DE68921146D1 - Lichtempfindliche Zusammensetzung. - Google Patents

Lichtempfindliche Zusammensetzung.

Info

Publication number
DE68921146D1
DE68921146D1 DE68921146T DE68921146T DE68921146D1 DE 68921146 D1 DE68921146 D1 DE 68921146D1 DE 68921146 T DE68921146 T DE 68921146T DE 68921146 T DE68921146 T DE 68921146T DE 68921146 D1 DE68921146 D1 DE 68921146D1
Authority
DE
Germany
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68921146T
Other languages
English (en)
Other versions
DE68921146T2 (de
Inventor
Masanori C O Fuji Photo F Imai
Noriaki C O Fuji Phot Watanabe
Kouichi C O Fuji Phot Kawamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP63285404A external-priority patent/JP2589558B2/ja
Priority claimed from JP1093647A external-priority patent/JP2598994B2/ja
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE68921146D1 publication Critical patent/DE68921146D1/de
Publication of DE68921146T2 publication Critical patent/DE68921146T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE68921146T 1988-11-11 1989-11-09 Lichtempfindliche Zusammensetzung. Expired - Fee Related DE68921146T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP63285404A JP2589558B2 (ja) 1988-11-11 1988-11-11 感光性組成物
JP28711588 1988-11-14
JP1093647A JP2598994B2 (ja) 1988-11-14 1989-04-13 感光性組性物

Publications (2)

Publication Number Publication Date
DE68921146D1 true DE68921146D1 (de) 1995-03-23
DE68921146T2 DE68921146T2 (de) 1995-06-14

Family

ID=27307345

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68921146T Expired - Fee Related DE68921146T2 (de) 1988-11-11 1989-11-09 Lichtempfindliche Zusammensetzung.

Country Status (3)

Country Link
US (1) US5202221A (de)
EP (1) EP0368327B1 (de)
DE (1) DE68921146T2 (de)

Families Citing this family (71)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2860737B2 (ja) * 1992-09-29 1999-02-24 富士写真フイルム株式会社 感光性組成物
CA2120838A1 (en) 1993-08-05 1995-02-06 Ronald Sinclair Nohr Solid colored composition mutable by ultraviolet radiation
US5645964A (en) 1993-08-05 1997-07-08 Kimberly-Clark Corporation Digital information recording media and method of using same
US5865471A (en) 1993-08-05 1999-02-02 Kimberly-Clark Worldwide, Inc. Photo-erasable data processing forms
US5733693A (en) 1993-08-05 1998-03-31 Kimberly-Clark Worldwide, Inc. Method for improving the readability of data processing forms
US6017471A (en) 1993-08-05 2000-01-25 Kimberly-Clark Worldwide, Inc. Colorants and colorant modifiers
US5700850A (en) 1993-08-05 1997-12-23 Kimberly-Clark Worldwide Colorant compositions and colorant stabilizers
US6211383B1 (en) 1993-08-05 2001-04-03 Kimberly-Clark Worldwide, Inc. Nohr-McDonald elimination reaction
US5721287A (en) 1993-08-05 1998-02-24 Kimberly-Clark Worldwide, Inc. Method of mutating a colorant by irradiation
US5773182A (en) 1993-08-05 1998-06-30 Kimberly-Clark Worldwide, Inc. Method of light stabilizing a colorant
US5681380A (en) 1995-06-05 1997-10-28 Kimberly-Clark Worldwide, Inc. Ink for ink jet printers
US6017661A (en) 1994-11-09 2000-01-25 Kimberly-Clark Corporation Temporary marking using photoerasable colorants
US5643356A (en) 1993-08-05 1997-07-01 Kimberly-Clark Corporation Ink for ink jet printers
US6071979A (en) 1994-06-30 2000-06-06 Kimberly-Clark Worldwide, Inc. Photoreactor composition method of generating a reactive species and applications therefor
US5739175A (en) 1995-06-05 1998-04-14 Kimberly-Clark Worldwide, Inc. Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer
US5685754A (en) 1994-06-30 1997-11-11 Kimberly-Clark Corporation Method of generating a reactive species and polymer coating applications therefor
US6242057B1 (en) 1994-06-30 2001-06-05 Kimberly-Clark Worldwide, Inc. Photoreactor composition and applications therefor
US6008268A (en) 1994-10-21 1999-12-28 Kimberly-Clark Worldwide, Inc. Photoreactor composition, method of generating a reactive species, and applications therefor
US5798015A (en) 1995-06-05 1998-08-25 Kimberly-Clark Worldwide, Inc. Method of laminating a structure with adhesive containing a photoreactor composition
RU2170943C2 (ru) 1995-06-05 2001-07-20 Кимберли-Кларк Уорлдвайд, Инк. Новые прекрасители
US5849411A (en) 1995-06-05 1998-12-15 Kimberly-Clark Worldwide, Inc. Polymer film, nonwoven web and fibers containing a photoreactor composition
US5811199A (en) 1995-06-05 1998-09-22 Kimberly-Clark Worldwide, Inc. Adhesive compositions containing a photoreactor composition
US5747550A (en) 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
US5786132A (en) 1995-06-05 1998-07-28 Kimberly-Clark Corporation Pre-dyes, mutable dye compositions, and methods of developing a color
JP2000506550A (ja) 1995-06-28 2000-05-30 キンバリー クラーク ワールドワイド インコーポレイテッド 新規な着色剤および着色剤用改質剤
US5855655A (en) 1996-03-29 1999-01-05 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5782963A (en) 1996-03-29 1998-07-21 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US6099628A (en) 1996-03-29 2000-08-08 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
CA2210480A1 (en) 1995-11-28 1997-06-05 Kimberly-Clark Worldwide, Inc. Improved colorant stabilizers
US5891229A (en) 1996-03-29 1999-04-06 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
ES2181120T3 (es) 1996-04-23 2003-02-16 Kodak Polychrome Graphics Co Compuestos termosensibles para precursores de forma para impresion litografica positiva.
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US6140384A (en) * 1996-10-02 2000-10-31 Fuji Photo Film Co., Ltd. Photopolymerizable composition containing a sensitizing dye with cyano or substituted carbonyl groups
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
JP2002511955A (ja) 1997-07-05 2002-04-16 コダック・ポリクローム・グラフィックス・エルエルシー パターン形成方法
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
EP1452312A1 (de) 1997-10-17 2004-09-01 Fuji Photo Film Co., Ltd. Positiv arbeitendes photoempfindliches Aufzeichnungsmaterial für Infrarotlaser und positiv arbeitende Zusammensetzung für Infrarotlaser
EP1062285A2 (de) 1998-06-03 2000-12-27 Kimberly-Clark Worldwide, Inc. Neonanoplaste hergestellt durch mikroemulsionstechnologie sowie tinten für den tintenstrahldruck
BR9906513A (pt) 1998-06-03 2001-10-30 Kimberly Clark Co Fotoiniciadores novos e aplicações para osmesmos
US6358669B1 (en) 1998-06-23 2002-03-19 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
EP1506856A3 (de) 1998-06-23 2005-03-30 Kodak Polychrome Graphics LLC Positiv arbeitendes thermisches bilderzeugendes Element und positiv arbeitender lithographischer Druckplattenvorläufer
US6534238B1 (en) 1998-06-23 2003-03-18 Kodak Polychrome Graphics, Llc Thermal digital lithographic printing plate
US6352811B1 (en) 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6352812B1 (en) 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6228157B1 (en) 1998-07-20 2001-05-08 Ronald S. Nohr Ink jet ink compositions
EP0985683A1 (de) * 1998-09-09 2000-03-15 Fuji Photo Film Co., Ltd. Fotoempfindliche Zusammensetzung und Verfahren zur Herstellung einer Flachdruckplatte
DE69930948T2 (de) 1998-09-28 2006-09-07 Kimberly-Clark Worldwide, Inc., Neenah Chelate mit chinoiden gruppen als photoinitiatoren
DE19847616C2 (de) * 1998-10-15 2001-05-10 Kodak Polychrome Graphics Gmbh Polyvinylacetale mit Imidogruppen sowie die Verwendung derselben in lichtempfindlichen Zusammensetzungen
ATE238393T1 (de) 1999-01-19 2003-05-15 Kimberly Clark Co Farbstoffe, farbstoffstabilisatoren, tintenzusammensetzungen und verfahren zu deren herstellung
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
JP4130030B2 (ja) * 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および１，３−ジヒドロ−１−オキソ−２ｈ−インデン誘導体化合物
US6294698B1 (en) 1999-04-16 2001-09-25 Kimberly-Clark Worldwide, Inc. Photoinitiators and applications therefor
US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
US6461794B1 (en) * 1999-08-11 2002-10-08 Kodak Polychrome Graphics Llc Lithographic printing forms
US6270938B1 (en) 2000-06-09 2001-08-07 Kodak Polychrome Graphics Llc Acetal copolymers and use thereof in photosensitive compositions
MXPA02012011A (es) 2000-06-19 2003-04-22 Kimberly Clark Co Fotoiniciaodres novedosos y aplicaciones para los mismos.
WO2002002533A1 (fr) 2000-07-05 2002-01-10 Yamanouchi Pharmaceutical Co., Ltd. Derives de propane-1,3-dione
JP3902523B2 (ja) * 2002-08-05 2007-04-11 富士フイルム株式会社 光情報記録媒体および情報記録方法
CN1964950A (zh) 2004-06-04 2007-05-16 安斯泰来制药有限公司 丙烷－1,3－二酮衍生物或其盐
JP4649158B2 (ja) * 2004-09-30 2011-03-09 富士フイルム株式会社 ホログラム記録方法
SI1864976T1 (sl) * 2005-03-31 2012-12-31 Astellas Pharma Inc. Propan-1,3-dionski derivat ali njegova sol
EP2135901A4 (de) * 2007-03-05 2013-02-13 Fujifilm Corp Verbindung für photoresist, photoresistlösung und davon gebrauch machendes ätzverfahren
PL2153280T3 (pl) * 2007-05-25 2011-09-30 Agfa Nv Prekursor kliszy drukarskiej do druku litograficznego
JP5634888B2 (ja) * 2011-01-12 2014-12-03 富士フイルム株式会社 インク組成物、画像形成方法及び印画物
JP2014040529A (ja) * 2012-08-22 2014-03-06 Fujifilm Corp インク組成物、画像形成方法、及び印画物
US9360759B2 (en) 2014-09-12 2016-06-07 Eastman Kodak Company Forming conductive metal patterns using water-soluble polymers
WO2020161052A1 (en) * 2019-02-06 2020-08-13 Merck Patent Gmbh Organic semiconducting polymers
WO2020203386A1 (ja) * 2019-03-29 2020-10-08 富士フイルム株式会社 パターン形成用組成物、キット、硬化膜、積層体、パターンの製造方法、および半導体素子の製造方法
CN113929656A (zh) * 2021-09-28 2022-01-14 西安交通大学 一种基于茚酮烯的发光材料及其制备方法和应用

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2732301A (en) * 1952-10-15 1956-01-24 Chxcxch
DE1522358A1 (de) * 1966-02-18 1969-07-24 Agfa Gevaert Ag Sensibilisierung lichtempfindlicher Polymerer
US3528814A (en) * 1966-04-29 1970-09-15 Agfa Gevaert Ag Sensitization of light-sensitive polymers
US3615453A (en) * 1968-10-09 1971-10-26 Eastman Kodak Co Crosslinkable polymer compositions
JPS5148516B2 (de) * 1973-02-07 1976-12-21
US4163097A (en) * 1975-06-18 1979-07-31 Ciba-Geigy Corporation Crosslinkable polymeric compounds
US4062686A (en) * 1976-04-21 1977-12-13 Eastman Kodak Company Sensitizers for photocrosslinkable polymers
JPS5928324B2 (ja) * 1976-09-09 1984-07-12 富士写真フイルム株式会社 光重合性組成物
JPS5928328B2 (ja) * 1977-11-29 1984-07-12 富士写真フイルム株式会社 光重合性組成物
EP0021019B1 (de) * 1979-05-18 1984-10-17 Ciba-Geigy Ag Lichtvernetzbare Copolymere, sie enthaltendes lichtempfindliches Aufzeichnungsmaterial, seine Verwendung zur Herstellung photographischer Abbildungen und Verfahren zur Herstellung von photographischen Abbildungen
US4481340A (en) * 1982-12-03 1984-11-06 Lourens Minnema Photosensitive polyamic acid derivative, compound used in manufacture of derivative, method of manufacturing substrate having polyimide layer, and semiconductor device made from said method
JPS6026033A (ja) * 1983-07-01 1985-02-08 エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン 感光性ポリアミド酸誘導体およびこれを用いて基体上にポリイミドパタ−ンを形成する方法
US4636459A (en) * 1985-03-06 1987-01-13 Fuji Photo Film Co., Ltd. Photopolymerizable compositions
JPS6278544A (ja) * 1985-10-01 1987-04-10 Fuji Photo Film Co Ltd 感光性組成物
JPS62294238A (ja) * 1986-06-13 1987-12-21 Fuji Photo Film Co Ltd 感光性組成物
EP0333156A3 (de) * 1988-03-16 1990-03-21 Fuji Photo Film Co., Ltd. Lithographische Platte, die kein Befeuchtungswasser benötigt
US4917977A (en) * 1988-12-23 1990-04-17 E. I. Du Pont De Nemours And Company Visible sensitizers for photopolymerizable compositions

Also Published As

Publication number Publication date
EP0368327B1 (de) 1995-02-15
US5202221A (en) 1993-04-13
EP0368327A3 (de) 1991-02-06
DE68921146T2 (de) 1995-06-14
EP0368327A2 (de) 1990-05-16

Similar Documents

Publication Publication Date Title
DE68921146D1 (de) Lichtempfindliche Zusammensetzung.
DE68921019D1 (de) Lichtempfindliche Zusammensetzungen.
DE69014913D1 (de) Lichtempfindliche Zusammensetzung.
DE68915148D1 (de) Fotoresist-zusammensetzung.
DE3751555D1 (de) Photoempfindliche Zusammensetzung.
DE68926516D1 (de) Lichtempfindliche Zusammensetzung
DE68907659D1 (de) Warmhaertende organosiloxanzusammensetzung.
DE68921867D1 (de) Photopolymerisierbare Zusammensetzung.
DE3788103D1 (de) Lichtempfindliche Zusammensetzung.
DE68914176D1 (de) Photopolymerisierbare Zusammensetzung.
DE68924884D1 (de) Tonerzusammensetzungen.
DE3888060D1 (de) Lichtempfindliche Harzzusammensetzung.
DE3853694D1 (de) Photolackzusammensetzung.
DE68916395D1 (de) Zusammensetzung.
DE69012475D1 (de) Lichtempfindliche Zusammensetzungen.
DE68924246D1 (de) Tonerzusammensetzung.
DE68905762D1 (de) Perorale zusammensetzungen.
DE68917528D1 (de) Lichtempfindliche Vorrichtungen.
DE3850459D1 (de) Lichtempfindliche Zusammensetzungen.
DE68919102D1 (de) Photopolymerisierbare Zusammensetzung.
NO892711D0 (no) Sammensetninger.
DE68906193D1 (de) Hypersphyxia verursachende zusammensetzung.
DE68913313D1 (de) Kopiergerät.
NO893775D0 (no) Substituerte tienepyraner.
DE68922901D1 (de) Photoresistzusammensetzung.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee