DE3888060D1 - Lichtempfindliche Harzzusammensetzung. - Google Patents

Lichtempfindliche Harzzusammensetzung.

Info

Publication number
DE3888060D1
DE3888060D1 DE88115250T DE3888060T DE3888060D1 DE 3888060 D1 DE3888060 D1 DE 3888060D1 DE 88115250 T DE88115250 T DE 88115250T DE 3888060 T DE3888060 T DE 3888060T DE 3888060 D1 DE3888060 D1 DE 3888060D1
Authority
DE
Germany
Prior art keywords
resin composition
photosensitive resin
photosensitive
composition
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE88115250T
Other languages
English (en)
Other versions
DE3888060T2 (de
Inventor
Shinji Sakaguchi
Shiro Tan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE3888060D1 publication Critical patent/DE3888060D1/de
Application granted granted Critical
Publication of DE3888060T2 publication Critical patent/DE3888060T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
DE3888060T 1987-09-17 1988-09-16 Lichtempfindliche Harzzusammensetzung. Expired - Lifetime DE3888060T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62233292A JPH0814696B2 (ja) 1987-09-17 1987-09-17 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
DE3888060D1 true DE3888060D1 (de) 1994-04-07
DE3888060T2 DE3888060T2 (de) 1994-07-07

Family

ID=16952818

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3888060T Expired - Lifetime DE3888060T2 (de) 1987-09-17 1988-09-16 Lichtempfindliche Harzzusammensetzung.

Country Status (5)

Country Link
US (1) US4883739A (de)
EP (1) EP0307951B1 (de)
JP (1) JPH0814696B2 (de)
KR (1) KR960015637B1 (de)
DE (1) DE3888060T2 (de)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MX169700B (es) * 1988-06-13 1993-07-19 Sumitomo Chemical Co Composicion de capa protectora
US5456996A (en) * 1988-07-07 1995-10-10 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition
US5861229A (en) * 1988-07-07 1999-01-19 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound
US5063138A (en) * 1988-11-10 1991-11-05 Ocg Microelectronic Materials, Inc. Positive-working photoresist process employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent during photoresist coating
US4965167A (en) * 1988-11-10 1990-10-23 Olin Hunt Specialty Products, Inc. Positive-working photoresist employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent
JP2589803B2 (ja) * 1989-03-22 1997-03-12 富士写真フイルム株式会社 感電離放射線性樹脂組成物
JP2645587B2 (ja) * 1989-03-29 1997-08-25 富士写真フイルム株式会社 微細パターン形成材料及び微細パターン形成方法
JP2700918B2 (ja) * 1989-04-26 1998-01-21 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP2584672B2 (ja) * 1989-04-28 1997-02-26 富士写真フイルム株式会社 感光性組成物
JPH02287545A (ja) * 1989-04-28 1990-11-27 Tokyo Ohka Kogyo Co Ltd ポジ型感光性組成物
US5196517A (en) * 1989-10-30 1993-03-23 Ocg Microelectronic Materials, Inc. Selected trihydroxybenzophenone compounds and their use as photoactive compounds
US5219714A (en) * 1989-10-30 1993-06-15 Ocg Microelectronic Materials, Inc. Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures
JP2629990B2 (ja) * 1989-12-20 1997-07-16 住友化学工業株式会社 ポジ型レジスト用組成物
US5075194A (en) * 1990-01-09 1991-12-24 Industrial Technology Research Institute Positive photoresist composition containing 4,4-diester, 4,5-diester, or 5,5-diester of spiroglycol and 1-oxo-2-diazonaphthalene-5-sulfonic acid chloride
JP2715327B2 (ja) * 1990-01-19 1998-02-18 富士写真フイルム株式会社 感光性樹脂組成物
JP2761786B2 (ja) * 1990-02-01 1998-06-04 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JPH0460548A (ja) * 1990-06-29 1992-02-26 Fuji Photo Film Co Ltd パターン形成用組成物及び微細パターン形成方法
US5283155A (en) * 1991-01-11 1994-02-01 Sumitomo Chemical Company, Limited Positive resist composition comprising an alkali-soluble resin and a quinone diazide sulfonic acid ester of a hydroxy flavan derivative
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
JP2744557B2 (ja) * 1992-09-11 1998-04-28 富士写真フイルム株式会社 感光性樹脂組成物
JP3503839B2 (ja) 1994-05-25 2004-03-08 富士写真フイルム株式会社 ポジ型感光性組成物
US5552256A (en) * 1994-09-29 1996-09-03 International Business Machines Corporation Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring
JP3278306B2 (ja) 1994-10-31 2002-04-30 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
US5537695A (en) * 1995-01-27 1996-07-23 Ander; Anthony T. Musical toilet training device
WO1998002151A2 (en) 1996-07-12 1998-01-22 Leukosite, Inc. Chemokine receptor antagonists and methods of use therefor
US5719004A (en) * 1996-08-07 1998-02-17 Clariant Finance (Bvi) Limited Positive photoresist composition containing a 2,4-dinitro-1-naphthol
US7052743B2 (en) * 2003-08-29 2006-05-30 Eastman Kodak Company Chiral compounds and compositions containing the same
US7150900B2 (en) * 2003-12-16 2006-12-19 Eastman Kodak Company Liquid-crystal compositions comprising chiral compounds
US7329368B2 (en) 2005-12-08 2008-02-12 Industrial Technology Research Institute Temperature compensating chiral dopants
US8513650B2 (en) 2009-05-29 2013-08-20 Xerox Corporation Dielectric layer for an electronic device
EP2776498B1 (de) * 2011-11-09 2018-12-26 3M Innovative Properties Company Härtbare zusammensetzungen für fluorpolymere
JP6238845B2 (ja) * 2014-03-10 2017-11-29 日本化薬株式会社 フェノール樹脂、フェノール樹脂混合物、エポキシ樹脂、エポキシ樹脂組成物およびそれらの硬化物
JP7145818B2 (ja) * 2019-06-24 2022-10-03 富士フイルム株式会社 ポリマー、吸着剤

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1222071A (en) * 1967-03-13 1971-02-10 Agfa Gevaert Nv Light-sensitive photographic material
GB1278775A (en) * 1968-07-01 1972-06-21 Agfa Gevaert Light-sensitive photographic material
GB1303996A (de) * 1969-07-08 1973-01-24
JPS5645127B2 (de) * 1974-02-25 1981-10-24
FR2272082B1 (de) * 1974-05-24 1978-08-11 Issec
NL7604219A (nl) * 1975-04-24 1976-10-26 Cellophane Sa Werkwijze voor het bereiden van gestabiliseerde fotochrome preparaten en registratiematerialen vervaardigd met behulp van deze preparaten.
DE2547905C2 (de) * 1975-10-25 1985-11-21 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Aufzeichnungsmaterial
US4267961A (en) * 1978-09-06 1981-05-19 Eastman Kodak Company Photocrosslinkable, high-temperature-resistant polymers and their use in color imaging devices
JPS5570840A (en) * 1978-11-24 1980-05-28 Konishiroku Photo Ind Co Ltd Color photographic material containing dye image fading preventing agent
JPS5635130A (en) * 1979-08-31 1981-04-07 Fujitsu Ltd Resist material and method for forming resist pattern
JPS57204037A (en) * 1981-06-10 1982-12-14 Fuji Photo Film Co Ltd Color photographic sensitive material
US4626492A (en) * 1985-06-04 1986-12-02 Olin Hunt Specialty Products, Inc. Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound
JPH0619534B2 (ja) * 1985-06-10 1994-03-16 富士写真フイルム株式会社 カラ−写真材料
JPS62244045A (ja) * 1986-04-16 1987-10-24 Fuji Photo Film Co Ltd ハロゲン化銀カラ−写真感光材料

Also Published As

Publication number Publication date
EP0307951B1 (de) 1994-03-02
US4883739A (en) 1989-11-28
JPH0814696B2 (ja) 1996-02-14
JPS6476047A (en) 1989-03-22
EP0307951A3 (en) 1990-10-10
KR960015637B1 (ko) 1996-11-18
DE3888060T2 (de) 1994-07-07
KR890005574A (ko) 1989-05-15
EP0307951A2 (de) 1989-03-22

Similar Documents

Publication Publication Date Title
DE3888060T2 (de) Lichtempfindliche Harzzusammensetzung.
DE68921146D1 (de) Lichtempfindliche Zusammensetzung.
DE3751555D1 (de) Photoempfindliche Zusammensetzung.
DE3778429D1 (de) Wasseraufnehmende harzzusammensetzung.
DE3788103D1 (de) Lichtempfindliche Zusammensetzung.
DE69014913D1 (de) Lichtempfindliche Zusammensetzung.
DE3784432T2 (de) Warmhaertende harzzusammensetzung.
DE68920092D1 (de) Harzzusammensetzung.
DE3780383T2 (de) Polyphenyleneaetherharzzusammensetzung.
DE3853694D1 (de) Photolackzusammensetzung.
DE3850083T2 (de) Harzzusammensetzung.
DE68919151D1 (de) Harzzusammensetzung.
DE3779449T2 (de) Waermehaertbare harzzusammensetzung.
DE3850459D1 (de) Lichtempfindliche Zusammensetzungen.
DE68918544T2 (de) Harzzusammensetzung.
DE68911340D1 (de) Harzzusammensetzung.
DE68924798D1 (de) Harzzusammensetzung.
DE3787211T2 (de) Harzzusammensetzung.
DE68911597D1 (de) Harzzusammensetzung.
DE3852248D1 (de) Harzzusammensetzungen.
DE68911786T2 (de) Lichtempfindliche Zusammensetzung.
DE68905225D1 (de) Polyimiaharzzusammensetzung.
DE3852730T2 (de) Harzzusammensetzung.
DE3852017T2 (de) Lichtempfindliche Zusammensetzung.
DE3881236D1 (de) Harzzusammensetzungen.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: BARZ, P., DIPL.-CHEM. DR.RER.NAT., PAT.-ANW., 80803 MUENCHEN

8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP