DE69014913T2 - Lichtempfindliche Zusammensetzung. - Google Patents

Lichtempfindliche Zusammensetzung.

Info

Publication number
DE69014913T2
DE69014913T2 DE69014913T DE69014913T DE69014913T2 DE 69014913 T2 DE69014913 T2 DE 69014913T2 DE 69014913 T DE69014913 T DE 69014913T DE 69014913 T DE69014913 T DE 69014913T DE 69014913 T2 DE69014913 T2 DE 69014913T2
Authority
DE
Germany
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69014913T
Other languages
English (en)
Other versions
DE69014913D1 (de
Inventor
Fumiaki Shinozaki
Junichi Fujimori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE69014913D1 publication Critical patent/DE69014913D1/de
Publication of DE69014913T2 publication Critical patent/DE69014913T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G03C1/61—Compositions containing diazo compounds as photosensitive substances with non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/0166—Diazonium salts or compounds characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing
DE69014913T 1989-01-17 1990-01-16 Lichtempfindliche Zusammensetzung. Expired - Lifetime DE69014913T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1008156A JP2571115B2 (ja) 1989-01-17 1989-01-17 感光性組成物の増感方法及び増感された感光性組成物

Publications (2)

Publication Number Publication Date
DE69014913D1 DE69014913D1 (de) 1995-01-26
DE69014913T2 true DE69014913T2 (de) 1995-07-20

Family

ID=11685465

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69014913T Expired - Lifetime DE69014913T2 (de) 1989-01-17 1990-01-16 Lichtempfindliche Zusammensetzung.

Country Status (5)

Country Link
US (1) US5200292A (de)
EP (1) EP0379157B1 (de)
JP (1) JP2571115B2 (de)
CA (1) CA2007996A1 (de)
DE (1) DE69014913T2 (de)

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JP3244288B2 (ja) * 1990-07-23 2002-01-07 昭和電工株式会社 近赤外光消色型記録材料
US5362592A (en) * 1991-11-14 1994-11-08 Showa Denko K.K. Decolorizable toner
US5346801A (en) * 1992-04-01 1994-09-13 Konica Corporation Method of forming images
DE4426820A1 (de) * 1993-07-29 1995-02-02 Fuji Photo Film Co Ltd Bilderzeugungsmaterial und Bilderzeugungsverfahren
EP0678790A4 (de) * 1993-11-05 1996-05-08 Bando Chemical Ind Entfärbbarer toner und herstellungsverfahren.
JP3461377B2 (ja) * 1994-04-18 2003-10-27 富士写真フイルム株式会社 画像記録材料
MY132867A (en) * 1995-11-24 2007-10-31 Ciba Specialty Chemicals Holding Inc Acid-stable borates for photopolymerization
US5593809A (en) * 1995-12-07 1997-01-14 Polaroid Corporation Peel apart diffusion transfer compound film unit with crosslinkable layer and borate
CN1078132C (zh) 1996-04-23 2002-01-23 霍西尔绘图工业有限公司 热敏组合物及用其制造平版印刷版型的方法
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US5705308A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element
US5858626A (en) 1996-09-30 1999-01-12 Kodak Polychrome Graphics Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6033829A (en) * 1997-06-30 2000-03-07 Showa Denko K.K. Photopolymerizable composition and dry film resist
EP0889362B1 (de) * 1997-06-30 2003-08-27 Showa Denko Kabushiki Kaisha Fotopolymerisierbare Zusammensetzung und trockener Filmresist
DE69801363T2 (de) 1997-07-05 2002-05-23 Kodak Polychrome Graphics Llc Bilderzeugungsverfahren
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
CA2253054A1 (en) * 1997-11-05 1999-05-05 Showa Denko K.K. Photocurable paint composition for road markings
JPH11316458A (ja) 1998-03-03 1999-11-16 Fuji Photo Film Co Ltd 感光性組成物
US6461794B1 (en) 1999-08-11 2002-10-08 Kodak Polychrome Graphics Llc Lithographic printing forms
AU2016401A (en) * 1999-12-22 2001-07-03 Reckitt Benckiser (Uk) Limited Photocatalytic compositions and methods
US6884561B2 (en) 2000-01-12 2005-04-26 Anocoil Corporation Actinically imageable and infrared heated printing plate
JP4512281B2 (ja) 2001-02-22 2010-07-28 富士フイルム株式会社 ネガ型平版印刷版原版
JP4266077B2 (ja) 2001-03-26 2009-05-20 富士フイルム株式会社 平版印刷版原版及び平版印刷方法
US6777164B2 (en) 2001-04-06 2004-08-17 Kodak Polychrome Graphics Llc Lithographic printing forms
US7029541B2 (en) * 2002-01-24 2006-04-18 Pavco, Inc. Trivalent chromate conversion coating
JP4137577B2 (ja) * 2002-09-30 2008-08-20 富士フイルム株式会社 感光性組成物
JP2004126050A (ja) * 2002-09-30 2004-04-22 Fuji Photo Film Co Ltd 平版印刷版原版
EP1403043B1 (de) * 2002-09-30 2009-04-15 FUJIFILM Corporation Polymerisierbare Zusammensetzung und Flachdruckplattenvorläufer
US6794107B2 (en) 2002-10-28 2004-09-21 Kodak Polychrome Graphics Llc Thermal generation of a mask for flexography
CN100590525C (zh) * 2002-12-18 2010-02-17 富士胶片株式会社 可聚合组合物和平版印刷版前体
JP4150261B2 (ja) * 2003-01-14 2008-09-17 富士フイルム株式会社 平版印刷版原版の製版方法
JP2004252201A (ja) * 2003-02-20 2004-09-09 Fuji Photo Film Co Ltd 平版印刷版原版
JP4048134B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 平版印刷版原版
JP2004252285A (ja) * 2003-02-21 2004-09-09 Fuji Photo Film Co Ltd 感光性組成物及びそれを用いた平版印刷版原版
JP4048133B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 感光性組成物及びそれを用いた平版印刷版原版
JP4299639B2 (ja) * 2003-07-29 2009-07-22 富士フイルム株式会社 重合性組成物及びそれを用いた画像記録材料
JP2005099284A (ja) * 2003-09-24 2005-04-14 Fuji Photo Film Co Ltd 感光性組成物及び平版印刷版原版
US7214825B2 (en) * 2003-10-17 2007-05-08 Honeywell International Inc. O-(3-chloropropenyl) hydroxylamine free base
US20100291706A1 (en) * 2009-05-15 2010-11-18 Millipore Corporation Dye conjugates and methods of use

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BE592259A (de) * 1959-06-26
US3567453A (en) * 1967-12-26 1971-03-02 Eastman Kodak Co Light sensitive compositions for photoresists and lithography
US4252884A (en) * 1979-08-14 1981-02-24 James River Graphics, Inc. Negative-working diazotype photoreproduction
US4370401A (en) * 1979-12-07 1983-01-25 Minnesota Mining And Manufacturing Company Light sensitive, thermally developable imaging system
US4343891A (en) * 1980-05-23 1982-08-10 Minnesota Mining And Manufacturing Company Fixing of tetra (hydrocarbyl) borate salt imaging systems
US4307182A (en) * 1980-05-23 1981-12-22 Minnesota Mining And Manufacturing Company Imaging systems with tetra(aliphatic) borate salts
US4511642A (en) * 1982-02-17 1985-04-16 Nippon Telegraph And Telephone Public Corp. Photo-fixing heat-sensitive recording media with photosensitive diazonium salt, coupler, and organic boron salt
US4450227A (en) * 1982-10-25 1984-05-22 Minnesota Mining And Manufacturing Company Dispersed imaging systems with tetra (hydrocarbyl) borate salts
CA1284740C (en) * 1985-11-20 1991-06-11 Peter Gottschalk Photosensitive materials containing ionic dye compounds as initiators
US4842980A (en) * 1985-11-20 1989-06-27 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
US4772530A (en) * 1986-05-06 1988-09-20 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
US4772541A (en) * 1985-11-20 1988-09-20 The Mead Corporation Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same
DE3677527D1 (de) * 1985-11-20 1991-03-21 Mead Corp Ionische farbstoffe als initiatoren enthaltende fotosensitive materialien.
US4800149A (en) * 1986-10-10 1989-01-24 The Mead Corporation Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same
JPH0743536B2 (ja) * 1987-05-29 1995-05-15 富士写真フイルム株式会社 感光性組成物
JPS6410240A (en) * 1987-07-02 1989-01-13 Fuji Photo Film Co Ltd Photosensitive composition
US4788124A (en) * 1987-08-19 1988-11-29 The Mead Corporation Thermal recording method and material
US5015549A (en) * 1988-03-23 1991-05-14 Olin Corporation Composition and electrophotographic use of microcapsular photoactive toner particles

Also Published As

Publication number Publication date
JP2571115B2 (ja) 1997-01-16
CA2007996A1 (en) 1990-07-17
US5200292A (en) 1993-04-06
EP0379157B1 (de) 1994-12-14
DE69014913D1 (de) 1995-01-26
EP0379157A1 (de) 1990-07-25
JPH02187762A (ja) 1990-07-23

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Legal Events

Date Code Title Description
8328 Change in the person/name/address of the agent

Free format text: BARZ, P., DIPL.-CHEM. DR.RER.NAT., PAT.-ANW., 80803 MUENCHEN

8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP