DE68922901T2 - Photoresistzusammensetzung. - Google Patents

Photoresistzusammensetzung.

Info

Publication number
DE68922901T2
DE68922901T2 DE68922901T DE68922901T DE68922901T2 DE 68922901 T2 DE68922901 T2 DE 68922901T2 DE 68922901 T DE68922901 T DE 68922901T DE 68922901 T DE68922901 T DE 68922901T DE 68922901 T2 DE68922901 T2 DE 68922901T2
Authority
DE
Germany
Prior art keywords
photoresist composition
photoresist
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68922901T
Other languages
English (en)
Other versions
DE68922901D1 (de
Inventor
Toshio C O Oki Electric I Itoh
Miwa C O Oki Electric I Sakata
Yoshio C O Oki Elect Yamashita
Takateru C O Fuji Chemic Asano
Yuuzi C O Fuji Chemical Kosuga
Hiroshi C O Fuji Chemi Umehara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Chemical Industries Co Ltd
Oki Electric Industry Co Ltd
Original Assignee
Fuji Chemical Industries Co Ltd
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Chemical Industries Co Ltd, Oki Electric Industry Co Ltd filed Critical Fuji Chemical Industries Co Ltd
Publication of DE68922901D1 publication Critical patent/DE68922901D1/de
Application granted granted Critical
Publication of DE68922901T2 publication Critical patent/DE68922901T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE68922901T 1988-12-23 1989-12-19 Photoresistzusammensetzung. Expired - Fee Related DE68922901T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP32538688 1988-12-23
JP1311716A JPH02275956A (ja) 1988-12-23 1989-11-30 フォトレジスト組成物

Publications (2)

Publication Number Publication Date
DE68922901D1 DE68922901D1 (de) 1995-07-06
DE68922901T2 true DE68922901T2 (de) 1995-10-12

Family

ID=26566864

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68922901T Expired - Fee Related DE68922901T2 (de) 1988-12-23 1989-12-19 Photoresistzusammensetzung.

Country Status (4)

Country Link
US (1) US5128231A (de)
EP (1) EP0374856B1 (de)
JP (1) JPH02275956A (de)
DE (1) DE68922901T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5256144A (en) * 1989-11-02 1993-10-26 Danforth Biomedical, Inc. Low profile, high performance interventional catheters
DE4125042A1 (de) * 1991-07-29 1993-02-04 Hoechst Ag Negativ arbeitendes strahlungsempfindliches gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
US5352564A (en) * 1993-01-19 1994-10-04 Shin-Etsu Chemical Co., Ltd. Resist compositions
US5552256A (en) * 1994-09-29 1996-09-03 International Business Machines Corporation Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring
JP3707856B2 (ja) * 1996-03-07 2005-10-19 富士通株式会社 レジストパターンの形成方法
US6107425A (en) * 1998-02-06 2000-08-22 Shipley Company, L.L.C. Narrow molecular weight distribution polymers and use of same as resin binders for negative-acting photoresists
US20030143343A1 (en) * 2001-12-19 2003-07-31 Fuji Photo Film Co., Ltd. Wall-structured body and process for manufacturing the same
JP2017504827A (ja) * 2013-12-20 2017-02-09 コベストロ、ドイチュラント、アクチエンゲゼルシャフトＣｏｖｅｓｔｒｏ Ｄｅｕｔｓｃｈｌａｎｄ Ａｇ 改善された光感受性を備えるホログラフィック媒体
JPWO2020174767A1 (ja) * 2019-02-28 2021-11-11 富士フイルム株式会社 パターンつき基板の製造方法、回路基板の製造方法、タッチパネルの製造方法、及び積層体

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3779778A (en) * 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
US3793033A (en) * 1972-09-05 1974-02-19 Minnesota Mining & Mfg Development-free printing plate
JPS56162744A (en) * 1980-05-19 1981-12-14 Hitachi Ltd Formation of fine pattern
JPS59148784A (ja) * 1983-02-10 1984-08-25 Konishiroku Photo Ind Co Ltd ５―置換―２―ハロメチル―１，３，４―オキサジアゾール化合物及び該化合物を含有する光反応開始剤
DE3541534A1 (de) * 1985-11-25 1987-05-27 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch
CA1307695C (en) * 1986-01-13 1992-09-22 Wayne Edmund Feely Photosensitive compounds and thermally stable and aqueous developablenegative images
US5034304A (en) * 1986-01-13 1991-07-23 Rohm And Haas Company Photosensitive compounds and thermally stable and aqueous developable negative images
DE3621376A1 (de) * 1986-06-26 1988-01-07 Hoechst Ag Strahlungsempfindliches aufzeichnungsmaterial
EP0319325A3 (de) * 1987-12-04 1990-12-27 Wako Pure Chemical Industries, Ltd. Photoempfindliches Material und Verfahren zur Herstellung von Strukturen damit

Also Published As

Publication number Publication date
US5128231A (en) 1992-07-07
EP0374856B1 (de) 1995-05-31
EP0374856A1 (de) 1990-06-27
JPH02275956A (ja) 1990-11-09
DE68922901D1 (de) 1995-07-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee