DE69213996T2 - Positivarbeitende Resistzusammensetzung - Google Patents
Positivarbeitende ResistzusammensetzungInfo
- Publication number
- DE69213996T2 DE69213996T2 DE69213996T DE69213996T DE69213996T2 DE 69213996 T2 DE69213996 T2 DE 69213996T2 DE 69213996 T DE69213996 T DE 69213996T DE 69213996 T DE69213996 T DE 69213996T DE 69213996 T2 DE69213996 T2 DE 69213996T2
- Authority
- DE
- Germany
- Prior art keywords
- resist composition
- positive working
- working resist
- positive
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9726791 | 1991-04-26 | ||
JP03316499A JP3139088B2 (ja) | 1991-04-26 | 1991-11-29 | ポジ型レジスト組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69213996D1 DE69213996D1 (de) | 1996-10-31 |
DE69213996T2 true DE69213996T2 (de) | 1997-05-22 |
Family
ID=26438449
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69213996T Expired - Lifetime DE69213996T2 (de) | 1991-04-26 | 1992-04-24 | Positivarbeitende Resistzusammensetzung |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0510670B1 (de) |
CA (1) | CA2067041A1 (de) |
DE (1) | DE69213996T2 (de) |
MX (1) | MX9201928A (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR960015081A (ko) * | 1993-07-15 | 1996-05-22 | 마쯔모또 에이이찌 | 화학증폭형 레지스트 조성물 |
JP3427562B2 (ja) * | 1995-05-09 | 2003-07-22 | 住友化学工業株式会社 | ポジ型レジスト組成物 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR920001450B1 (ko) * | 1986-12-23 | 1992-02-14 | 쉬플리 캄파니 인코포레이티드 | 감광성 내식막의 제조방법, 감광성 내식막 조성물 및 이의 제조방법 |
JPS63178228A (ja) * | 1987-01-20 | 1988-07-22 | Fuji Photo Film Co Ltd | ポジ型フオトレジスト組成物 |
DE68927140T2 (de) * | 1988-06-13 | 1997-04-30 | Sumitomo Chemical Co | Photolackzusammensetzung |
-
1992
- 1992-04-24 MX MX9201928A patent/MX9201928A/es unknown
- 1992-04-24 EP EP92107033A patent/EP0510670B1/de not_active Expired - Lifetime
- 1992-04-24 CA CA002067041A patent/CA2067041A1/en not_active Abandoned
- 1992-04-24 DE DE69213996T patent/DE69213996T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69213996D1 (de) | 1996-10-31 |
EP0510670A1 (de) | 1992-10-28 |
CA2067041A1 (en) | 1992-10-27 |
MX9201928A (es) | 1992-11-01 |
EP0510670B1 (de) | 1996-09-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: SUMITOMO CHEMICAL CO. LTD., TOKIO/TOKYO, JP |
|
R071 | Expiry of right |
Ref document number: 510670 Country of ref document: EP |