JP6719911B2 - 液体吐出ヘッドの製造方法 - Google Patents
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Classifications
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- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
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- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
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- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
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- B41J2/161—Production of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
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- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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- Y10T29/49401—Fluid pattern dispersing device making, e.g., ink jet
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
Description
本実施例は、基板1を貫通する開口部12を設けた後、前記基板上に流路形成部材21をドライフィルムレジスト転写することにより、流路高さが制御しやすくなるという利点がある。また、開口部内部に一部充填した流路形成部材を硬化させることにより、ノズル密着性が向上するという利点がある。以下、図3を用いて、本実施例に係る液体吐出ヘッドの製造方法を説明する。
図5を用いて、比較例の液体吐出ヘッドの製造方法を説明する。本比較例では、実施例1とは異なり、図5(A)に示すように、吐出口形成領域6外部に開口部を形成せずに流路形成部材21を形成した以外は、実施例1に準じて液体吐出ヘッドを製造した。
1a:第1の面
1b:第2の面
4:密着層
6:吐出口形成領域(ノズル領域)
11:液体供給口
11a:液体供給口中央部
11b:液体供給口端部
12:開口部
20:流路
21:流路形成部材
30:吐出口(ノズル)
31:吐出口形成部材
Claims (11)
- 基板の第1の面上に配置された液体吐出エネルギー発生素子及び電気配線と、基板の前記第1の面から該第1の面と対向する第2の面を貫通する、隣接配置された複数の液体供給口と、液体を吐出するための吐出口と、前記液体供給口から前記吐出口へと前記液体を供給するための流路と、を有する吐出口形成領域を備えた液体吐出ヘッドの製造方法であって、
前記基板は、前記吐出口形成領域の外部に、前記液体供給口とは異なる、少なくとも前記基板の第1の面に開口する開口部を有し、
前記基板の第1の面上に、第一のドライフィルムレジストを用いて流路形成部材を形成する工程と、
前記流路形成部材上に吐出口形成部材を形成する工程と、
前記流路形成部材のうち、前記開口部の上部に位置する流路形成部材の少なくとも一部を硬化させ、前記流路形成部材に前記流路を形成する工程と、
前記吐出口形成部材のうち、前記開口部の直上に位置する吐出口形成部材の全部をパターンなしで露光して硬化させ、前記吐出口形成部材に前記吐出口を形成する工程と、
を有することを特徴とする液体吐出ヘッドの製造方法。 - 前記開口部の開口端部と、液体供給口端部に位置する前記液体供給口の開口端部との距離が0.2mm以上1.0mm未満である、請求項1に記載の液体吐出ヘッドの製造方法。
- 前記流路を形成する工程が、前記流路形成部材のうち、前記開口部の上部に位置する流路形成部材の全部をパターンなしで露光して硬化させる工程を含む、請求項1または2に記載の液体吐出ヘッドの製造方法。
- 基板の第1の面上に配置された液体吐出エネルギー発生素子及び電気配線と、基板の前記第1の面から該第1の面と対向する第2の面を貫通する、隣接配置された複数の液体供給口と、液体を吐出するための吐出口と、前記液体供給口から前記吐出口へと前記液体を供給するための流路と、を有する吐出口形成領域を備えた液体吐出ヘッドの製造方法であって、
前記基板は、前記吐出口形成領域の外部に、前記液体供給口とは異なる、少なくとも前記基板の第1の面に開口する開口部を有し、
前記基板の第1の面上に、第一のドライフィルムレジストを用いて流路形成部材を形成する工程と、
前記流路形成部材上に吐出口形成部材を形成する工程と、
前記流路形成部材のうち、前記開口部の上部に位置する流路形成部材の少なくとも一部を硬化させ、前記流路形成部材に前記流路を形成する工程と、
前記吐出口形成部材に前記吐出口を形成する工程と、
を有し、
前記流路を形成する工程が、前記流路形成部材のうち、前記開口部の上部に位置する流路形成部材の全部をパターンなしで露光して硬化させる工程を含むことを特徴とする液体吐出ヘッドの製造方法。 - 前記開口部の開口端部と、液体供給口端部に位置する前記液体供給口の開口端部との距離が0.2mm以上1.0mm未満である、請求項4に記載の液体吐出ヘッドの製造方法。
- 前記吐出口を形成する工程が、前記吐出口形成部材のうち、前記開口部の前記直上以外の上部に位置する吐出口形成部材の少なくとも一部を硬化させる工程を含む、請求項1〜5のいずれか一項に記載の液体吐出ヘッドの製造方法。
- 前記開口部は前記基板を前記第1の面から前記第2の面まで貫通している請求項1〜6のいずれか一項に記載の液体吐出ヘッドの製造方法。
- 前記開口部は、前記基板の前記第1の面から前記第2の面を貫通しておらず、前記第1の面からの深さが100μm以上である請求項1〜6のいずれか一項に記載の液体吐出ヘッドの製造方法。
- 前記基板の前記吐出口形成領域では、前記複数の液体供給口が配列して開口しており、前記配列して開口する複数の液体供給口のうち端部の液体供給口の開口の外側に隣接する位置に、前記開口部が開口している請求項1〜8のいずれか一項に記載の液体吐出ヘッドの製造方法。
- 前記配列して開口する複数の液体供給口のうち、両端の液体供給口の開口のそれぞれの外側に隣接する位置に、前記開口部が開口している請求項9に記載の液体吐出ヘッドの製造方法。
- 前記基板上には段差を有する密着層が形成されており、
前記流路形成部材を形成する工程において、前記第一のドライフィルムレジストは、前記密着層の前記段差を被覆している請求項1〜10のいずれか一項に記載の液体吐出ヘッドの製造方法。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
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JP2016007739A JP6719911B2 (ja) | 2016-01-19 | 2016-01-19 | 液体吐出ヘッドの製造方法 |
US15/391,417 US10343406B2 (en) | 2016-01-19 | 2016-12-27 | Liquid ejection head manufacturing method |
CN201710027199.0A CN106976316B (zh) | 2016-01-19 | 2017-01-16 | 液体喷射头制造方法 |
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JP2016007739A JP6719911B2 (ja) | 2016-01-19 | 2016-01-19 | 液体吐出ヘッドの製造方法 |
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JP2017128006A JP2017128006A (ja) | 2017-07-27 |
JP2017128006A5 JP2017128006A5 (ja) | 2019-02-28 |
JP6719911B2 true JP6719911B2 (ja) | 2020-07-08 |
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JP7076966B2 (ja) | 2017-08-09 | 2022-05-30 | キヤノン株式会社 | 基板および半導体デバイスの製造方法 |
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