JPS646946A - Photosensitive composition and photosensitive plano-graphic printing plate - Google Patents
Photosensitive composition and photosensitive plano-graphic printing plateInfo
- Publication number
- JPS646946A JPS646946A JP16274787A JP16274787A JPS646946A JP S646946 A JPS646946 A JP S646946A JP 16274787 A JP16274787 A JP 16274787A JP 16274787 A JP16274787 A JP 16274787A JP S646946 A JPS646946 A JP S646946A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive
- compd
- acid
- alkali
- soluble resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Abstract
PURPOSE:To obtain a visible image which is easily identified even under yellow safelight at the time of exposure, by incorporating a compd. which generates an acid on being irradiated with active rays, a compd. which can be decomposed by the acid, a specified alkali-soluble resin and a sulfophthalein dye. CONSTITUTION:A compd. which can generate an acid on being irradiated with active rays, a compd. which can be decomposed by the acid, an alkali-soluble resin and a sulfophthalein dye represented by formula I are incorporated into a photosensitive compsn. When 1pt.vol. of 6wt.% soln. of the alkali-soluble resin in methylcellosolve is diluted with 10pts.vol. of a mixed solvent consisting of methanol and water in 1:1 ratio, the diluted soln. has 5.0-10.0 pH at 25 deg.C. In formula I, each of A1-A4 is H or halogen and each of R1-R4 and R1'-R4' is H, halogen or lower alkyl. The resulting photosensitive compsn. is adapted for a photosensitive planographic printing plate giving a high contrast visible image which is easily identified even under yellow safelight at the time of exposure.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16274787A JPS646946A (en) | 1987-06-30 | 1987-06-30 | Photosensitive composition and photosensitive plano-graphic printing plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16274787A JPS646946A (en) | 1987-06-30 | 1987-06-30 | Photosensitive composition and photosensitive plano-graphic printing plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS646946A true JPS646946A (en) | 1989-01-11 |
Family
ID=15760494
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16274787A Pending JPS646946A (en) | 1987-06-30 | 1987-06-30 | Photosensitive composition and photosensitive plano-graphic printing plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS646946A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1991019227A1 (en) * | 1990-05-30 | 1991-12-12 | Horsell Plc | Light sensitive materials for lithographic plates |
JPH05134415A (en) * | 1990-12-27 | 1993-05-28 | Toshiba Corp | Photosensitive composition and pattern forming method using that |
US6306553B1 (en) | 1990-12-27 | 2001-10-23 | Kabushiki Kaisha Toshiba | Photosensitive composition and method of forming a pattern using the same |
-
1987
- 1987-06-30 JP JP16274787A patent/JPS646946A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1991019227A1 (en) * | 1990-05-30 | 1991-12-12 | Horsell Plc | Light sensitive materials for lithographic plates |
JPH05134415A (en) * | 1990-12-27 | 1993-05-28 | Toshiba Corp | Photosensitive composition and pattern forming method using that |
US6306553B1 (en) | 1990-12-27 | 2001-10-23 | Kabushiki Kaisha Toshiba | Photosensitive composition and method of forming a pattern using the same |
US6340552B1 (en) | 1990-12-27 | 2002-01-22 | Kabushiki Kaisha Toshiba | Photosensitive composition containing a dissolution inhibitor and an acid releasing compound |
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