DE69416927D1 - Positivarbeitende Resistzusammensetzung - Google Patents

Positivarbeitende Resistzusammensetzung

Info

Publication number
DE69416927D1
DE69416927D1 DE69416927T DE69416927T DE69416927D1 DE 69416927 D1 DE69416927 D1 DE 69416927D1 DE 69416927 T DE69416927 T DE 69416927T DE 69416927 T DE69416927 T DE 69416927T DE 69416927 D1 DE69416927 D1 DE 69416927D1
Authority
DE
Germany
Prior art keywords
resist composition
positive working
working resist
positive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69416927T
Other languages
English (en)
Other versions
DE69416927T2 (de
Inventor
Yuji Yoshida
Haruyoshi Osaki
Kazuhiko Hashimoto
Kunishige Edamatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Application granted granted Critical
Publication of DE69416927D1 publication Critical patent/DE69416927D1/de
Publication of DE69416927T2 publication Critical patent/DE69416927T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
DE69416927T 1993-10-19 1994-10-18 Positivarbeitende Resistzusammensetzung Expired - Fee Related DE69416927T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26138193A JP3329026B2 (ja) 1993-10-19 1993-10-19 ポジ型フォトレジスト組成物

Publications (2)

Publication Number Publication Date
DE69416927D1 true DE69416927D1 (de) 1999-04-15
DE69416927T2 DE69416927T2 (de) 1999-10-14

Family

ID=17361063

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69416927T Expired - Fee Related DE69416927T2 (de) 1993-10-19 1994-10-18 Positivarbeitende Resistzusammensetzung

Country Status (5)

Country Link
EP (1) EP0650091B1 (de)
JP (1) JP3329026B2 (de)
KR (1) KR950012147A (de)
CA (1) CA2118192A1 (de)
DE (1) DE69416927T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE602004022677D1 (de) 2003-07-16 2009-10-01 Tokyo Ohka Kogyo Co Ltd Positivphotoresistzusammensetzung und verfahren zur ausbildung einer resiststruktur
JP3943058B2 (ja) 2003-07-16 2007-07-11 東京応化工業株式会社 ポジ型フォトレジスト組成物、及びレジストパターン形成方法
JP6221316B2 (ja) * 2012-05-11 2017-11-01 住友ベークライト株式会社 フォトレジスト用樹脂組成物の製造方法、フォトレジストの製造方法および液晶デバイスの製造方法
CN112034687B (zh) * 2020-09-08 2021-08-10 江苏艾森半导体材料股份有限公司 一种光刻胶组合物及其应用

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63234249A (ja) * 1987-03-23 1988-09-29 Nippon Zeon Co Ltd ポジ型フオトレジスト組成物
JP2693472B2 (ja) * 1987-11-26 1997-12-24 株式会社東芝 レジスト
CA2023791A1 (en) * 1989-08-24 1991-02-25 Ayako Ida Radiation-sensitive positive resist composition
JP3063148B2 (ja) * 1989-12-27 2000-07-12 住友化学工業株式会社 ポジ型レジスト組成物
TW202504B (de) * 1990-02-23 1993-03-21 Sumitomo Chemical Co
EP0461388B1 (de) * 1990-05-24 1996-09-04 Sumitomo Chemical Company, Limited Positivresistzusammensetzung
JPH05204144A (ja) * 1991-08-21 1993-08-13 Sumitomo Chem Co Ltd ポジ型レジスト組成物
JP3391471B2 (ja) * 1992-02-25 2003-03-31 住友化学工業株式会社 ポジ型レジスト組成物

Also Published As

Publication number Publication date
JPH07114179A (ja) 1995-05-02
KR950012147A (ko) 1995-05-16
JP3329026B2 (ja) 2002-09-30
DE69416927T2 (de) 1999-10-14
EP0650091A1 (de) 1995-04-26
EP0650091B1 (de) 1999-03-10
CA2118192A1 (en) 1995-04-20

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee