DE3677527D1 - Ionische farbstoffe als initiatoren enthaltende fotosensitive materialien. - Google Patents

Ionische farbstoffe als initiatoren enthaltende fotosensitive materialien.

Info

Publication number
DE3677527D1
DE3677527D1 DE8686308967T DE3677527T DE3677527D1 DE 3677527 D1 DE3677527 D1 DE 3677527D1 DE 8686308967 T DE8686308967 T DE 8686308967T DE 3677527 T DE3677527 T DE 3677527T DE 3677527 D1 DE3677527 D1 DE 3677527D1
Authority
DE
Germany
Prior art keywords
ionic
colors
materials containing
photosensitive materials
containing initiators
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8686308967T
Other languages
English (en)
Inventor
Peter Gottschalk
Douglas Carlyle Neckers
Gary Benjamin Schuster
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mead Corp
Original Assignee
Mead Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/917,873 external-priority patent/US4772541A/en
Application filed by Mead Corp filed Critical Mead Corp
Application granted granted Critical
Publication of DE3677527D1 publication Critical patent/DE3677527D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/025Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00Dyes not provided for by a single group of this subclass
    • C09B69/02Dyestuff salts, e.g. salts of acid dyes with basic dyes
    • C09B69/06Dyestuff salts, e.g. salts of acid dyes with basic dyes of cationic dyes with organic acids or with inorganic complex acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16HGEARING
    • F16H53/00Cams ; Non-rotary cams; or cam-followers, e.g. rollers for gearing mechanisms
    • F16H53/02Single-track cams for single-revolution cycles; Camshafts with such cams
    • F16H53/025Single-track cams for single-revolution cycles; Camshafts with such cams characterised by their construction, e.g. assembling or manufacturing features
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61CDENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C13/00Dental prostheses; Making same
    • A61C13/0003Making bridge-work, inlays, implants or the like
    • A61C13/0006Production methods
    • A61C13/0013Production methods using stereolithographic techniques
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61CDENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C19/00Dental auxiliary appliances
    • A61C19/003Apparatus for curing resins by radiation
DE8686308967T 1985-11-20 1986-11-18 Ionische farbstoffe als initiatoren enthaltende fotosensitive materialien. Expired - Lifetime DE3677527D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US80001485A 1985-11-20 1985-11-20
US86036786A 1986-05-06 1986-05-06
US06/917,873 US4772541A (en) 1985-11-20 1986-10-10 Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same

Publications (1)

Publication Number Publication Date
DE3677527D1 true DE3677527D1 (de) 1991-03-21

Family

ID=27419957

Family Applications (2)

Application Number Title Priority Date Filing Date
DE8686308967T Expired - Lifetime DE3677527D1 (de) 1985-11-20 1986-11-18 Ionische farbstoffe als initiatoren enthaltende fotosensitive materialien.
DE3650107T Expired - Lifetime DE3650107T2 (de) 1985-11-20 1986-11-18 Ionische Farbstoffe.

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE3650107T Expired - Lifetime DE3650107T2 (de) 1985-11-20 1986-11-18 Ionische Farbstoffe.

Country Status (6)

Country Link
EP (2) EP0223587B1 (de)
KR (1) KR940002538B1 (de)
CN (1) CN86108826A (de)
BR (1) BR8605710A (de)
DE (2) DE3677527D1 (de)
DK (1) DK553786A (de)

Families Citing this family (189)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4977511A (en) * 1985-11-20 1990-12-11 The Mead Corporation Photosensitive materials containing ionic dye compound as initiators
JPS62232638A (ja) * 1986-04-02 1987-10-13 Brother Ind Ltd 感光感圧記録シ−ト
US4895880A (en) * 1986-05-06 1990-01-23 The Mead Corporation Photocurable compositions containing photobleachable ionic dye complexes
US4950581A (en) * 1987-07-06 1990-08-21 Fuji Photo Film Co., Ltd. Photopolymerizable composition
JPH07120036B2 (ja) * 1987-07-06 1995-12-20 富士写真フイルム株式会社 光重合性組成物
US4751102A (en) * 1987-07-27 1988-06-14 The Mead Corporation Radiation-curable ink and coating compositions containing ionic dye compounds as initiators
JPH0820732B2 (ja) * 1987-10-13 1996-03-04 富士写真フイルム株式会社 光重合性組成物
US4874685A (en) * 1987-11-27 1989-10-17 The Mead Corporation Photocurable composition containing a photoreducible dye a thiol and an N,N'-dialkylaniline
US4840866A (en) * 1988-03-24 1989-06-20 The Mead Corporation Microcapsule imaging system having improved dynamic range
US4859572A (en) * 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
JP2641260B2 (ja) * 1988-07-26 1997-08-13 キヤノン株式会社 光重合開始剤及び感光性組成物
EP0364250A3 (de) * 1988-10-11 1991-01-30 The Mead Corporation Bildaufzeichnung
US4954414A (en) * 1988-11-08 1990-09-04 The Mead Corporation Photosensitive composition containing a transition metal coordination complex cation and a borate anion and photosensitive materials employing the same
CA2005933A1 (en) * 1989-01-09 1990-07-09 Jesse Hipps, Sr. Photohardenable composition containing five member aromatic group with imine moiety
JP2571115B2 (ja) * 1989-01-17 1997-01-16 富士写真フイルム株式会社 感光性組成物の増感方法及び増感された感光性組成物
US4954415A (en) * 1989-03-09 1990-09-04 The Mead Corporation Photoinitiator compositions containing O-acylthiohydroxamate or an N-alkoxypyridinethione and photohardenable compositions containing the same
CA2009652A1 (en) * 1989-03-09 1990-09-09 Paul Davis Photoinitiator compositions containing disulfides and photohardenable compositions containing the same
EP0390439A1 (de) * 1989-03-27 1990-10-03 The Mead Corporation Als Photoinitiatoren verwendbare Komplexe und diese enthaltende photohärtbare Zusammensetzungen
DE69030477T2 (de) * 1989-10-13 1997-08-28 Fuji Photo Film Co Ltd Einen Aluminatkomplex enthaltendes Bildaufzeichnungsmaterial
KR910012820A (ko) * 1989-12-20 1991-08-08 로레인 제이. 프란시스 황산화제 배합물을 함유하는 유리 라디칼 중합성 조성물
EP0438123B1 (de) * 1990-01-16 1995-09-13 Showa Denko Kabushiki Kaisha Polymerisationsinitiator verwendbar in der Nähe von Infrarot
EP0450254A1 (de) * 1990-04-03 1991-10-09 Ciba-Geigy Ag Photohärtbare Zusammensetzungen
JPH043064A (ja) * 1990-04-20 1992-01-08 Oriental Photo Ind Co Ltd 感光体
TW207021B (de) * 1990-07-23 1993-06-01 Showa Denko Kk
JP3244288B2 (ja) * 1990-07-23 2002-01-07 昭和電工株式会社 近赤外光消色型記録材料
TW363999B (en) * 1991-06-04 1999-07-11 Vantico Ag Photosensitive compositions
GB9121789D0 (en) * 1991-10-14 1991-11-27 Minnesota Mining & Mfg Positive-acting photothermographic materials
US5721287A (en) 1993-08-05 1998-02-24 Kimberly-Clark Worldwide, Inc. Method of mutating a colorant by irradiation
US5733693A (en) 1993-08-05 1998-03-31 Kimberly-Clark Worldwide, Inc. Method for improving the readability of data processing forms
US5643356A (en) 1993-08-05 1997-07-01 Kimberly-Clark Corporation Ink for ink jet printers
US5773182A (en) 1993-08-05 1998-06-30 Kimberly-Clark Worldwide, Inc. Method of light stabilizing a colorant
US6017661A (en) 1994-11-09 2000-01-25 Kimberly-Clark Corporation Temporary marking using photoerasable colorants
US6017471A (en) 1993-08-05 2000-01-25 Kimberly-Clark Worldwide, Inc. Colorants and colorant modifiers
US5700850A (en) 1993-08-05 1997-12-23 Kimberly-Clark Worldwide Colorant compositions and colorant stabilizers
US6211383B1 (en) 1993-08-05 2001-04-03 Kimberly-Clark Worldwide, Inc. Nohr-McDonald elimination reaction
US5681380A (en) 1995-06-05 1997-10-28 Kimberly-Clark Worldwide, Inc. Ink for ink jet printers
US5645964A (en) 1993-08-05 1997-07-08 Kimberly-Clark Corporation Digital information recording media and method of using same
CA2120838A1 (en) 1993-08-05 1995-02-06 Ronald Sinclair Nohr Solid colored composition mutable by ultraviolet radiation
ES2127365T5 (es) * 1993-08-26 2002-08-16 Vantico Ag Composicion liquida reticulable por radiacion, destinada en especial a la estereolitografia.
US6033465A (en) 1995-06-28 2000-03-07 Kimberly-Clark Worldwide, Inc. Colorants and colorant modifiers
EP0646580B1 (de) * 1993-09-16 2000-05-31 Ciba SC Holding AG Vinyletherverbindungen mit zusätzlichen von Vinylethergruppen verschiedenen funktionellen Gruppen und deren Verwendung zur Formulierung härtbarer Zusammensetzungen
US5739175A (en) 1995-06-05 1998-04-14 Kimberly-Clark Worldwide, Inc. Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer
US6242057B1 (en) 1994-06-30 2001-06-05 Kimberly-Clark Worldwide, Inc. Photoreactor composition and applications therefor
US5685754A (en) 1994-06-30 1997-11-11 Kimberly-Clark Corporation Method of generating a reactive species and polymer coating applications therefor
US6071979A (en) 1994-06-30 2000-06-06 Kimberly-Clark Worldwide, Inc. Photoreactor composition method of generating a reactive species and applications therefor
US6008268A (en) 1994-10-21 1999-12-28 Kimberly-Clark Worldwide, Inc. Photoreactor composition, method of generating a reactive species, and applications therefor
JP3442176B2 (ja) 1995-02-10 2003-09-02 富士写真フイルム株式会社 光重合性組成物
TW418215B (en) 1995-03-13 2001-01-11 Ciba Sc Holding Ag A process for the production of three-dimensional articles in a stereolithography bath comprising the step of sequentially irradiating a plurality of layers of a liquid radiation-curable composition
US5811199A (en) 1995-06-05 1998-09-22 Kimberly-Clark Worldwide, Inc. Adhesive compositions containing a photoreactor composition
US5798015A (en) 1995-06-05 1998-08-25 Kimberly-Clark Worldwide, Inc. Method of laminating a structure with adhesive containing a photoreactor composition
US5747550A (en) 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
US5786132A (en) 1995-06-05 1998-07-28 Kimberly-Clark Corporation Pre-dyes, mutable dye compositions, and methods of developing a color
ATE195815T1 (de) 1995-06-05 2000-09-15 Kimberly Clark Co Farbstoffvorläufer und diese enthaltende zusammensetzungen
DE69624496T2 (de) * 1995-09-09 2003-07-17 Vantico Ltd Verfahren zum herstellung von polymerschichten mit selektiv gefärbten zonen
TW467933B (en) * 1995-11-24 2001-12-11 Ciba Sc Holding Ag Photopolymerizable compositions comprising borate photoinitiators from monoboranes and the use thereof
TW466256B (en) * 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
US5782963A (en) 1996-03-29 1998-07-21 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
MX9705708A (es) 1995-11-28 1997-10-31 Kimberly Clark Co Estabilizadores de colorante mejorados.
US6099628A (en) 1996-03-29 2000-08-08 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5855655A (en) 1996-03-29 1999-01-05 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5891229A (en) 1996-03-29 1999-04-06 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
ATE191090T1 (de) * 1996-07-29 2000-04-15 Ciba Sc Holding Ag Flüssige, strahlungshärtbare zusammensetzung, insbesondere für die stereolithographie
EP0825201B2 (de) 1996-08-23 2006-11-29 Showa Denko Kabushiki Kaisha Photohärtbare Zusammensetzung und Härtungsverfahren
JPH10319584A (ja) * 1997-05-21 1998-12-04 Brother Ind Ltd マイクロカプセルを用いた感光性記録材料
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
CA2253054A1 (en) 1997-11-05 1999-05-05 Showa Denko K.K. Photocurable paint composition for road markings
WO1999044099A1 (en) * 1998-02-25 1999-09-02 Cycolor, Inc. Imaging system employing encapsulated radiation sensitive composition
JPH11249304A (ja) * 1998-03-02 1999-09-17 Oriental Photo Ind Co Ltd 乾式画像形成材料及び乾式画像形成方法
US6100007A (en) 1998-04-06 2000-08-08 Ciba Specialty Chemicals Corp. Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures
JP2002517523A (ja) 1998-06-03 2002-06-18 キンバリー クラーク ワールドワイド インコーポレイテッド 新規な光開始剤およびその利用
JP2002517540A (ja) 1998-06-03 2002-06-18 キンバリー クラーク ワールドワイド インコーポレイテッド インク及びインクジェット印刷用のネオナノプラスト及びマイクロエマルション技術
AU5219299A (en) 1998-07-20 2000-02-07 Kimberly-Clark Worldwide, Inc. Improved ink jet ink compositions
JP2002523393A (ja) 1998-08-21 2002-07-30 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 光活性化が可能な窒素含有塩基
US6398981B1 (en) 1998-09-18 2002-06-04 Universite Laval Photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum
JP2003533548A (ja) 1998-09-28 2003-11-11 キンバリー クラーク ワールドワイド インコーポレイテッド 光重合開始剤であるキノイド基を含むキレート
DE69916750T2 (de) 1998-11-17 2005-01-05 Showa Denko K.K. Photohärtbare Zusammensetzung
ES2195869T3 (es) 1999-01-19 2003-12-16 Kimberly Clark Co Nuevos colorantes, estabilizantes de colorantes, compuestos de tinta y metodos mejorados para su fabricacion.
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
US6174642B1 (en) 1999-02-25 2001-01-16 Cycolor, Inc. Imaging system employing encapsulated radiation sensitive composition
US6294698B1 (en) 1999-04-16 2001-09-25 Kimberly-Clark Worldwide, Inc. Photoinitiators and applications therefor
US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
KR100772772B1 (ko) 2000-06-19 2007-11-01 킴벌리-클라크 월드와이드, 인크. 신규한 광개시제 및 그의 용도
JP4551087B2 (ja) 2001-10-03 2010-09-22 スリーディー システムズ インコーポレーテッド 相変化支持材料組成物
US6841589B2 (en) 2001-10-03 2005-01-11 3D Systems, Inc. Ultra-violet light curable hot melt composition
KR100811393B1 (ko) * 2001-12-04 2008-03-07 주식회사 하이닉스반도체 패턴 붕괴 개선용 포토레지스트 첨가제 및 이를 함유하는포토레지스트 조성물
CN101706639A (zh) 2002-05-03 2010-05-12 Dsmip财产有限公司 可辐射固化树脂组合物及利用该组合物的快速成型方法
US6989225B2 (en) 2002-07-18 2006-01-24 3D Systems, Inc. Stereolithographic resins with high temperature and high impact resistance
US7635727B2 (en) 2003-06-24 2009-12-22 Ppg Industries Ohio, Inc. Composite transparencies
EP1622178A1 (de) * 2004-07-29 2006-02-01 Ecole Polytechnique Federale De Lausanne (Epfl) 2,2 -Bipyridinligand, Sensibilisierungsfarbstoff und farbstoffsensibilisierte Solarzelle
DE102004058584A1 (de) 2004-12-03 2006-06-08 Basf Ag Strahlungshärtbare Beschichtungsmassen
US8287611B2 (en) 2005-01-28 2012-10-16 Saint-Gobain Abrasives, Inc. Abrasive articles and methods for making same
US7591865B2 (en) 2005-01-28 2009-09-22 Saint-Gobain Abrasives, Inc. Method of forming structured abrasive article
US8435098B2 (en) 2006-01-27 2013-05-07 Saint-Gobain Abrasives, Inc. Abrasive article with cured backsize layer
US20080103226A1 (en) 2006-10-31 2008-05-01 Dsm Ip Assets B.V. Photo-curable resin composition
WO2008079934A2 (en) 2006-12-21 2008-07-03 Saint-Gobain Abrasives, Inc. Low corrosion abrasive articles and methods for forming same
