DE69031785T2 - Lichtempfindliche Zusammensetzung - Google Patents

Lichtempfindliche Zusammensetzung

Info

Publication number
DE69031785T2
DE69031785T2 DE69031785T DE69031785T DE69031785T2 DE 69031785 T2 DE69031785 T2 DE 69031785T2 DE 69031785 T DE69031785 T DE 69031785T DE 69031785 T DE69031785 T DE 69031785T DE 69031785 T2 DE69031785 T2 DE 69031785T2
Authority
DE
Germany
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69031785T
Other languages
English (en)
Other versions
DE69031785D1 (de
Inventor
Hirokazu Niki
Yasunobu Onishi
Yoshihito Kobayashi
Rumiko Hayase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Publication of DE69031785D1 publication Critical patent/DE69031785D1/de
Application granted granted Critical
Publication of DE69031785T2 publication Critical patent/DE69031785T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
DE69031785T 1989-05-09 1990-05-09 Lichtempfindliche Zusammensetzung Expired - Fee Related DE69031785T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP11547889 1989-05-09
JP32824289 1989-12-20

Publications (2)

Publication Number Publication Date
DE69031785D1 DE69031785D1 (de) 1998-01-22
DE69031785T2 true DE69031785T2 (de) 1998-06-10

Family

ID=26453973

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69031785T Expired - Fee Related DE69031785T2 (de) 1989-05-09 1990-05-09 Lichtempfindliche Zusammensetzung

Country Status (4)

Country Link
US (1) US5100768A (de)
EP (1) EP0397474B1 (de)
KR (1) KR920003809B1 (de)
DE (1) DE69031785T2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5744281A (en) * 1993-09-14 1998-04-28 Kabushiki Kaisha Toshiba Resist composition for forming a pattern and method of forming a pattern wherein the composition 4-phenylpyridine as an additive
EP0672954B1 (de) * 1994-03-14 1999-09-15 Kodak Polychrome Graphics LLC Strahlungsempfindliche Zusammensetzung, enthaltend ein Resolharz, ein Novolakharz, einen Infrarotabsorber und ein Triazin, und seine Verwendung in lithographischen Druckplatten
JPH08110635A (ja) * 1994-10-07 1996-04-30 Shin Etsu Chem Co Ltd 化学増幅ポジ型レジスト材料
EP0837367B1 (de) * 1996-10-16 2002-04-10 Sumitomo Chemical Company Limited Eine Dipyridylverbindung enthaltender positiver Photolack
JP3883706B2 (ja) 1998-07-31 2007-02-21 シャープ株式会社 エッチング方法、及び薄膜トランジスタマトリックス基板の製造方法
JP2010518014A (ja) * 2007-01-31 2010-05-27 バーテックス ファーマシューティカルズ インコーポレイテッド キナーゼ阻害剤として有用な２−アミノピリジン誘導体
CN101802711B (zh) * 2007-07-30 2014-12-03 布鲁尔科技公司 用于光刻法的可非共价交联的材料
TW200924762A (en) 2007-11-02 2009-06-16 Vertex Pharma Kinase inhibitors
JP2011529062A (ja) 2008-07-23 2011-12-01 バーテックス ファーマシューティカルズ インコーポレイテッド ピラゾロピリジンキナーゼ阻害剤
US8569337B2 (en) 2008-07-23 2013-10-29 Vertex Pharmaceuticals Incorporated Tri-cyclic pyrazolopyridine kinase inhibitors
MX2011000837A (es) 2008-07-23 2011-04-05 Vertex Pharma Inhibidores de pirazolpiridina cinasa triciclica.
AU2009279611A1 (en) 2008-08-06 2010-02-11 Vertex Pharmaceuticals Incorporated Aminopyridine kinase inhibitors
CA2760705A1 (en) 2009-05-06 2010-11-11 Vertex Pharmaceuticals Incorporated Pyrazolopyridines
EP2528917B1 (de) 2010-01-27 2016-10-19 Vertex Pharmaceuticals Incorporated Zur behandlung von autoimmun-, entzündlichen oder (hyper)proliferativen erkrankungen geeignete pyrazolopyridine
WO2011094290A1 (en) 2010-01-27 2011-08-04 Vertex Pharmaceuticals Incorporated Pyrazolopyrimidine kinase inhibitors
CN102869663A (zh) 2010-01-27 2013-01-09 沃泰克斯药物股份有限公司 吡唑并吡嗪激酶抑制剂
JP5601309B2 (ja) * 2010-11-29 2014-10-08 信越化学工業株式会社 ポジ型レジスト材料並びにこれを用いたパターン形成方法
US9541834B2 (en) * 2012-11-30 2017-01-10 Rohm And Haas Electronic Materials Llc Ionic thermal acid generators for low temperature applications
JP6044566B2 (ja) * 2014-03-04 2016-12-14 信越化学工業株式会社 ポジ型レジスト材料及びこれを用いたパターン形成方法
US10241411B2 (en) * 2016-10-31 2019-03-26 Rohm And Haas Electronic Materials Llc Topcoat compositions containing fluorinated thermal acid generators

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2064380C3 (de) * 1970-12-30 1981-01-22 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
DE2547905C2 (de) * 1975-10-25 1985-11-21 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Aufzeichnungsmaterial
JPS542720A (en) * 1977-06-08 1979-01-10 Konishiroku Photo Ind Co Ltd Forming method of photopolymerized image
DE3246106A1 (de) * 1982-12-13 1984-06-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial
DE3528930A1 (de) * 1985-08-13 1987-02-26 Hoechst Ag Polymere verbindungen und diese enthaltendes strahlungsempfindliches gemisch
JPH0717737B2 (ja) * 1987-11-30 1995-03-01 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法

Also Published As

Publication number Publication date
DE69031785D1 (de) 1998-01-22
EP0397474A3 (de) 1991-11-06
EP0397474A2 (de) 1990-11-14
EP0397474B1 (de) 1997-12-10
US5100768A (en) 1992-03-31
KR920003809B1 (ko) 1992-05-15
KR900018744A (ko) 1990-12-22

Similar Documents

Publication Publication Date Title
DE68926516D1 (de) Lichtempfindliche Zusammensetzung
DE69014913T2 (de) Lichtempfindliche Zusammensetzung.
BR9007196A (pt) Composicao
DE68921146T2 (de) Lichtempfindliche Zusammensetzung.
DE69129955T2 (de) Photolackzusammensetzung
SE9000221D0 (sv) Komposition
DE68927140T2 (de) Photolackzusammensetzung
DE69027263D1 (de) Tonerzusammensetzung
DE69031785D1 (de) Lichtempfindliche Zusammensetzung
DE59010008D1 (de) Photoempfindliches Gemisch
ID996B (id) Pirrolum tersubstitusi
DE69032715T2 (de) Lichtempfindliche Zusammensetzung
DE69012475D1 (de) Lichtempfindliche Zusammensetzungen.
DE69123873D1 (de) Photoresistzusammensetzung
DE69030484T2 (de) Fotoempfindliche Harzzusammensetzung
DE69029222D1 (de) Lichtempfindliche Zusammensetzung
KR910700486A (ko) 현상액
DE69027139D1 (de) Zusammensetzungen
DE69124865T2 (de) Photolackzusammensetzung
DE68911786T2 (de) Lichtempfindliche Zusammensetzung.
DE69033790D1 (de) Photolackzusammensetzung
DE69024513D1 (de) Lichtempfindliche Zusammensetzung
BR9005424A (pt) Composicao
DE69120858D1 (de) Photoresistzusammensetzung
DE68928903T2 (de) Lichtempfindliche Zusammensetzung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8339 Ceased/non-payment of the annual fee