MX9204787A - Composicion de capa protectora positiva. - Google Patents

Composicion de capa protectora positiva.

Info

Publication number
MX9204787A
MX9204787A MX9204787A MX9204787A MX9204787A MX 9204787 A MX9204787 A MX 9204787A MX 9204787 A MX9204787 A MX 9204787A MX 9204787 A MX9204787 A MX 9204787A MX 9204787 A MX9204787 A MX 9204787A
Authority
MX
Mexico
Prior art keywords
composition
protective layer
positive protective
positive
layer
Prior art date
Application number
MX9204787A
Other languages
English (en)
Inventor
Jun Tomioka
Koji Kuwana
Hirotoshi Nakanishi
Yasunori Uetani
Ayako Ida
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of MX9204787A publication Critical patent/MX9204787A/es

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
MX9204787A 1991-08-21 1992-08-19 Composicion de capa protectora positiva. MX9204787A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP20935791 1991-08-21
JP4178137A JPH05204144A (ja) 1991-08-21 1992-07-06 ポジ型レジスト組成物

Publications (1)

Publication Number Publication Date
MX9204787A true MX9204787A (es) 1993-04-01

Family

ID=26498419

Family Applications (1)

Application Number Title Priority Date Filing Date
MX9204787A MX9204787A (es) 1991-08-21 1992-08-19 Composicion de capa protectora positiva.

Country Status (6)

Country Link
US (1) US5413895A (es)
EP (1) EP0528401A1 (es)
JP (1) JPH05204144A (es)
KR (1) KR100217959B1 (es)
CA (1) CA2076357A1 (es)
MX (1) MX9204787A (es)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3329026B2 (ja) * 1993-10-19 2002-09-30 住友化学工業株式会社 ポジ型フォトレジスト組成物
JPH0859530A (ja) * 1994-06-15 1996-03-05 Sumitomo Chem Co Ltd ポリヒドロキシ化合物及びそれを含有するポジ型レジスト組成物
US5750310A (en) * 1995-04-27 1998-05-12 Fuji Photo Film Co., Ltd. Positive photoresist composition
JP3427562B2 (ja) * 1995-05-09 2003-07-22 住友化学工業株式会社 ポジ型レジスト組成物
JP3562673B2 (ja) 1996-01-22 2004-09-08 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
KR20020092726A (ko) * 2001-06-05 2002-12-12 주식회사 동진쎄미켐 포지티브 포토레지스트 조성물
KR100783603B1 (ko) * 2002-01-05 2007-12-07 삼성전자주식회사 포토레지스트 조성물 및 이를 사용한 패턴의 형성방법

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6210646A (ja) * 1985-07-09 1987-01-19 Kanto Kagaku Kk ポジ型フオトレジスト組成物
JPH0654384B2 (ja) * 1985-08-09 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
EP0239423B1 (en) * 1986-03-28 1996-03-20 Japan Synthetic Rubber Co., Ltd. Positive type radiation-sensitive resin composition
JP2590342B2 (ja) * 1986-11-08 1997-03-12 住友化学工業株式会社 ポジ型フォトレジスト用ノボラック樹脂及びそれを含有するポジ型フォトレジスト組成物
US5128230A (en) * 1986-12-23 1992-07-07 Shipley Company Inc. Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate
US5178986A (en) * 1988-10-17 1993-01-12 Shipley Company Inc. Positive photoresist composition with naphthoquinonediazidesulfonate of oligomeric phenol
US4957846A (en) * 1988-12-27 1990-09-18 Olin Hunt Specialty Products Inc. Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group
JP2566169B2 (ja) * 1989-12-28 1996-12-25 日本ゼオン株式会社 ポジ型レジスト組成物
JP2566172B2 (ja) * 1989-12-28 1996-12-25 日本ゼオン株式会社 ポジ型レジスト組成物
DE69132694T2 (de) * 1990-03-08 2002-06-20 Fuji Photo Film Co Ltd Positiv arbeitende Photolackzusammensetzung
JPH03259149A (ja) * 1990-03-08 1991-11-19 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JP2711590B2 (ja) * 1990-09-13 1998-02-10 富士写真フイルム株式会社 ポジ型フオトレジスト組成物

Also Published As

Publication number Publication date
US5413895A (en) 1995-05-09
JPH05204144A (ja) 1993-08-13
KR100217959B1 (ko) 1999-09-01
CA2076357A1 (en) 1993-02-22
KR930004806A (ko) 1993-03-23
EP0528401A1 (en) 1993-02-24

Similar Documents

Publication Publication Date Title
FI921598A (fi) Transdermal komposition
DE69205133T2 (de) Klebstoffzusammensetzung.
BR9205313A (pt) Composiçáo bioativa
DE69224772T2 (de) Abbaubare Schichtstoffzusammensetzung
DE68924958D1 (de) Zeitweilige Schutzüberzugsmassen.
FI941663A (fi) Trikriittisen pisteen omaava koostumus
DE69014182D1 (de) Schutzlack-Zusammensetzung.
FI903558A0 (fi) Avskiljningsanordning foer avskiljning av antigener.
TR23171A (tr) Koruyucu planset duezeni
DE69203574D1 (de) Beschichtungszusammensetzung.
MX9206155A (es) Composicion de capa protectora sensible a la radiacion, tipo positiva.
DE69204411D1 (de) Überzugszusammensetzung.
MX9201327A (es) Compuesto de fenol polihidrico y composicion de capa protectora positiva que comprende tal compuesto.
MX9204787A (es) Composicion de capa protectora positiva.
DE69225104D1 (de) PCT-Zusammensetzung
MX22224A (es) Composicion de capa protectora, positiva, sensible a la radiacion.
MX9201104A (es) Composicion de capa protectora positiva
DE69406904D1 (de) Einkomponentpolyurethandeckschichtzusammensetzung
MX9201930A (es) Composicion de capa protectora positiva (caso 516303).
MX9200872A (es) Composicion de bis-bibenzimidazol.
BR9202742A (pt) Composicao delimpeza
MX9201928A (es) Composicion de capa protectora positiva (caso 516298).
NO924484D0 (no) Pesticid sammensetning
FI925175A0 (fi) Kompositioner haerdbara medelst straolning
DE69206398T2 (de) Reichstoffzusammensetzungen.

Legal Events

Date Code Title Description
FG Grant or registration
MM Annulment or lapse due to non-payment of fees