IL200997A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Special polyether-based polyurethane formulations for the production of holographic media
IL200995A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Polyether-based polyurethane formulations for the production of holographic media
IL200722A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer compositions for optical elements and visual displays
US8852829B2 (en) 2008-10-01 2014-10-07 Bayer Materialscience Ag Prepolymer-based polyurethane formulations for producing holographic media
IL200996A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer formulations having a low crosslinking density
EP2218742A1 (de) 2009-02-12 2010-08-18 Bayer MaterialScience AG Photopolymerzusammensetzungen als verdruckbare Formulierungen
EP2218743A1 (de) 2009-02-12 2010-08-18 Bayer MaterialScience AG Prepolymerbasierte Polyurethanformulierungen zur Herstellung holographischer Filme
EP2219073B1 (de) 2009-02-17 2020-06-03 Covestro Deutschland AG Holografische Medien und Photopolymerzusammensetzungen
CN102272227B (zh) 2009-03-13 2014-03-12 帝斯曼知识产权资产管理有限公司 可辐射固化树脂组合物以及使用这种组合物的快速三维成像方法
CN102667935B (zh) 2009-11-03 2016-01-20 拜尔材料科学股份公司 具有不同书写共聚单体的光聚合物制剂
CN102574877B (zh) 2009-11-03 2016-04-20 拜尔材料科学股份公司 具有高折射率和降低的双键密度的氨基甲酸酯丙烯酸酯
IN2012DN03900A (de) 2009-11-03 2015-09-04 Bayer Materialscience Ag
KR101727770B1 (ko) 2009-11-03 2017-04-17 코베스트로 도이칠란드 아게 광중합체 제제 중의 첨가제로서의 플루오로우레탄
ES2381808T3 (es) 2009-11-03 2012-05-31 Bayer Materialscience Ag Formulaciones de fotopolímeros con módulo mecánico ajustable Guv
WO2011054799A2 (de) 2009-11-03 2011-05-12 Bayer Materialscience Ag Urethane als additive in einer photopolymer-formulierung
CN102666469B (zh) 2009-11-03 2016-03-02 拜尔材料科学股份公司 新型非结晶甲基丙烯酸酯、其的制备和应用
US20120237856A1 (en) 2009-11-03 2012-09-20 Bayer Intellectual Property Gmbh Selection method for additives in photopolymers
EP2354845B1 (de) 2010-02-02 2015-12-23 Covestro Deutschland AG Photopolymer-Formulierung zur Herstellung holographischer Medien
BR112012019378A2 (pt) 2010-02-02 2016-05-03 Bayer Ip Gmbh formulação de fotopolímero apresentando monômeros graváveis à base de triazina
EP2531889B1 (de) 2010-02-02 2020-06-03 Covestro Deutschland AG Verwendung einer photopolymer-formulierung mit ester-basierten schreibmonomeren zur herstellung holographischer medien
EP2330461A1 (de) 2010-03-26 2011-06-08 Bayer MaterialScience AG Projektionseinrichtung für einen Picoprojektor und holographischer Projektionsschirm
US9057946B2 (en) 2010-08-11 2015-06-16 Bayer Intellectual Property Gmbh Difunctional (meth)acrylate writing monomers
EP2450893A1 (de) 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren
EP2450387A1 (de) 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung für die Herstellung holographischer Medien
US8460451B2 (en) 2011-02-23 2013-06-11 3D Systems, Inc. Support material and applications thereof
US9157007B2 (en) 2011-03-09 2015-10-13 3D Systems, Incorporated Build material and applications thereof
US9394441B2 (en) 2011-03-09 2016-07-19 3D Systems, Inc. Build material and applications thereof
US9475889B2 (en) 2011-05-16 2016-10-25 Eastman Kodak Company Photoinitiator and photocurable compositions and uses
US20120295999A1 (en) * 2011-05-16 2012-11-22 Deepak Shukla Photoinitiator and photocurable compositions and uses
WO2013053792A1 (de) 2011-10-12 2013-04-18 Bayer Intellectual Property Gmbh Kettenübertragungsreagenzien in polyurethan-basierten photopolymer-formulierungen
JP2014535071A (ja) 2011-10-12 2014-12-25 バイエル・インテレクチュアル・プロパティ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングBayer Intellectual Property GmbH ポリウレタン系フォトポリマー処方物における硫黄含有連鎖移動剤
EP2613318B1 (de) 2012-01-05 2014-07-30 Bayer Intellectual Property GmbH Schichtaufbau mit einer Schutzschicht und einer belichteten Photopolymerschicht
TWI557187B (zh) 2012-05-03 2016-11-11 拜耳材料科學股份有限公司 用於光聚合物之新穎光起始劑
EP2700510B1 (de) 2012-08-23 2015-09-16 Bayer MaterialScience AG Polycarbonatbasierte Sicherheits- und/oder Wertdokumente mit Hologramm im Kartenkörper
US9658595B2 (en) 2012-08-23 2017-05-23 Covestro Deutschland Ag Security document and/or document of value containing a visually changeable window with a hologram
US8980406B2 (en) 2012-08-28 2015-03-17 3D Systems, Inc. Color stable inks and applications thereof
US9657186B2 (en) 2012-09-13 2017-05-23 3D Systems, Inc. Opaque inks and applications thereof
US20150353485A1 (en) 2013-01-25 2015-12-10 Bayer Materialscience Ag Security element having volume hologram and printed feature
TWI640428B (zh) 2013-02-27 2018-11-11 拜耳材料科學股份有限公司 以丙烯酸酯為基底之保護塗層與黏著劑
EP2772917A1 (de) 2013-02-27 2014-09-03 Bayer MaterialScience AG Schutzlacke auf Basis von strahlenvernetzbaren Polyurethandispersionen
CN105189092B (zh) 2013-03-15 2017-03-15 3D系统公司 三维打印材料系统
JP6497850B2 (ja) 2013-05-08 2019-04-10 コベストロ、ドイチュラント、アクチエンゲゼルシャフトCovestro Deutschland Ag ハロー防止層を有するホログラフィック記録媒体およびその製造
EP3058423B1 (de) 2013-10-17 2018-04-18 Covestro Deutschland AG Photopolymer-formulierung zur herstellung holographischer medien mit boraten mit niedriger tg
EP3063762B1 (de) 2013-10-30 2018-07-04 Covestro Deutschland AG Verbund umfassend ein substrat und einen photopolymerfilm
JP2017504827A (ja) 2013-12-20 2017-02-09 コベストロ、ドイチュラント、アクチエンゲゼルシャフトCovestro Deutschland Ag 改善された光感受性を備えるホログラフィック媒体
US11602892B2 (en) 2013-12-23 2023-03-14 3D Systems, Inc. Three dimensional printing materials, systems, and methods
EP3116707B1 (de) 2014-03-11 2021-05-05 3D Systems, Inc. Kolorierung von 3d-druck
WO2015161969A1 (de) 2014-04-25 2015-10-29 Bayer Material Science Ag Aromatische glykolether als schreibmonomere in holographischen photopolymer-formulierungen
WO2015184220A1 (en) 2014-05-30 2015-12-03 3D Systems, Incorporated Water dispersible support materials for 3d printing
EP3152266B1 (de) 2014-06-04 2020-10-07 3D Systems, Inc. Tinten mit geliermitteln für 3d-drucken
WO2015191539A1 (en) 2014-06-09 2015-12-17 3D Systems, Incorporated Methods of printing grayscale and full-color 3d articles
US9650526B2 (en) 2014-09-09 2017-05-16 3D Systems, Inc. Method of printing a three-dimensional article
US20160145452A1 (en) 2014-11-24 2016-05-26 3D Systems, Incorporated Inks comprising liquid rubber for 3d printing
WO2016091965A1 (de) 2014-12-12 2016-06-16 Covestro Deutschland Ag Naphthylacrylate als schreibmonomere für photopolymere
US10329244B2 (en) 2014-12-19 2019-06-25 Covestro Deutschland Ag Moisture-stable holographic media
TWI698326B (zh) 2015-01-14 2020-07-11 德商科思創德意志股份有限公司 以全相光學元件製備光學鑄件之方法及光學鑄件
KR20180019200A (ko) 2015-06-23 2018-02-23 코베스트로 도이칠란트 아게 치환된 트리아진 및 그의 제조 방법
EP3371263B1 (de) 2015-11-03 2020-10-21 3D Systems, Incorporated Biokompatible tinten zum 3d-drucken
EP3166109A1 (de) 2015-11-09 2017-05-10 Covestro Deutschland AG Kit-of-parts enthaltend versiegellungsschicht und photopolymer
US10316214B2 (en) 2016-03-08 2019-06-11 3D Systems, Incorporated Non-isocyanate polyurethane inks for 3D printing
WO2017176977A1 (en) 2016-04-07 2017-10-12 3D Systems, Incorporated Thiol-ene inks for 3d printing
JP6952113B2 (ja) 2016-11-09 2021-10-20 コベストロ、ドイチュラント、アクチエンゲゼルシャフトCovestro Deutschland Ag トリアリールオルガノボレートの製造方法
KR102489809B1 (ko) 2016-11-09 2023-01-20 코베스트로 도이칠란트 아게 트리아릴 유기보레이트의 제조 방법
TWI746688B (zh) 2016-11-09 2021-11-21 德商科思創德意志股份有限公司 製造三芳基有機硼酸鹽之方法
JP6880201B2 (ja) 2017-02-01 2021-06-02 スリーディー システムズ インコーポレーテッド 環化重合性モノマーを含有する3dプリント用インク
TW201906882A (zh) 2017-05-09 2019-02-16 德商科思創德意志股份有限公司 含有用於全像照射的光聚合物層及高度耐性漆層之薄膜結構
EP3401910A1 (de) 2017-05-09 2018-11-14 Covestro Deutschland AG Holographisches medium enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit
EP3401909A1 (de) 2017-05-09 2018-11-14 Covestro Deutschland AG Folienaufbau enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit
TW201906730A (zh) 2017-05-09 2019-02-16 德商科思創德意志股份有限公司 用於保護光聚合物膜複合物中之全像圖之含uv硬化性黏著層的塑膠膜
WO2018206498A1 (de) 2017-05-09 2018-11-15 Covestro Deutschland Ag System aus zwei trocken übertragbaren uv-härtenden lackschichten für den schutz eines hologramms in einem photopolymer-folienverbund
WO2018206503A1 (de) 2017-05-09 2018-11-15 Covestro Deutschland Ag Holographisches medium enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit
EP3435156A1 (de) 2017-07-26 2019-01-30 Covestro Deutschland AG Schutzschicht für photopolymer
US11098209B2 (en) 2017-10-05 2021-08-24 3D Systems, Inc. Cyclopolymerizable compounds for 3D printing
EP4141075A1 (de) 2017-11-07 2023-03-01 3D Systems, Incorporated Tinten für 3d-druck mit niedriger durchdrucktiefe
EP3495886A1 (de) 2017-12-06 2019-06-12 Covestro Deutschland AG Klebstofffreier photopolymerschichtaufbau
WO2019245847A1 (en) 2018-06-22 2019-12-26 3D Systems, Inc. Method of verifying integrity of a post-process removal of support material
US11453172B2 (en) 2018-06-22 2022-09-27 3D Systems, Inc. 3D printing build materials and support materials comprising a phosphor
JP7198926B2 (ja) 2018-11-30 2023-01-04 スリーディー システムズ インコーポレーテッド 低重合収縮性を有する3dプリント用インク
EP3997139A1 (de) 2019-07-12 2022-05-18 3D Systems, Inc. Trägermaterialien zum 3d-drucken
EP3772671A1 (de) 2019-08-06 2021-02-10 Covestro Deutschland AG Schichtaufbau für die belichtung von hologrammen
JP7340099B2 (ja) 2019-10-01 2023-09-06 スリーディー システムズ インコーポレーテッド 3dプリントのための光学活性造形材料
EP4038152A1 (de) 2019-10-01 2022-08-10 3D Systems, Inc. Lagerstabile baustoffe für 3d-druck
JP7391228B2 (ja) 2020-01-24 2023-12-04 スリーディー システムズ インコーポレーテッド 三次元プリント用途のための水溶性ワックス状支持材料
EP4244066A1 (de) 2020-11-16 2023-09-20 3D Systems, Inc. Baumaterialien zum drucken von 3d-artikeln
WO2022125668A1 (en) 2020-12-10 2022-06-16 3D Systems, Inc. Flame resistant build materials and associated printed 3d articles
WO2022192330A1 (en) 2021-03-10 2022-09-15 3D Systems, Inc. Flame resistant build materials and associated printed 3d articles
EP4305017A1 (de) 2021-03-10 2024-01-17 3D Systems, Inc. Additive für baumaterialien und zugehörige gedruckte 3d-artikel
CN117295797A (zh) 2021-05-07 2023-12-26 3D系统公司 用于构建材料和相关印刷3d制品的添加剂
US20240091412A1 (en) 2021-09-21 2024-03-21 3D Systems, Inc. Curable compounds and formulations for biomedical applications
WO2023156482A1 (de) 2022-02-21 2023-08-24 Covestro Deutschland Ag Thermostabile photopolymere im sichtbaren spektralbereich und photopolymer-zusammensetzungen damit
WO2023156485A1 (de) 2022-02-21 2023-08-24 Covestro Deutschland Ag Triarylalkylboratsalze als coinitiatoren in nir-photopolymerzusammensetzungen
WO2023156484A1 (de) 2022-02-21 2023-08-24 Covestro Deutschland Ag Photopolymerzusammensetzungen für thermostabile photopolymere im sichtbaren spektralbereich
WO2024015911A1 (en) 2022-07-15 2024-01-18 3D Systems, Inc. Hydrogels for 3d printing having high resolution
WO2024052256A1 (de) 2022-09-07 2024-03-14 Covestro Deutschland Ag Spezielle benzopyryliumsalze als farbstoffe für photopolymerzusammensetzungen

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3567453A (en) * 1967-12-26 1971-03-02 Eastman Kodak Co Light sensitive compositions for photoresists and lithography
JPS509178B1 (de) * 1970-12-28 1975-04-10
US4026705A (en) * 1975-05-02 1977-05-31 General Electric Company Photocurable compositions and methods
US4343891A (en) * 1980-05-23 1982-08-10 Minnesota Mining And Manufacturing Company Fixing of tetra (hydrocarbyl) borate salt imaging systems
US4447521A (en) * 1982-10-25 1984-05-08 Minnesota Mining And Manufacturing Company Fixing of tetra(hydrocarbyl)borate salt imaging systems
US4746685A (en) * 1984-08-31 1988-05-24 Nippon Oil And Fats Co., Ltd. Light curable dental composition
JPS61213838A (ja) * 1985-03-20 1986-09-22 Nippon Oil & Fats Co Ltd 感光性平版印刷版
GB8529448D0 (en) * 1985-11-29 1986-01-08 Ward Blenkinsop & Co Ltd Thioxanthone derivatives

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EP0389067A3 (en) 1990-11-28
DK553786A (da) 1987-05-21
EP0223587A1 (de) 1987-05-27
DK553786D0 (da) 1986-11-19
CN86108826A (zh) 1987-11-25
KR870005270A (ko) 1987-06-05
BR8605710A (pt) 1987-08-18
EP0389067B1 (de) 1994-10-19
EP0223587B1 (de) 1991-02-13
EP0389067A2 (de) 1990-09-26
DE3650107T2 (de) 1995-05-24
KR940002538B1 (ko) 1994-03-25

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