzusammensetzungen
JP3278306B2 (ja) 1994-10-31 2002-04-30 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
US5541033A (en) * 1995-02-01 1996-07-30 Ocg Microelectronic Materials, Inc. Selected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions
US5672459A (en) * 1995-03-31 1997-09-30 Japan Synthetic Rubber Co., Ltd. Radiation sensitive resin composition containing quinone diazide ester having two hindered phenol groups
JPH0915853A (ja) * 1995-04-27 1997-01-17 Fuji Photo Film Co Ltd ポジ型フォトレジスト組成物
KR0164962B1 (ko) * 1995-10-14 1999-01-15 김흥기 포지티브형 포토레지스트 조성물
JP3486341B2 (ja) * 1997-09-18 2004-01-13 株式会社東芝 感光性組成物およびそれを用いたパターン形成法
CN106133604B (zh) * 2014-03-13 2019-09-06 三菱瓦斯化学株式会社 保护剂组合物和保护剂图案形成方法
JP6573217B2 (ja) 2014-03-13 2019-09-11 三菱瓦斯化学株式会社 化合物、樹脂、リソグラフィー用下層膜形成材料、リソグラフィー用下層膜、パターン形成方法、及び化合物又は樹脂の精製方法
WO2016158458A1 (ja) 2015-03-30 2016-10-06 三菱瓦斯化学株式会社 レジスト基材、レジスト組成物及びレジストパターン形成方法
US10747112B2 (en) 2015-03-30 2020-08-18 Mitsubishi Gas Chemical Company, Inc. Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1114705C2 (de) * 1959-04-16 1962-04-12 Kalle Ag Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen
JPS5763526A (en) * 1980-10-04 1982-04-17 Ricoh Co Ltd Photosensitive material
DE3043967A1 (de) * 1980-11-21 1982-06-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
DE3100077A1 (de) * 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
DE3100856A1 (de) * 1981-01-14 1982-08-12 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-napthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
DE3124936A1 (de) * 1981-06-25 1983-01-20 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
US4626492A (en) * 1985-06-04 1986-12-02 Olin Hunt Specialty Products, Inc. Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound
JPH0654381B2 (ja) * 1985-12-24 1994-07-20 日本合成ゴム株式会社 集積回路作製用ポジ型レジスト
JPH0814696B2 (ja) * 1987-09-17 1996-02-14 富士写真フイルム株式会社 感光性樹脂組成物
JPH0781030B2 (ja) * 1987-11-30 1995-08-30 日本合成ゴム株式会社 感放射線性樹脂組成物
JP2569650B2 (ja) * 1987-12-15 1997-01-08 日本合成ゴム株式会社 感放射線性樹脂組成物
JP2552891B2 (ja) * 1988-01-26 1996-11-13 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP2636348B2 (ja) * 1988-07-20 1997-07-30 住友化学工業株式会社 ポジ型レジスト用組成物
US5019478A (en) * 1989-10-30 1991-05-28 Olin Hunt Specialty Products, Inc. Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures

Also Published As

Publication number Publication date
JPH02285351A (ja) 1990-11-22
EP0395049A1 (de) 1990-10-31
DE69033212D1 (de) 1999-08-26
EP0395049B1 (de) 1999-07-21
US5173389A (en) 1992-12-22
JP2700918B2 (ja) 1998-01-21

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee