DE3751555D1 - Photoempfindliche Zusammensetzung. - Google Patents

Photoempfindliche Zusammensetzung.

Info

Publication number
DE3751555D1
DE3751555D1 DE3751555T DE3751555T DE3751555D1 DE 3751555 D1 DE3751555 D1 DE 3751555D1 DE 3751555 T DE3751555 T DE 3751555T DE 3751555 T DE3751555 T DE 3751555T DE 3751555 D1 DE3751555 D1 DE 3751555D1
Authority
DE
Germany
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE3751555T
Other languages
English (en)
Other versions
DE3751555T2 (de
Inventor
Akira Nishioka
Masayuki Kamei
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE3751555D1 publication Critical patent/DE3751555D1/de
Application granted granted Critical
Publication of DE3751555T2 publication Critical patent/DE3751555T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Printing Plates And Materials Therefor (AREA)
DE19873751555 1986-03-27 1987-03-24 Photoempfindliche Zusammensetzung. Expired - Lifetime DE3751555T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61068949A JPH06105351B2 (ja) 1986-03-27 1986-03-27 感光性組成物

Publications (2)

Publication Number Publication Date
DE3751555D1 true DE3751555D1 (de) 1995-11-16
DE3751555T2 DE3751555T2 (de) 1996-04-04

Family

ID=13388422

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19873751555 Expired - Lifetime DE3751555T2 (de) 1986-03-27 1987-03-24 Photoempfindliche Zusammensetzung.

Country Status (3)

Country Link
EP (1) EP0239082B1 (de)
JP (1) JPH06105351B2 (de)
DE (1) DE3751555T2 (de)

Families Citing this family (97)

* Cited by examiner, † Cited by third party
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JPS63218957A (ja) * 1987-03-09 1988-09-12 Nippon Kayaku Co Ltd 可染性樹脂膜のパタ−ン形成法
JPH06105350B2 (ja) * 1987-07-13 1994-12-21 富士写真フイルム株式会社 平版印刷版用感光性組成物
JP2779936B2 (ja) * 1988-06-13 1998-07-23 コニカ株式会社 感光性平版印刷版
US5279922A (en) * 1989-08-07 1994-01-18 Konica Corporation Light-sensitive coating liquid
JPH03170931A (ja) * 1989-08-07 1991-07-24 Konica Corp 感光性塗布液
US5279917A (en) * 1991-05-09 1994-01-18 Konica Corporation Light-sensitive composition comprising a fluorine copolymer surfactant
GB9122576D0 (en) * 1991-10-24 1991-12-04 Hercules Inc Photopolymer resins with reduced plugging characteristics
GB9225724D0 (en) 1992-12-09 1993-02-03 Minnesota Mining & Mfg Transfer imaging elements
US5403437A (en) * 1993-11-05 1995-04-04 Texas Instruments Incorporated Fluorosurfactant in photoresist for amorphous "Teflon" patterning
US6461787B2 (en) 1993-12-02 2002-10-08 Minnesota Mining And Manufacturing Company Transfer imaging elements
DE69941227D1 (de) 1998-04-06 2009-09-17 Fujifilm Corp Photoempfindliche Harzzusammensetzung
JP4458389B2 (ja) 2000-05-01 2010-04-28 コダック株式会社 感光性組成物および感光性平版印刷版
JP2002040631A (ja) 2000-07-19 2002-02-06 Kodak Polychrome Graphics Japan Ltd 平版印刷版用感光性組成物および感光性平版印刷版
JP2002296774A (ja) * 2001-03-30 2002-10-09 Fuji Photo Film Co Ltd 平版印刷版用原版
JP2002341536A (ja) 2001-05-21 2002-11-27 Kodak Polychrome Graphics Japan Ltd ネガ型感光性組成物およびネガ型感光性平版印刷版
AU2003257623A1 (en) * 2002-08-22 2004-03-11 Seimi Chemical Co., Ltd. Fluorosurfactants
ATE433857T1 (de) 2003-03-26 2009-07-15 Fujifilm Corp Flachdruckverfahren und vorsensibilisierte platte
JP2005059446A (ja) 2003-08-15 2005-03-10 Fuji Photo Film Co Ltd 平版印刷版原版及び平版印刷方法
US20050153239A1 (en) 2004-01-09 2005-07-14 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor and lithographic printing method using the same
WO2005111717A2 (en) 2004-05-19 2005-11-24 Fujifilm Corporation Image recording method
EP2618215B1 (de) 2004-05-31 2017-07-05 Fujifilm Corporation Verfahren zur Herstellung einer Lithografiedruckplatte
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US7425406B2 (en) 2004-07-27 2008-09-16 Fujifilm Corporation Lithographic printing plate precursor and lithographic printing method
US20060032390A1 (en) 2004-07-30 2006-02-16 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor and lithographic printing method
DE602005005403T2 (de) 2004-08-24 2009-04-23 Fujifilm Corp. Verfahren zur Herstellung einer lithographischen Druckplatte
JP2006062188A (ja) 2004-08-26 2006-03-09 Fuji Photo Film Co Ltd 色画像形成材料及び平版印刷版原版
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US20060150846A1 (en) 2004-12-13 2006-07-13 Fuji Photo Film Co. Ltd Lithographic printing method
JP2006181838A (ja) 2004-12-27 2006-07-13 Fuji Photo Film Co Ltd 平版印刷版原版
US7910286B2 (en) 2005-01-26 2011-03-22 Fujifilm Corporation Lithographic printing plate precursor, lithographic printing method and packaged body of lithographic printing plate precursors
US7858291B2 (en) 2005-02-28 2010-12-28 Fujifilm Corporation Lithographic printing plate precursor, method for preparation of lithographic printing plate precursor, and lithographic printing method
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JP4759483B2 (ja) * 2006-09-25 2011-08-31 Ａｚエレクトロニックマテリアルズ株式会社 フォトレジスト組成物、フォトレジスト組成物の塗布方法およびレジストパターンの形成方法
US8771924B2 (en) 2006-12-26 2014-07-08 Fujifilm Corporation Polymerizable composition, lithographic printing plate precursor and lithographic printing method
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US8426102B2 (en) 2007-06-22 2013-04-23 Fujifilm Corporation Lithographic printing plate precursor and plate making method
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JP4903096B2 (ja) * 2007-07-24 2012-03-21 東京応化工業株式会社 ポジ型ホトレジスト組成物およびレジストパターン形成方法
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JP2013205801A (ja) * 2012-03-29 2013-10-07 Sumitomo Bakelite Co Ltd 感光性樹脂組成物及びその硬化膜、保護膜、絶縁膜並びに半導体装置及び表示体装置
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JPS54135004A (en) * 1978-04-10 1979-10-19 Fuji Photo Film Co Ltd Photosensitive flat printing plate
DE3022362A1 (de) * 1980-06-14 1981-12-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung
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JPS58105143A (ja) * 1981-12-17 1983-06-22 Kanto Kagaku Kk ポジ型フオトレジスト組成物
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JPS59137943A (ja) * 1983-01-28 1984-08-08 W R Gureesu:Kk 感光性樹脂組成物
JPS59222843A (ja) * 1983-06-01 1984-12-14 Toray Ind Inc ネガ型湿し水不要平版印刷版の製法
DE3421526A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende copolymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
JPH0721626B2 (ja) * 1985-08-10 1995-03-08 日本合成ゴム株式会社 半導体微細加工用レジスト組成物
JPH083630B2 (ja) * 1986-01-23 1996-01-17 富士写真フイルム株式会社 感光性組成物

Also Published As

Publication number Publication date
EP0239082A3 (en) 1990-11-07
DE3751555T2 (de) 1996-04-04
EP0239082B1 (de) 1995-10-11
JPS62226143A (ja) 1987-10-05
EP0239082A2 (de) 1987-09-30
JPH06105351B2 (ja) 1994-12-21

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