JPS5657035A - Positive type photosensitive composition - Google Patents
Positive type photosensitive compositionInfo
- Publication number
- JPS5657035A JPS5657035A JP13262079A JP13262079A JPS5657035A JP S5657035 A JPS5657035 A JP S5657035A JP 13262079 A JP13262079 A JP 13262079A JP 13262079 A JP13262079 A JP 13262079A JP S5657035 A JPS5657035 A JP S5657035A
- Authority
- JP
- Japan
- Prior art keywords
- printing
- plate
- photosensitive composition
- sulfophthalein
- org
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Abstract
PURPOSE:To obtain a positive type photosensitive composition for a lithographic plate with high sensitivity and giving a visible image easy to discriminate by mixing a specified sulfophthalein pH indicator and a basic substance soluble in org. solvent into an o-quinone diazide photosensitizer. CONSTITUTION:A photosensitive soln. is prepared by mixing a sulfophthalein pH indicator represented by the formula (where each of A1-A4 is denoted by H or halogen and each of R1-R4 and R1'-R4' is H, halogen or lower alkyl) and a basic substance soluble in org. solvent into an o-quinone diazide photosensitizer such as o-naphthoquinone diazidosulfonate. The soln. is applied to an Al plate for a lithographic plate, dried, and contact exposed through a positive film. The color of exposed part turns into light-yellow and is clearly discriminated from the unexposed part in color with yellow safe light. Accordingly, locating can be made easily in superposition printing of many-sided printing in a printing or plate making process.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13262079A JPS5657035A (en) | 1979-10-15 | 1979-10-15 | Positive type photosensitive composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13262079A JPS5657035A (en) | 1979-10-15 | 1979-10-15 | Positive type photosensitive composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5657035A true JPS5657035A (en) | 1981-05-19 |
JPS6245972B2 JPS6245972B2 (en) | 1987-09-30 |
Family
ID=15085577
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13262079A Granted JPS5657035A (en) | 1979-10-15 | 1979-10-15 | Positive type photosensitive composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5657035A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2508188A1 (en) * | 1981-06-19 | 1982-12-24 | Sericol Group Ltd | PHOTOSENSITIVE COMPOSITIONS AND THEIR USE |
US4808513A (en) * | 1987-04-06 | 1989-02-28 | Morton Thiokol, Inc. | Method of developing a high contrast, positive photoresist using a developer containing alkanolamine |
EP0358194A2 (en) * | 1988-09-07 | 1990-03-14 | Fuji Photo Film Co., Ltd. | Positive-type photoresist composition |
US5094934A (en) * | 1987-04-06 | 1992-03-10 | Morton International, Inc. | Method of developing a high contrast, positive photoresist using a developer containing alkanolamine |
US5126230A (en) * | 1987-04-06 | 1992-06-30 | Morton International, Inc. | High contrast, positive photoresist developer containing alkanolamine |
US5248582A (en) * | 1988-09-07 | 1993-09-28 | Fuji Photo Film Co., Ltd. | Positive-type photoresist composition |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62202167U (en) * | 1986-06-12 | 1987-12-23 |
-
1979
- 1979-10-15 JP JP13262079A patent/JPS5657035A/en active Granted
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2508188A1 (en) * | 1981-06-19 | 1982-12-24 | Sericol Group Ltd | PHOTOSENSITIVE COMPOSITIONS AND THEIR USE |
US4808513A (en) * | 1987-04-06 | 1989-02-28 | Morton Thiokol, Inc. | Method of developing a high contrast, positive photoresist using a developer containing alkanolamine |
US5094934A (en) * | 1987-04-06 | 1992-03-10 | Morton International, Inc. | Method of developing a high contrast, positive photoresist using a developer containing alkanolamine |
US5126230A (en) * | 1987-04-06 | 1992-06-30 | Morton International, Inc. | High contrast, positive photoresist developer containing alkanolamine |
EP0358194A2 (en) * | 1988-09-07 | 1990-03-14 | Fuji Photo Film Co., Ltd. | Positive-type photoresist composition |
US5248582A (en) * | 1988-09-07 | 1993-09-28 | Fuji Photo Film Co., Ltd. | Positive-type photoresist composition |
Also Published As
Publication number | Publication date |
---|---|
JPS6245972B2 (en) | 1987-09-30 |
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