DE69222987D1 - Photopolymerisierbare zusammensetzung - Google Patents

Photopolymerisierbare zusammensetzung

Info

Publication number
DE69222987D1
DE69222987D1 DE69222987T DE69222987T DE69222987D1 DE 69222987 D1 DE69222987 D1 DE 69222987D1 DE 69222987 T DE69222987 T DE 69222987T DE 69222987 T DE69222987 T DE 69222987T DE 69222987 D1 DE69222987 D1 DE 69222987D1
Authority
DE
Germany
Prior art keywords
photopolymerizable composition
photopolymerizable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69222987T
Other languages
English (en)
Other versions
DE69222987T2 (de
Inventor
Masami Kawabata
Akihiko Sato
Iwao Sumiyoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Application granted granted Critical
Publication of DE69222987D1 publication Critical patent/DE69222987D1/de
Publication of DE69222987T2 publication Critical patent/DE69222987T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Holo Graphy (AREA)
DE69222987T 1991-01-22 1992-01-22 Photopolymerisierbare zusammensetzung Expired - Fee Related DE69222987T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP3005569A JP2677457B2 (ja) 1991-01-22 1991-01-22 光重合性組成物
PCT/JP1992/000044 WO1992013008A1 (en) 1991-01-22 1992-01-22 Photopolymerizable composition

Publications (2)

Publication Number Publication Date
DE69222987D1 true DE69222987D1 (de) 1997-12-11
DE69222987T2 DE69222987T2 (de) 1998-03-26

Family

ID=11614848

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69222987T Expired - Fee Related DE69222987T2 (de) 1991-01-22 1992-01-22 Photopolymerisierbare zusammensetzung

Country Status (5)

Country Link
US (1) US5368990A (de)
EP (1) EP0522175B1 (de)
JP (1) JP2677457B2 (de)
DE (1) DE69222987T2 (de)
WO (1) WO1992013008A1 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2758737B2 (ja) * 1991-07-11 1998-05-28 日本ペイント株式会社 光重合性組成物及び感光性平版印刷版
JPH0572732A (ja) * 1991-09-11 1993-03-26 Fuji Photo Film Co Ltd 光重合性組成物
DE19906823C2 (de) * 1999-02-18 2002-03-14 Kodak Polychrome Graphics Gmbh IR-Empfindliche Zusammensetzung und deren Verwendung zur Herstellung von Druckplatten
US6309792B1 (en) 2000-02-18 2001-10-30 Kodak Polychrome Graphics Llc IR-sensitive composition and use thereof for the preparation of printing plate precursors
US6864040B2 (en) 2001-04-11 2005-03-08 Kodak Polychrome Graphics Llc Thermal initiator system using leuco dyes and polyhalogene compounds
US6899994B2 (en) 2001-04-04 2005-05-31 Kodak Polychrome Graphics Llc On-press developable IR sensitive printing plates using binder resins having polyethylene oxide segments
US7592128B2 (en) 2001-04-04 2009-09-22 Eastman Kodak Company On-press developable negative-working imageable elements
US7261998B2 (en) * 2001-04-04 2007-08-28 Eastman Kodak Company Imageable element with solvent-resistant polymeric binder
US20040091811A1 (en) * 2002-10-30 2004-05-13 Munnelly Heidi M. Hetero-substituted aryl acetic acid co-initiators for IR-sensitive compositions
US6846614B2 (en) 2002-02-04 2005-01-25 Kodak Polychrome Graphics Llc On-press developable IR sensitive printing plates
US6893797B2 (en) * 2001-11-09 2005-05-17 Kodak Polychrome Graphics Llc High speed negative-working thermal printing plates
US7056639B2 (en) * 2001-08-21 2006-06-06 Eastman Kodak Company Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid
US7172850B2 (en) * 2002-04-10 2007-02-06 Eastman Kodak Company Preparation of solvent-resistant binder for an imageable element
US7659046B2 (en) * 2002-04-10 2010-02-09 Eastman Kodak Company Water-developable infrared-sensitive printing plate
US7368215B2 (en) 2003-05-12 2008-05-06 Eastman Kodak Company On-press developable IR sensitive printing plates containing an onium salt initiator system
JP4649158B2 (ja) * 2004-09-30 2011-03-09 富士フイルム株式会社 ホログラム記録方法
WO2006085741A1 (en) * 2005-02-09 2006-08-17 Stichting Dutch Polymer Institute Process for preparing a polymeric relief structure
JP2006235386A (ja) * 2005-02-25 2006-09-07 Fuji Photo Film Co Ltd ホログラム記録材料およびこれを用いた光記録媒体
US20100227269A1 (en) 2009-03-04 2010-09-09 Simpson Christopher D Imageable elements with colorants
JP2012068357A (ja) 2010-09-22 2012-04-05 Eastman Kodak Co 平版印刷版原版
US20170021656A1 (en) 2015-07-24 2017-01-26 Kevin Ray Lithographic imaging and printing with negative-working photoresponsive printing members
CN113942289B (zh) 2021-10-26 2023-02-28 浙江康尔达新材料股份有限公司 一种用于光敏阴图型平版印刷版的可成像组合物及其制版方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5829803A (ja) * 1981-08-17 1983-02-22 Mitsubishi Chem Ind Ltd 光重合性組成物
JPS6076735A (ja) * 1983-10-04 1985-05-01 Agency Of Ind Science & Technol 光硬化樹脂組成物
JPS6076740A (ja) * 1983-10-04 1985-05-01 Agency Of Ind Science & Technol 可視光感光性樹脂組成物
JPS6078443A (ja) * 1983-10-05 1985-05-04 Agency Of Ind Science & Technol 光不溶性樹脂組成物
JPS6092302A (ja) * 1983-10-27 1985-05-23 Agency Of Ind Science & Technol 光不溶性樹脂組成物
JPS6096604A (ja) * 1983-11-01 1985-05-30 Agency Of Ind Science & Technol 光不溶性樹脂組成物
JPS61213838A (ja) * 1985-03-20 1986-09-22 Nippon Oil & Fats Co Ltd 感光性平版印刷版
US4977511A (en) * 1985-11-20 1990-12-11 The Mead Corporation Photosensitive materials containing ionic dye compound as initiators
CA1308852C (en) * 1987-01-22 1992-10-13 Masami Kawabata Photopolymerizable composition
US4735632A (en) * 1987-04-02 1988-04-05 Minnesota Mining And Manufacturing Company Coated abrasive binder containing ternary photoinitiator system
US5102775A (en) * 1988-09-30 1992-04-07 Kansai Paint Co., Ltd. Visible light sensitive electrodeposition coating composition and image-forming method using the same
KR910001448A (ko) * 1989-06-30 1991-01-30 로레인 제이. 프란시스 광개시제로서 이온성 염료 반응성 반대이온 복합체 및 오늄염을 함유하는 양이온적으로 개시되는 조성물 및 이를 사용하는 감광성 물질

Also Published As

Publication number Publication date
DE69222987T2 (de) 1998-03-26
WO1992013008A1 (en) 1992-08-06
EP0522175B1 (de) 1997-11-05
EP0522175A4 (en) 1993-02-24
JP2677457B2 (ja) 1997-11-17
US5368990A (en) 1994-11-29
JPH04239505A (ja) 1992-08-27
EP0522175A1 (de) 1993-01-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee