DE69320397T2 - Photopolymerisierbare Zusammensetzung - Google Patents

Photopolymerisierbare Zusammensetzung

Info

Publication number
DE69320397T2
DE69320397T2 DE69320397T DE69320397T DE69320397T2 DE 69320397 T2 DE69320397 T2 DE 69320397T2 DE 69320397 T DE69320397 T DE 69320397T DE 69320397 T DE69320397 T DE 69320397T DE 69320397 T2 DE69320397 T2 DE 69320397T2
Authority
DE
Germany
Prior art keywords
photopolymerizable composition
photopolymerizable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69320397T
Other languages
English (en)
Other versions
DE69320397D1 (de
Inventor
Kenji Kushi
Chiho Tokuhara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Rayon Co Ltd
Original Assignee
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP9317992A external-priority patent/JPH05289335A/ja
Priority claimed from JP22306192A external-priority patent/JPH0667425A/ja
Priority claimed from JP5027022A external-priority patent/JPH0643642A/ja
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Publication of DE69320397D1 publication Critical patent/DE69320397D1/de
Application granted granted Critical
Publication of DE69320397T2 publication Critical patent/DE69320397T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148—Light sensitive titanium compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
DE69320397T 1992-04-13 1993-04-13 Photopolymerisierbare Zusammensetzung Expired - Fee Related DE69320397T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP9318092 1992-04-13
JP9317992A JPH05289335A (ja) 1992-04-13 1992-04-13 光重合性組成物
JP22306192A JPH0667425A (ja) 1992-08-21 1992-08-21 可視光線硬化型光重合性組成物
JP5027022A JPH0643642A (ja) 1992-04-13 1993-02-16 光重合性組成物

Publications (2)

Publication Number Publication Date
DE69320397D1 DE69320397D1 (de) 1998-09-24
DE69320397T2 true DE69320397T2 (de) 1999-03-11

Family

ID=27458607

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69320397T Expired - Fee Related DE69320397T2 (de) 1992-04-13 1993-04-13 Photopolymerisierbare Zusammensetzung

Country Status (3)

Country Link
US (1) US5322762A (de)
EP (1) EP0566353B1 (de)
DE (1) DE69320397T2 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5811218A (en) * 1993-07-28 1998-09-22 Hitachi Chemical Company, Ltd. Photoinitiator compositions including amino acids, coumarin and titanocene and photosensitive materials using the same
KR0147207B1 (ko) * 1993-07-28 1998-08-17 단노 다께시 광개시제 조성물 및 그를 사용한 감광성 물질
US5738974A (en) * 1994-09-05 1998-04-14 Mitsubishi Chemical Corporation Photopolymerizable composition and photosensitive lithographic printing plate
JP3290316B2 (ja) * 1994-11-18 2002-06-10 富士写真フイルム株式会社 感光性平版印刷版
US5885746A (en) * 1994-12-29 1999-03-23 Tokyo Ohka Kogyo Co., Ltd. Photosensitive resin composition, photosensitive printing plate using the same and method of manufacturing printing master plate
JP3441246B2 (ja) * 1995-06-07 2003-08-25 富士写真フイルム株式会社 光重合性組成物
US5821030A (en) * 1995-07-20 1998-10-13 Kodak Polychrome Graphics Lithographic printing plates having a photopolymerizable imaging layer overcoated with an oxygen barrier layer
JP3651713B2 (ja) * 1996-02-29 2005-05-25 富士写真フイルム株式会社 光重合性組成物
US5939148A (en) * 1996-09-13 1999-08-17 Kansai Paint Co., Ltd. Visible laser-curable composition
JP3843154B2 (ja) * 1996-09-25 2006-11-08 関西ペイント株式会社 光重合性組成物
JP3946309B2 (ja) * 1997-04-10 2007-07-18 富士フイルム株式会社 着色感光性組成物
US6078713A (en) * 1998-06-08 2000-06-20 Uv Technology, Inc. Beam delivery system for curing of photo initiated inks
US6864040B2 (en) 2001-04-11 2005-03-08 Kodak Polychrome Graphics Llc Thermal initiator system using leuco dyes and polyhalogene compounds
US20040259027A1 (en) * 2001-04-11 2004-12-23 Munnelly Heidi M. Infrared-sensitive composition for printing plate precursors
US7056639B2 (en) * 2001-08-21 2006-06-06 Eastman Kodak Company Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid
US7083904B2 (en) * 2003-09-05 2006-08-01 Hewlett-Packard Development Company, L.P. Compositions, systems, and methods for imaging
KR101345930B1 (ko) * 2009-03-13 2013-12-27 히타치가세이가부시끼가이샤 감광성 수지 조성물, 및 이를 이용한 감광성 엘리먼트, 레지스트 패턴의 형성 방법 및 프린트 배선판의 제조 방법
JP6719911B2 (ja) * 2016-01-19 2020-07-08 キヤノン株式会社 液体吐出ヘッドの製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3109736A (en) * 1962-04-06 1963-11-05 Horizons Inc Light-sensitive merocyanine dye base compositions
FR1377288A (fr) * 1962-04-06 1964-11-06 Horizons Inc Couleurs à base de mérocyanine
US4985343A (en) * 1989-02-09 1991-01-15 Mitsubishi Rayon Co., Ltd. Crosslinking-curable resin composition

Also Published As

Publication number Publication date
EP0566353B1 (de) 1998-08-19
DE69320397D1 (de) 1998-09-24
US5322762A (en) 1994-06-21
EP0566353A1 (de) 1993-10-20

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee