MX9201930A - Composicion de capa protectora positiva (caso 516303). - Google Patents

Composicion de capa protectora positiva (caso 516303).

Info

Publication number
MX9201930A
MX9201930A MX9201930A MX9201930A MX9201930A MX 9201930 A MX9201930 A MX 9201930A MX 9201930 A MX9201930 A MX 9201930A MX 9201930 A MX9201930 A MX 9201930A MX 9201930 A MX9201930 A MX 9201930A
Authority
MX
Mexico
Prior art keywords
case
protective layer
layer composition
positive protective
positive
Prior art date
Application number
MX9201930A
Other languages
English (en)
Inventor
Yasunori Uetani
Yasunori Doi
Kazuhiko Hashimoto
Haruyoshi Osaki
Ryotaro Hanawa
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP03316500A external-priority patent/JP3064595B2/ja
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of MX9201930A publication Critical patent/MX9201930A/es

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
MX9201930A 1991-04-26 1992-04-24 Composicion de capa protectora positiva (caso 516303). MX9201930A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP9726391 1991-04-26
JP03316500A JP3064595B2 (ja) 1991-04-26 1991-11-29 ポジ型レジスト組成物

Publications (1)

Publication Number Publication Date
MX9201930A true MX9201930A (es) 1992-11-01

Family

ID=26438446

Family Applications (1)

Application Number Title Priority Date Filing Date
MX9201930A MX9201930A (es) 1991-04-26 1992-04-24 Composicion de capa protectora positiva (caso 516303).

Country Status (4)

Country Link
EP (1) EP0510671B1 (es)
CA (1) CA2067042A1 (es)
DE (1) DE69223083T2 (es)
MX (1) MX9201930A (es)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3427562B2 (ja) * 1995-05-09 2003-07-22 住友化学工業株式会社 ポジ型レジスト組成物
JP3488332B2 (ja) * 1996-02-02 2004-01-19 東京応化工業株式会社 ポジ型ホトレジスト塗布液
TWI234051B (en) 1998-10-14 2005-06-11 Clariant Int Ltd A mixed solvent system for positive photoresists
JP2002148784A (ja) 2000-11-07 2002-05-22 Tokyo Ohka Kogyo Co Ltd 化学増幅型ポジ型レジスト塗布液及びそれを用いたレジストパターン形成方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4845008A (en) * 1986-02-20 1989-07-04 Fuji Photo Film Co., Ltd. Light-sensitive positive working, o-guinone diazide presensitized plate with mixed solvent
KR920001450B1 (ko) * 1986-12-23 1992-02-14 쉬플리 캄파니 인코포레이티드 감광성 내식막의 제조방법, 감광성 내식막 조성물 및 이의 제조방법
DE68927140T2 (de) * 1988-06-13 1997-04-30 Sumitomo Chemical Co Photolackzusammensetzung
DE69028834T2 (de) * 1989-12-01 1997-02-13 Tosoh Corp Positiv arbeitende lichtempfindliche Zusammensetzungen zur Herstellung von Linsen
IL96551A0 (en) * 1989-12-18 1991-09-16 Rohm & Haas Preparation of high glass transition temperature novolak resins useful in high resolution photoresist compositions

Also Published As

Publication number Publication date
CA2067042A1 (en) 1992-10-27
EP0510671B1 (en) 1997-11-12
DE69223083D1 (de) 1997-12-18
EP0510671A1 (en) 1992-10-28
DE69223083T2 (de) 1998-07-02

Similar Documents

Publication Publication Date Title
DE69205133D1 (de) Klebstoffzusammensetzung.
BR9205313A (pt) Composiçáo bioativa
DE29613736U1 (de) Oberflächenauftragszusammensetzung
FI941663A (fi) Trikriittisen pisteen omaava koostumus
DE68924575D1 (de) Schutzüberzugsfilm.
DE69206431T2 (de) Härtbare Zusammensetzung.
DE69214198D1 (de) Polyisocyanatzusammensetzung
DE69203574D1 (de) Beschichtungszusammensetzung.
FI932881A0 (fi) Anordning foer registrering av storheter i anslutning till blodcirkulationssystemet
DE69204411D1 (de) Überzugszusammensetzung.
MX9204787A (es) Composicion de capa protectora positiva.
MX9201930A (es) Composicion de capa protectora positiva (caso 516303).
FI920758A0 (fi) Komposition och dess anvaendning saosom biocid.
DE69406904T2 (de) Einkomponentpolyurethandeckschichtzusammensetzung
ITMI921618A1 (it) Bersaglio apparente multispettrale
DE69225266T2 (de) Bis-bibenzimidazol Zusammensetzung
BR9202742A (pt) Composicao delimpeza
MX9201928A (es) Composicion de capa protectora positiva (caso 516298).
DE68914386D1 (de) Zahnpastaähnliche Zusammensetzung.
KR950703340A (ko) 항엠알에스에이 조성물
MX9201104A (es) Composicion de capa protectora positiva
NO924484D0 (no) Pesticid sammensetning
FI925175A0 (fi) Kompositioner haerdbara medelst straolning
DE69206398T2 (de) Reichstoffzusammensetzungen.
FI922185A0 (fi) Faergframkallande komposition.

Legal Events

Date Code Title Description
FG Grant or registration
MM Annulment or lapse due to non-payment of fees