DE69121790D1 - Positivresistzusammensetzung - Google Patents

Positivresistzusammensetzung

Info

Publication number
DE69121790D1
DE69121790D1 DE69121790T DE69121790T DE69121790D1 DE 69121790 D1 DE69121790 D1 DE 69121790D1 DE 69121790 T DE69121790 T DE 69121790T DE 69121790 T DE69121790 T DE 69121790T DE 69121790 D1 DE69121790 D1 DE 69121790D1
Authority
DE
Germany
Prior art keywords
resist composition
positive resist
positive
composition
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69121790T
Other languages
English (en)
Other versions
DE69121790T2 (de
Inventor
Yasunori Uetani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Application granted granted Critical
Publication of DE69121790D1 publication Critical patent/DE69121790D1/de
Publication of DE69121790T2 publication Critical patent/DE69121790T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE69121790T 1990-05-24 1991-05-06 Positivresistzusammensetzung Expired - Fee Related DE69121790T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13650190 1990-05-24

Publications (2)

Publication Number Publication Date
DE69121790D1 true DE69121790D1 (de) 1996-10-10
DE69121790T2 DE69121790T2 (de) 1997-04-10

Family

ID=15176643

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69121790T Expired - Fee Related DE69121790T2 (de) 1990-05-24 1991-05-06 Positivresistzusammensetzung

Country Status (6)

Country Link
US (1) US5130225A (de)
EP (1) EP0461388B1 (de)
KR (1) KR910020496A (de)
CA (1) CA2042807A1 (de)
DE (1) DE69121790T2 (de)
MX (1) MX174089B (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2711590B2 (ja) † 1990-09-13 1998-02-10 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP3039048B2 (ja) * 1991-11-01 2000-05-08 住友化学工業株式会社 ポジ型感放射線性レジスト組成物
JPH0692909A (ja) * 1992-04-10 1994-04-05 Sumitomo Chem Co Ltd 炭酸エステル環状化合物、その製造方法及びそれを用いてなるポジ型フォトレジスト組成物
JP2935223B2 (ja) * 1992-04-14 1999-08-16 東京応化工業株式会社 レジストパターン形成用材料の製造方法及びタンタルのパターン形成方法
US5876895A (en) * 1992-12-24 1999-03-02 Sumitomo Chemical Company, Limited Photosensitive resin composition for color filter
US5275911A (en) * 1993-02-01 1994-01-04 Ocg Microelectronic Materials, Inc. Sesamol/aldehyde condensation products as sensitivity enhancers for radiation sensitive mixtures
JP3329026B2 (ja) * 1993-10-19 2002-09-30 住友化学工業株式会社 ポジ型フォトレジスト組成物
US5703197A (en) * 1997-02-13 1997-12-30 Molecular Optoelectronics Corporation Indane polycarbonates
EP1482494A3 (de) * 2003-05-28 2007-08-29 Matsushita Electric Industrial Co., Ltd. Verfahren zur Herstellung eines Masters für optische Informationsaufzeichnungsmedien
JP4647241B2 (ja) * 2003-08-04 2011-03-09 シャープ株式会社 光記録媒体原盤の製造方法、光記録媒体スタンパの製造方法、及び光記録媒体の製造方法
KR101737798B1 (ko) * 2010-03-24 2017-05-30 삼성디스플레이 주식회사 포토레지스트 조성물 및 이를 이용한 패턴의 형성 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3288864A (en) * 1962-05-11 1966-11-29 Union Carbide Corp Reaction products of isopropenyl phenols and of linear dimers thereof
JPS5814410B2 (ja) * 1978-08-14 1983-03-18 三井東圧化学株式会社 ジフエニロ−ルアルカンの開裂方法
US4366328A (en) * 1979-11-26 1982-12-28 Mitsui Toatsu Chemicals, Inc. Indene compound and novel process for producing indene compounds
JPS57143329A (en) * 1981-03-03 1982-09-04 Nippon Telegr & Teleph Corp <Ntt> Photosensitive resin and its production
JPS58205147A (ja) * 1982-05-25 1983-11-30 Sumitomo Chem Co Ltd ポジ型フオトレジスト組成物
US4626492A (en) * 1985-06-04 1986-12-02 Olin Hunt Specialty Products, Inc. Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound
JP2501850B2 (ja) * 1987-05-06 1996-05-29 富士電機株式会社 硬貨選別装置

Also Published As

Publication number Publication date
DE69121790T2 (de) 1997-04-10
KR910020496A (ko) 1991-12-20
EP0461388A1 (de) 1991-12-18
CA2042807A1 (en) 1991-11-25
EP0461388B1 (de) 1996-09-04
US5130225A (en) 1992-07-14
MX174089B (es) 1994-04-20

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee