DE68928903T2 - Lichtempfindliche Zusammensetzung - Google Patents

Lichtempfindliche Zusammensetzung

Info

Publication number
DE68928903T2
DE68928903T2 DE1989628903 DE68928903T DE68928903T2 DE 68928903 T2 DE68928903 T2 DE 68928903T2 DE 1989628903 DE1989628903 DE 1989628903 DE 68928903 T DE68928903 T DE 68928903T DE 68928903 T2 DE68928903 T2 DE 68928903T2
Authority
DE
Germany
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE1989628903
Other languages
English (en)
Other versions
DE68928903D1 (de
Inventor
Hideyuki Nakai
Kiyoshi Goto
Hiroshi Tomiyasu
Yoshiko Fujita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Konica Minolta Inc
Original Assignee
Mitsubishi Chemical Corp
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP24939888A external-priority patent/JPH0296755A/ja
Priority claimed from JP25024888A external-priority patent/JPH0296759A/ja
Application filed by Mitsubishi Chemical Corp, Konica Minolta Inc filed Critical Mitsubishi Chemical Corp
Application granted granted Critical
Publication of DE68928903D1 publication Critical patent/DE68928903D1/de
Publication of DE68928903T2 publication Critical patent/DE68928903T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28—Chemically modified polycondensates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
DE1989628903 1988-10-03 1989-10-02 Lichtempfindliche Zusammensetzung Expired - Fee Related DE68928903T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP24939888A JPH0296755A (ja) 1988-10-03 1988-10-03 感光性組成物
JP25024888A JPH0296759A (ja) 1988-10-04 1988-10-04 感光性平版印刷版

Publications (2)

Publication Number Publication Date
DE68928903D1 DE68928903D1 (de) 1999-02-25
DE68928903T2 true DE68928903T2 (de) 1999-08-12

Family

ID=26539265

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1989628903 Expired - Fee Related DE68928903T2 (de) 1988-10-03 1989-10-02 Lichtempfindliche Zusammensetzung

Country Status (3)

Country Link
EP (1) EP0362778B1 (de)
CA (1) CA2000111A1 (de)
DE (1) DE68928903T2 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2085868A1 (en) * 1991-12-25 1993-06-26 Mitsubishi Chemical Corporation Photosensitive composition

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE506677A (de) * 1950-10-31
JPS5474728A (en) * 1977-11-28 1979-06-15 Fuji Photo Film Co Ltd Photosensitive composition
JPS60177340A (ja) * 1984-02-24 1985-09-11 Fuji Photo Film Co Ltd 感光性組成物
JPS63183441A (ja) * 1987-01-26 1988-07-28 Konica Corp 耐薬品性およびインキ着肉性に優れた感光性組成物
JP2507395B2 (ja) * 1987-03-02 1996-06-12 東レ株式会社 水なし平版印刷用原版

Also Published As

Publication number Publication date
EP0362778B1 (de) 1999-01-13
DE68928903D1 (de) 1999-02-25
EP0362778A3 (de) 1991-06-12
CA2000111A1 (en) 1990-04-03
EP0362778A2 (de) 1990-04-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee