DE69501429D1 - Positiv arbeitende, fotoempfindliche Zusammensetzungen - Google Patents

Positiv arbeitende, fotoempfindliche Zusammensetzungen

Info

Publication number
DE69501429D1
DE69501429D1 DE69501429T DE69501429T DE69501429D1 DE 69501429 D1 DE69501429 D1 DE 69501429D1 DE 69501429 T DE69501429 T DE 69501429T DE 69501429 T DE69501429 T DE 69501429T DE 69501429 D1 DE69501429 D1 DE 69501429D1
Authority
DE
Germany
Prior art keywords
photosensitive compositions
positive working
positive
working
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69501429T
Other languages
English (en)
Other versions
DE69501429T2 (de
Inventor
Koichi Kawamura
Kenichiro Sato
Shinji Sakaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE69501429D1 publication Critical patent/DE69501429D1/de
Publication of DE69501429T2 publication Critical patent/DE69501429T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69501429T 1994-05-25 1995-05-24 Positiv arbeitende, fotoempfindliche Zusammensetzungen Expired - Fee Related DE69501429T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP11144194 1994-05-25
JP06958695A JP3503839B2 (ja) 1994-05-25 1995-03-28 ポジ型感光性組成物

Publications (2)

Publication Number Publication Date
DE69501429D1 true DE69501429D1 (de) 1998-02-19
DE69501429T2 DE69501429T2 (de) 1998-04-23

Family

ID=26410761

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69501429T Expired - Fee Related DE69501429T2 (de) 1994-05-25 1995-05-24 Positiv arbeitende, fotoempfindliche Zusammensetzungen

Country Status (4)

Country Link
US (1) US5609983A (de)
EP (1) EP0684521B1 (de)
JP (1) JP3503839B2 (de)
DE (1) DE69501429T2 (de)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3290316B2 (ja) * 1994-11-18 2002-06-10 富士写真フイルム株式会社 感光性平版印刷版
US6063175A (en) * 1998-02-17 2000-05-16 Milliken & Company Triphenylmethane polymeric colorant having sterically hindered amine counter ion
US6660445B2 (en) 2000-10-13 2003-12-09 Fuji Photo Film Co., Ltd. Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compound
US6451510B1 (en) 2001-02-21 2002-09-17 International Business Machines Corporation Developer/rinse formulation to prevent image collapse in resist
US6592364B2 (en) 2001-11-30 2003-07-15 David Zapata Apparatus, method and system for independently controlling airflow in a conveyor oven
US6645689B2 (en) 2002-03-13 2003-11-11 Kodak Polychrome Graphics Llc Solvent resistant polymers with improved bakeability features
US7766899B2 (en) * 2003-09-17 2010-08-03 Prostalund Operations Ab Partial-length, indwelling prostatic catheter using coiled inflation tube as an anchor and methods of draining urine and flushing clots
WO2006084170A2 (en) 2005-02-04 2006-08-10 Mineral And Coal Technologies, Inc. Improving the separation of diamond from gangue minerals
KR101232179B1 (ko) * 2006-12-04 2013-02-12 엘지디스플레이 주식회사 박막 패턴의 제조장치 및 방법
US20090311494A1 (en) * 2008-06-17 2009-12-17 Fujifilm Corporation Relief printing plate precursor for laser engraving, relief printing plate, and process for producing relief printing plate
JP5830534B2 (ja) 2010-07-09 2015-12-09 ファイザー・リミテッドＰｆｉｚｅｒ Ｌｉｍｉｔｅｄ 化合物
JP2013532186A (ja) 2010-07-12 2013-08-15 ファイザー・リミテッド 化合物
CA2801032A1 (en) 2010-07-12 2012-01-19 Pfizer Limited N-sulfonylbenzamide derivatives useful as voltage gated sodium channel inhibitors
JP2013536165A (ja) 2010-07-12 2013-09-19 ファイザー・リミテッド 痛みの処置のためのｎａｖ１．７阻害薬としてのスルホンアミド誘導体
CA2804716A1 (en) 2010-07-12 2012-01-19 Pfizer Limited Chemical compounds
US9102621B2 (en) 2010-07-12 2015-08-11 Pfizer Limited Acyl sulfonamide compounds
JP6661212B2 (ja) * 2017-02-22 2020-03-11 信越化学工業株式会社 導電性ポリマー複合体及び基板
JP6765988B2 (ja) * 2017-02-22 2020-10-07 信越化学工業株式会社 導電性ポリマー用高分子化合物及びその製造方法

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BE506677A (de) 1950-10-31
GB742557A (en) * 1952-10-01 1955-12-30 Kalle & Co Ag Light-sensitive material for photomechanical reproduction and process for the production of images
NL199484A (de) 1954-08-20
US2975053A (en) * 1958-10-06 1961-03-14 Azoplate Corp Reproduction material
NL247588A (de) 1959-01-21
GB1053866A (de) 1964-08-05
JPS459610B1 (de) 1965-07-19 1970-04-07
JPS4917481B1 (de) 1970-02-17 1974-05-01
JPS5429922B2 (de) 1971-12-13 1979-09-27
JPS5423571B2 (de) 1971-12-13 1979-08-15
BE795809A (fr) 1972-02-22 1973-08-22 Eastman Kodak Co Nouveaux polymeres photosensibles a groupes o-quinone diazide
JPS51483B2 (de) 1972-08-18 1976-01-08
JPS5024641B2 (de) * 1972-10-17 1975-08-18
JPS5763526A (en) 1980-10-04 1982-04-17 Ricoh Co Ltd Photosensitive material
JPS60163043A (ja) 1984-02-06 1985-08-24 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS6210646A (ja) 1985-07-09 1987-01-19 Kanto Kagaku Kk ポジ型フオトレジスト組成物
JPS6210645A (ja) 1985-07-09 1987-01-19 Kanto Kagaku Kk ポジ型フオトレジスト組成物
JPH0654381B2 (ja) 1985-12-24 1994-07-20 日本合成ゴム株式会社 集積回路作製用ポジ型レジスト
ES2202389T3 (es) 1986-12-23 2004-04-01 Shipley Company Inc. Composicnes fotorresistentes de alta resolucion.
JPH0814696B2 (ja) 1987-09-17 1996-02-14 富士写真フイルム株式会社 感光性樹脂組成物
JP2552891B2 (ja) 1988-01-26 1996-11-13 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JPH0296163A (ja) 1988-10-03 1990-04-06 Konica Corp 感光性組成物
JP2947518B2 (ja) 1988-10-03 1999-09-13 コニカ株式会社 感光性平版印刷版
JPH0296761A (ja) 1988-10-04 1990-04-09 Mitsubishi Kasei Corp 感光性組成物
US5178986A (en) 1988-10-17 1993-01-12 Shipley Company Inc. Positive photoresist composition with naphthoquinonediazidesulfonate of oligomeric phenol
US4957846A (en) 1988-12-27 1990-09-18 Olin Hunt Specialty Products Inc. Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group
US4992356A (en) 1988-12-27 1991-02-12 Olin Hunt Specialty Products Inc. Process of developing a radiation imaged product with trinuclear novolak oligomer having o-naphthoquinone diazide sulfonyl group
JP2709507B2 (ja) 1989-04-19 1998-02-04 日本ゼオン株式会社 ポジ型レジスト組成物
JPH087433B2 (ja) 1989-04-19 1996-01-29 日本ゼオン株式会社 ポジ型レジスト組成物
JP2700918B2 (ja) 1989-04-26 1998-01-21 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP2631744B2 (ja) 1989-05-11 1997-07-16 日本ゼオン株式会社 ポジ型レジスト組成物
JP2741243B2 (ja) 1989-05-11 1998-04-15 日本ゼオン株式会社 ポジ型レジスト組成物
JP2571136B2 (ja) 1989-11-17 1997-01-16 日本ゼオン株式会社 ポジ型レジスト組成物
JP2761786B2 (ja) 1990-02-01 1998-06-04 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5151340A (en) 1990-07-02 1992-09-29 Ocg Microelectronic Materials, Inc. Selected photoactive methylolated cyclohexanol compounds and their use in radiation-sensitive mixtures
JPH04274431A (ja) * 1991-03-01 1992-09-30 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
US5223373A (en) * 1991-04-29 1993-06-29 Industrial Technology Research Institute Positive working photosensitive composition and photosensitive electrodeposition composition prepared therefrom
US5296330A (en) 1991-08-30 1994-03-22 Ciba-Geigy Corp. Positive photoresists containing quinone diazide photosensitizer, alkali-soluble resin and tetra(hydroxyphenyl) alkane additive

Also Published As

Publication number Publication date
DE69501429T2 (de) 1998-04-23
US5609983A (en) 1997-03-11
EP0684521A1 (de) 1995-11-29
JPH0844055A (ja) 1996-02-16
EP0684521B1 (de) 1998-01-14
JP3503839B2 (ja) 2004-03-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee