PL2153280T3 - Prekursor kliszy drukarskiej do druku litograficznego - Google Patents

Prekursor kliszy drukarskiej do druku litograficznego

Info

Publication number
PL2153280T3
PL2153280T3 PL08750299T PL08750299T PL2153280T3 PL 2153280 T3 PL2153280 T3 PL 2153280T3 PL 08750299 T PL08750299 T PL 08750299T PL 08750299 T PL08750299 T PL 08750299T PL 2153280 T3 PL2153280 T3 PL 2153280T3
Authority
PL
Poland
Prior art keywords
printing plate
lithographic printing
plate precursor
mszw
sensitizers
Prior art date
Application number
PL08750299T
Other languages
English (en)
Inventor
Jan Venneman
Peter Hendrikx
Paul Callant
Alexander Williamson
Original Assignee
Agfa Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Nv filed Critical Agfa Nv
Publication of PL2153280T3 publication Critical patent/PL2153280T3/pl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Organic Insulating Materials (AREA)
  • Electric Double-Layer Capacitors Or The Like (AREA)
  • Secondary Cells (AREA)
  • Polymerisation Methods In General (AREA)
PL08750299T 2007-05-25 2008-05-15 Prekursor kliszy drukarskiej do druku litograficznego PL2153280T3 (pl)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US94010107P 2007-05-25 2007-05-25
EP07108955 2007-05-25
PCT/EP2008/055954 WO2008145530A1 (en) 2007-05-25 2008-05-15 A lithographic printing plate precursor
EP08750299A EP2153280B1 (en) 2007-05-25 2008-05-15 A lithographic printing plate precursor

Publications (1)

Publication Number Publication Date
PL2153280T3 true PL2153280T3 (pl) 2011-09-30

Family

ID=38663059

Family Applications (1)

Application Number Title Priority Date Filing Date
PL08750299T PL2153280T3 (pl) 2007-05-25 2008-05-15 Prekursor kliszy drukarskiej do druku litograficznego

Country Status (9)

Country Link
US (1) US20100104980A1 (pl)
EP (1) EP2153280B1 (pl)
CN (1) CN101681105B (pl)
AT (1) ATE507506T1 (pl)
BR (1) BRPI0811195A2 (pl)
DE (1) DE602008006548D1 (pl)
ES (1) ES2362956T3 (pl)
PL (1) PL2153280T3 (pl)
WO (1) WO2008145530A1 (pl)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2225612B1 (en) * 2007-12-19 2016-11-16 Agfa Graphics N.V. A method for preparing lithographic printing plate precursors
JP5449866B2 (ja) 2009-05-29 2014-03-19 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
EP2290447A1 (en) 2009-08-25 2011-03-02 Agfa Graphics N.V. A set for developing a lithographic printing plate
EP3327088A1 (en) * 2016-11-28 2018-05-30 Agfa-Gevaert Nv A multicolour laser marking method
EP3392709A1 (en) 2017-04-21 2018-10-24 Agfa Nv A lithographic printing plate precursor

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3830914A1 (de) * 1988-09-10 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von kopien
US5202221A (en) * 1988-11-11 1993-04-13 Fuji Photo Film Co., Ltd. Light-sensitive composition
US5609992A (en) * 1994-11-01 1997-03-11 Fuji Photo Film Co., Ltd. Photopolymerizable composition
US5759742A (en) * 1996-09-25 1998-06-02 Eastman Kodak Company Photosensitive element having integral thermally bleachable mask and method of use
US6335144B1 (en) * 1999-04-27 2002-01-01 Fuji Photo Film Co., Ltd. Photopolymerizable composition for short wavelength semiconductor laser exposure
JP4105371B2 (ja) * 2000-07-28 2008-06-25 富士フイルム株式会社 ネガ型感光性平版印刷版
DE10307453B4 (de) * 2003-02-21 2005-07-21 Kodak Polychrome Graphics Gmbh Oxazol-Derivate enthaltende strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente
CN1882879B (zh) * 2003-09-22 2010-08-11 爱克发印艺公司 可光聚合的组合物
JP4439327B2 (ja) * 2004-04-30 2010-03-24 富士フイルム株式会社 平版印刷版用原版
ES2372289T3 (es) * 2004-05-19 2012-01-18 Agfa Graphics N.V. Método de fabricación de una plancha de impresión de fotopolímero.
DE602004011046T2 (de) * 2004-07-30 2009-01-02 Agfa Graphics N.V. Divinylfluorene
EP1810082B1 (en) * 2004-11-05 2020-01-08 Agfa Nv Photopolymerizable composition
JP4792326B2 (ja) * 2005-07-25 2011-10-12 富士フイルム株式会社 平版印刷版の作製方法および平版印刷版原版
ES2333442T3 (es) * 2005-08-26 2010-02-22 Agfa Graphics N.V. Precursor de placa de impresion fotopolimerico.

Also Published As

Publication number Publication date
EP2153280B1 (en) 2011-04-27
CN101681105B (zh) 2012-12-05
BRPI0811195A2 (pt) 2014-10-29
DE602008006548D1 (de) 2011-06-09
CN101681105A (zh) 2010-03-24
WO2008145530A1 (en) 2008-12-04
US20100104980A1 (en) 2010-04-29
ES2362956T3 (es) 2011-07-15
EP2153280A1 (en) 2010-02-17
ATE507506T1 (de) 2011-05-15

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