DE68928661T2 - Positiv arbeitende Photolack-Zusammensetzung - Google Patents
Positiv arbeitende Photolack-ZusammensetzungInfo
- Publication number
- DE68928661T2 DE68928661T2 DE1989628661 DE68928661T DE68928661T2 DE 68928661 T2 DE68928661 T2 DE 68928661T2 DE 1989628661 DE1989628661 DE 1989628661 DE 68928661 T DE68928661 T DE 68928661T DE 68928661 T2 DE68928661 T2 DE 68928661T2
- Authority
- DE
- Germany
- Prior art keywords
- photoresist composition
- positive working
- working photoresist
- positive
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22374088A JP2574692B2 (ja) | 1988-09-07 | 1988-09-07 | ポジ型フオトレジスト組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68928661D1 DE68928661D1 (de) | 1998-06-10 |
DE68928661T2 true DE68928661T2 (de) | 1998-11-26 |
Family
ID=16802949
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1989628661 Expired - Fee Related DE68928661T2 (de) | 1988-09-07 | 1989-09-06 | Positiv arbeitende Photolack-Zusammensetzung |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0358194B1 (de) |
JP (1) | JP2574692B2 (de) |
DE (1) | DE68928661T2 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2919142B2 (ja) * | 1990-12-27 | 1999-07-12 | 株式会社東芝 | 感光性組成物およびそれを用いたパターン形成方法 |
JP2655384B2 (ja) * | 1991-11-08 | 1997-09-17 | 富士写真フイルム株式会社 | ポジ型レジスト組成物 |
US5221592A (en) * | 1992-03-06 | 1993-06-22 | Hoechst Celanese Corporation | Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1304424A (fr) * | 1961-10-24 | 1962-09-21 | Ciba Geigy | Procédé d'obtention de colorants au soufre |
JPS5338621B1 (de) * | 1971-03-08 | 1978-10-17 | ||
JPS5657035A (en) * | 1979-10-15 | 1981-05-19 | Fuji Yakuhin Kogyo Kk | Positive type photosensitive composition |
JPS61245154A (ja) * | 1985-04-23 | 1986-10-31 | Dainippon Ink & Chem Inc | 感光性組成物 |
-
1988
- 1988-09-07 JP JP22374088A patent/JP2574692B2/ja not_active Expired - Fee Related
-
1989
- 1989-09-06 EP EP19890116444 patent/EP0358194B1/de not_active Expired - Lifetime
- 1989-09-06 DE DE1989628661 patent/DE68928661T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE68928661D1 (de) | 1998-06-10 |
EP0358194A3 (de) | 1990-10-17 |
EP0358194B1 (de) | 1998-05-06 |
EP0358194A2 (de) | 1990-03-14 |
JP2574692B2 (ja) | 1997-01-22 |
JPH0272363A (ja) | 1990-03-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |