DE69023605D1 - Positive Fotolackzusammensetzung. - Google Patents

Positive Fotolackzusammensetzung.

Info

Publication number
DE69023605D1
DE69023605D1 DE69023605T DE69023605T DE69023605D1 DE 69023605 D1 DE69023605 D1 DE 69023605D1 DE 69023605 T DE69023605 T DE 69023605T DE 69023605 T DE69023605 T DE 69023605T DE 69023605 D1 DE69023605 D1 DE 69023605D1
Authority
DE
Germany
Prior art keywords
photoresist composition
positive photoresist
positive
composition
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69023605T
Other languages
English (en)
Other versions
DE69023605T2 (de
Inventor
Masayuki Oie
Shoji Kawata
Takamasa Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zeon Corp
Original Assignee
Nippon Zeon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Zeon Co Ltd filed Critical Nippon Zeon Co Ltd
Application granted granted Critical
Publication of DE69023605D1 publication Critical patent/DE69023605D1/de
Publication of DE69023605T2 publication Critical patent/DE69023605T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69023605T 1989-10-02 1990-09-27 Positive Fotolackzusammensetzung. Expired - Fee Related DE69023605T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1257271A JP2567282B2 (ja) 1989-10-02 1989-10-02 ポジ型レジスト組成物

Publications (2)

Publication Number Publication Date
DE69023605D1 true DE69023605D1 (de) 1995-12-21
DE69023605T2 DE69023605T2 (de) 1996-04-18

Family

ID=17304064

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69023605T Expired - Fee Related DE69023605T2 (de) 1989-10-02 1990-09-27 Positive Fotolackzusammensetzung.

Country Status (4)

Country Link
US (1) US5166033A (de)
EP (1) EP0421667B1 (de)
JP (1) JP2567282B2 (de)
DE (1) DE69023605T2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5342734A (en) * 1992-02-25 1994-08-30 Morton International, Inc. Deep UV sensitive photoresist resistant to latent image decay
JPH05323605A (ja) * 1992-05-27 1993-12-07 Sumitomo Chem Co Ltd ポジ型レジスト組成物
MA23346A1 (fr) * 1993-10-14 1995-04-01 Genencor Int Variantes de la subtilisine
EP0658807B1 (de) * 1993-12-17 2000-04-05 Fuji Photo Film Co., Ltd. Positiv-arbeitende Fotolackzusammensetzung
KR101035845B1 (ko) * 2004-02-04 2011-05-19 삼성전자주식회사 고분자 감광성 화합물, 이를 포함하는 포토레지스트조성물 및 이의 제조 방법

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4139384A (en) * 1974-02-21 1979-02-13 Fuji Photo Film Co., Ltd. Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate
JPS5236043B2 (de) * 1974-02-21 1977-09-13
DE2742631A1 (de) * 1977-09-22 1979-04-05 Hoechst Ag Lichtempfindliche kopiermasse
GB2034911B (en) * 1978-10-26 1983-02-09 Toray Industries Dry planographic printing plate
JPS5562444A (en) * 1978-11-02 1980-05-10 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS58205147A (ja) * 1982-05-25 1983-11-30 Sumitomo Chem Co Ltd ポジ型フオトレジスト組成物
JPS59148784A (ja) * 1983-02-10 1984-08-25 Konishiroku Photo Ind Co Ltd ５―置換―２―ハロメチル―１，３，４―オキサジアゾール化合物及び該化合物を含有する光反応開始剤
JPS60121445A (ja) * 1983-12-06 1985-06-28 Japan Synthetic Rubber Co Ltd 集積回路作製用ポジ型感光性樹脂組成物
JPS62227143A (ja) * 1986-03-28 1987-10-06 Toshiba Corp 感光性組成物
US4871644A (en) * 1986-10-01 1989-10-03 Ciba-Geigy Corporation Photoresist compositions with a bis-benzotriazole
DE3724791A1 (de) * 1987-07-27 1989-02-09 Merck Patent Gmbh Positiv-fotoresist-zusammensetzungen
JPH01277234A (ja) * 1988-04-28 1989-11-07 Toshiba Corp レジスト

Also Published As

Publication number Publication date
EP0421667B1 (de) 1995-11-15
US5166033A (en) 1992-11-24
JP2567282B2 (ja) 1996-12-25
DE69023605T2 (de) 1996-04-18
JPH03119358A (ja) 1991-05-21
EP0421667A1 (de) 1991-04-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee