DE69800164T2 - Positiv-arbeitende photoempfindliche Zusammensetzung - Google Patents

Positiv-arbeitende photoempfindliche Zusammensetzung

Info

Publication number
DE69800164T2
DE69800164T2 DE69800164T DE69800164T DE69800164T2 DE 69800164 T2 DE69800164 T2 DE 69800164T2 DE 69800164 T DE69800164 T DE 69800164T DE 69800164 T DE69800164 T DE 69800164T DE 69800164 T2 DE69800164 T2 DE 69800164T2
Authority
DE
Germany
Prior art keywords
photosensitive composition
positive working
working photosensitive
positive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69800164T
Other languages
English (en)
Other versions
DE69800164D1 (de
Inventor
Toshiaki Aoai
Satoshi Takita
Kazuya Uenishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP08107597A external-priority patent/JP3773139B2/ja
Priority claimed from JP08066697A external-priority patent/JP3778391B2/ja
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69800164D1 publication Critical patent/DE69800164D1/de
Application granted granted Critical
Publication of DE69800164T2 publication Critical patent/DE69800164T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y10S430/123—Sulfur in heterocyclic ring

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
DE69800164T 1997-03-31 1998-03-30 Positiv-arbeitende photoempfindliche Zusammensetzung Expired - Lifetime DE69800164T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP08107597A JP3773139B2 (ja) 1997-03-31 1997-03-31 ポジ型感光性組成物
JP08066697A JP3778391B2 (ja) 1997-03-31 1997-03-31 ポジ型感光性組成物

Publications (2)

Publication Number Publication Date
DE69800164D1 DE69800164D1 (de) 2000-07-06
DE69800164T2 true DE69800164T2 (de) 2000-10-05

Family

ID=26421642

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69800164T Expired - Lifetime DE69800164T2 (de) 1997-03-31 1998-03-30 Positiv-arbeitende photoempfindliche Zusammensetzung

Country Status (4)

Country Link
US (1) US6037098A (de)
EP (1) EP0869393B1 (de)
KR (1) KR100496174B1 (de)
DE (1) DE69800164T2 (de)

Families Citing this family (62)

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EP0874281B1 (de) * 1997-04-23 2002-12-04 Infineon Technologies AG Chemisch verstärkter Resist
JP2001255647A (ja) * 2000-03-13 2001-09-21 Daikin Ind Ltd エネルギー線照射によりカチオンまたは酸を発生するフルオロアルキルオニウム塩型のカチオンまたは酸発生剤
US20020058206A1 (en) * 2000-09-06 2002-05-16 Fuji Photo Film Co., Ltd. Positive resist composition
TW594383B (en) * 2001-02-21 2004-06-21 Fuji Photo Film Co Ltd Positive resist composition for electron beam
WO2003016910A1 (en) 2001-08-20 2003-02-27 Biosite, Inc. Diagnostic markers of stroke and cerebral injury and methods of use thereof
KR20020090584A (ko) * 2001-05-28 2002-12-05 주식회사 동진쎄미켐 유기 반사 방지막용 고분자 수지, 및 이를 이용하는ＫｒＦ 포토레지스트용 유기 반사 방지막 조성물
JP4480393B2 (ja) 2001-07-19 2010-06-16 ランベルティ ソシエタ ペル アチオニ スルホニウム塩、これらの製造方法および放射線硬化性系のための光開始剤としてのこれらの使用
JP4025074B2 (ja) * 2001-09-19 2007-12-19 富士フイルム株式会社 ポジ型レジスト組成物
US7316891B2 (en) * 2002-03-06 2008-01-08 Agfa Graphics Nv Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution
EP1504306A1 (de) * 2002-05-16 2005-02-09 Rensselaer Polytechnic Institute Fotopolymerisierbare zusammensetzungen, die thianthreniumsalze als kationische fotoinitiatoren enthalten
GB2396153A (en) * 2002-12-12 2004-06-16 Sun Chemical Bv Sulfonium salts useful as cationic photoinitiators in energy-curable compositions and processes of preparing cured polymeric compositions
US20050158654A1 (en) * 2004-01-21 2005-07-21 Wang Yueh Reducing outgassing of reactive material upon exposure of photolithography resists
KR100900173B1 (ko) * 2004-02-20 2009-06-02 도오꾜오까고오교 가부시끼가이샤 패턴 형성 재료용 기재, 포지티브형 레지스트 조성물 및 레지스트 패턴 형성 방법
WO2005111727A1 (en) 2004-05-19 2005-11-24 Agfa-Gevaert Method of making a photopolymer printing plate
EP1614541A3 (de) 2004-07-08 2006-06-07 Agfa-Gevaert Verfahren zur Herstellung einer lithographischen Druckplatte
JP3946715B2 (ja) * 2004-07-28 2007-07-18 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
JP4468119B2 (ja) * 2004-09-08 2010-05-26 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
JP4474256B2 (ja) 2004-09-30 2010-06-02 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法
JP4837323B2 (ja) * 2004-10-29 2011-12-14 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法および化合物
US7981588B2 (en) * 2005-02-02 2011-07-19 Tokyo Ohka Kogyo Co., Ltd. Negative resist composition and method of forming resist pattern
JP4397834B2 (ja) * 2005-02-25 2010-01-13 東京応化工業株式会社 ポジ型レジスト組成物、レジストパターン形成方法および化合物
JP5138157B2 (ja) * 2005-05-17 2013-02-06 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
JP4813103B2 (ja) 2005-06-17 2011-11-09 東京応化工業株式会社 化合物、ポジ型レジスト組成物およびレジストパターン形成方法
JP4732038B2 (ja) 2005-07-05 2011-07-27 東京応化工業株式会社 化合物、ポジ型レジスト組成物およびレジストパターン形成方法
ATE422253T1 (de) 2005-11-18 2009-02-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
ES2322908T3 (es) 2005-11-18 2009-07-01 Agfa Graphics N.V. Metodo de fabricacion de una plancha de impresion litografica.
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ES2320561T3 (es) 2005-11-18 2009-05-25 Agfa Graphics N.V. Metodo para fabricar una plancha de impresion litografica.
EP2772805A1 (de) 2005-11-18 2014-09-03 Agfa Graphics Nv Verfahren zur Herstellung einer Flachdruckplatte
DE602005013399D1 (de) 2005-11-18 2009-04-30 Agfa Graphics Nv Verfahren zur Herstellung einer lithographischen Druckplatte
DE602005013536D1 (de) 2005-11-18 2009-05-07 Agfa Graphics Nv Verfahren zur Herstellung einer Lithografiedruckform
EP1788449A1 (de) 2005-11-21 2007-05-23 Agfa Graphics N.V. Verfahren zur Herstellung einer Lithografiedruckform
ATE430330T1 (de) 2005-11-21 2009-05-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
EP1788435B1 (de) 2005-11-21 2013-05-01 Agfa Graphics N.V. Verfahren zur Herstellung einer Lithografiedruckform
DE602006009919D1 (de) * 2006-08-03 2009-12-03 Agfa Graphics Nv Flachdruckplattenträger
US7718344B2 (en) * 2006-09-29 2010-05-18 Fujifilm Corporation Resist composition and pattern forming method using the same
EP1972460B1 (de) * 2007-03-19 2009-09-02 Agfa Graphics N.V. Verfahren zur Herstellung eines lithographischen Druckplattenträgers
ES2344668T3 (es) 2007-11-30 2010-09-02 Agfa Graphics N.V. Metodo para tratar una plancha de impresion litografica.
ES2430562T3 (es) 2008-03-04 2013-11-21 Agfa Graphics N.V. Método para la fabricación de un soporte de una plancha de impresión litográfica
ES2365885T3 (es) * 2008-03-31 2011-10-13 Agfa Graphics N.V. Un método para tratar una plancha de impresión litográfica.
JP5544098B2 (ja) 2008-09-26 2014-07-09 富士フイルム株式会社 感活性光線性または感放射線性樹脂組成物、及び該感光性組成物を用いたパターン形成方法
US10254646B2 (en) 2012-12-19 2019-04-09 Ibf Industria Brasileira De Filmes S/A Composition sensitive to radiation in electromagnetic spectrum ranges for printing purposes, printing plate comprising said composition, use of said composition and image development process
JP6206311B2 (ja) 2014-04-22 2017-10-04 信越化学工業株式会社 光酸発生剤、化学増幅型レジスト材料及びパターン形成方法
ES2655798T3 (es) 2014-12-08 2018-02-21 Agfa Nv Sistema para reducir los residuos de ablación
EP3430475B1 (de) 2016-03-16 2020-08-12 Agfa Nv Vorrichtung zur verarbeitung einer lithografiedruckplatte und entsprechendes verfahren
CN106313870B (zh) 2016-08-19 2018-06-15 浙江康尔达新材料股份有限公司 一种可成像涂层、热敏阴图平版印刷版及其制版方法
WO2019219570A1 (en) 2018-05-14 2019-11-21 Agfa Nv A lithographic printing plate precursor
EP3587113B1 (de) 2018-06-21 2023-01-04 Agfa Offset Bv Lithographiedruckplattenvorläufer
EP3587112B1 (de) 2018-06-21 2024-04-03 Eco3 Bv Lithographiedruckplattenvorläufer
EP3815900A1 (de) 2019-10-31 2021-05-05 Agfa Nv Lithographiedruckplattenvorläufer und verfahren zur herstellung von hydrophoben harzpartikeln
EP3875271A1 (de) 2020-03-04 2021-09-08 Agfa Nv Lithographiedruckplattenvorläufer
EP3892469B1 (de) 2020-04-10 2023-11-08 Eco3 Bv Lithographiedruckplattenvorläufer
EP3928983B1 (de) 2020-06-24 2023-09-27 Eco3 Bv Lithografiedruckplattenvorläufer
EP4171958A1 (de) 2020-06-24 2023-05-03 Agfa Offset Bv Lithographiedruckplattenvorläufer
US20230266667A1 (en) 2020-06-24 2023-08-24 Agfa Offset Bv A Lithographic Printing Plate Precursor
EP3960455A1 (de) 2020-08-31 2022-03-02 Agfa Offset Bv Lithografiedruckplattenvorläufer
US20230382100A1 (en) 2020-10-09 2023-11-30 Agfa Offset Bv A Lithographic Printing Plate Precursor
EP4035897A1 (de) 2021-01-28 2022-08-03 Agfa Offset Bv Lithografiedruckplattenvorläufer
EP4129682A1 (de) 2021-08-05 2023-02-08 Agfa Offset Bv Lithografiedruckplattenvorläufer
EP4223534A1 (de) 2022-02-07 2023-08-09 Agfa Offset Bv Lithografiedruckplattenvorläufer
EP4239411A1 (de) 2022-03-04 2023-09-06 Eco3 Bv Verfahren und vorrichtung zum verarbeiten eine lithografiedruckplattenvorläufers

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US5731364A (en) * 1996-01-24 1998-03-24 Shipley Company, L.L.C. Photoimageable compositions comprising multiple arylsulfonium photoactive compounds

Also Published As

Publication number Publication date
KR100496174B1 (ko) 2006-01-27
DE69800164D1 (de) 2000-07-06
KR19980080924A (ko) 1998-11-25
US6037098A (en) 2000-03-14
EP0869393A1 (de) 1998-10-07
EP0869393B1 (de) 2000-05-31

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