DE69032715D1 - Lichtempfindliche Zusammensetzung - Google Patents

Lichtempfindliche Zusammensetzung

Info

Publication number
DE69032715D1
DE69032715D1 DE69032715T DE69032715T DE69032715D1 DE 69032715 D1 DE69032715 D1 DE 69032715D1 DE 69032715 T DE69032715 T DE 69032715T DE 69032715 T DE69032715 T DE 69032715T DE 69032715 D1 DE69032715 D1 DE 69032715D1
Authority
DE
Germany
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69032715T
Other languages
English (en)
Other versions
DE69032715T2 (de
Inventor
Masanori Imai
Noriaki Watanabe
Kouichi Kawamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69032715D1 publication Critical patent/DE69032715D1/de
Application granted granted Critical
Publication of DE69032715T2 publication Critical patent/DE69032715T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y10S430/123—Sulfur in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing
DE69032715T 1989-07-24 1990-07-20 Lichtempfindliche Zusammensetzung Expired - Fee Related DE69032715T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1190963A JP2552550B2 (ja) 1989-07-24 1989-07-24 感光性組成物

Publications (2)

Publication Number Publication Date
DE69032715D1 true DE69032715D1 (de) 1998-12-03
DE69032715T2 DE69032715T2 (de) 1999-03-18

Family

ID=16266589

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69032715T Expired - Fee Related DE69032715T2 (de) 1989-07-24 1990-07-20 Lichtempfindliche Zusammensetzung

Country Status (4)

Country Link
US (1) US5064747A (de)
EP (1) EP0410654B1 (de)
JP (1) JP2552550B2 (de)
DE (1) DE69032715T2 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5554664A (en) * 1995-03-06 1996-09-10 Minnesota Mining And Manufacturing Company Energy-activatable salts with fluorocarbon anions
US5541235A (en) * 1995-03-06 1996-07-30 Minnesota Mining And Manufacturing Company Organic soluble cationic dyes with fluorinated alkylsulfonyl counterions
JP3470253B2 (ja) * 1996-07-24 2003-11-25 コニカミノルタホールディングス株式会社 光開始剤、光重合組成物、ラジカル発生方法、平版印刷版作成用感光材料及び平版印刷版の作成方法
US6140384A (en) * 1996-10-02 2000-10-31 Fuji Photo Film Co., Ltd. Photopolymerizable composition containing a sensitizing dye with cyano or substituted carbonyl groups
CN1964950A (zh) 2004-06-04 2007-05-16 安斯泰来制药有限公司 丙烷－1,3－二酮衍生物或其盐
EP1657286B1 (de) * 2004-11-12 2018-07-04 FUJIFILM Corporation Strahlungshärtbare Tintenstrahltinte, einen Farbstoff zur Sensibilisierung der Initierung der Polymerisation enthaltend
CA2603185C (en) * 2005-03-31 2011-07-26 Astellas Pharma Inc. Propane-1,3-dione derivative or salt thereof
JP5308039B2 (ja) 2007-02-20 2013-10-09 富士フイルム株式会社 紫外線吸収剤を含む高分子材料
JP5401042B2 (ja) * 2008-02-28 2014-01-29 富士フイルム株式会社 フォトレジスト用化合物、フォトレジスト液、およびこれを用いるエッチング方法
JP2009067983A (ja) 2007-03-30 2009-04-02 Fujifilm Corp 紫外線吸収剤組成物
JP4989520B2 (ja) 2008-02-29 2012-08-01 Ｙｋｋ株式会社 雄スナップ及び雌スナップ
JP2009263617A (ja) * 2008-03-31 2009-11-12 Fujifilm Corp 紫外線吸収材料
JP2010059235A (ja) 2008-09-01 2010-03-18 Fujifilm Corp 紫外線吸収剤組成物
JP2011074070A (ja) 2009-09-07 2011-04-14 Fujifilm Corp 紫外線吸収性組成物
JP5634888B2 (ja) * 2011-01-12 2014-12-03 富士フイルム株式会社 インク組成物、画像形成方法及び印画物
JP2014040529A (ja) * 2012-08-22 2014-03-06 Fujifilm Corp インク組成物、画像形成方法、及び印画物
JP6148967B2 (ja) * 2013-10-31 2017-06-14 富士フイルム株式会社 積層体、有機半導体製造用キットおよび有機半導体製造用レジスト組成物
CN113929656A (zh) * 2021-09-28 2022-01-14 西安交通大学 一种基于茚酮烯的发光材料及其制备方法和应用

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA539571A (en) * 1957-04-16 M. Robertson Earl Photosensitization of polymers containing cinnamoyl groups
BE549814A (de) * 1955-07-29
BE588325A (de) * 1959-03-24
US3528814A (en) * 1966-04-29 1970-09-15 Agfa Gevaert Ag Sensitization of light-sensitive polymers
JPS4911155B1 (de) * 1970-04-17 1974-03-15
US4063953A (en) * 1972-09-06 1977-12-20 Mitsubishi Chemical Industries, Ltd. Photosensitive composition
JPS5148516B2 (de) * 1973-02-07 1976-12-21
US4158730A (en) * 1975-06-18 1979-06-19 Ciba-Geigy Corporation Crosslinkage polymeric compounds
US4062686A (en) * 1976-04-21 1977-12-13 Eastman Kodak Company Sensitizers for photocrosslinkable polymers
SU717074A1 (ru) * 1978-03-07 1980-02-25 Ордена Трудового Красного Знамени Институт Высокомолекулярных Соединений Ан Ссср Коричный эфир поли- - оксиэтилметакрилата в качестве фоторезиста и способ его получени
JPS5989303A (ja) * 1982-11-12 1984-05-23 Fuji Photo Film Co Ltd 光重合性組成物
JPH01203403A (ja) * 1988-02-08 1989-08-16 Fujitsu Ltd 感光性有機組成物

Also Published As

Publication number Publication date
EP0410654B1 (de) 1998-10-28
JP2552550B2 (ja) 1996-11-13
EP0410654A2 (de) 1991-01-30
US5064747A (en) 1991-11-12
EP0410654A3 (en) 1991-11-06
DE69032715T2 (de) 1999-03-18
JPH0354566A (ja) 1991-03-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee