DE69738464D1 - Photoempfindliche Zusammensetzung - Google Patents

Photoempfindliche Zusammensetzung

Info

Publication number
DE69738464D1
DE69738464D1 DE69738464T DE69738464T DE69738464D1 DE 69738464 D1 DE69738464 D1 DE 69738464D1 DE 69738464 T DE69738464 T DE 69738464T DE 69738464 T DE69738464 T DE 69738464T DE 69738464 D1 DE69738464 D1 DE 69738464D1
Authority
DE
Germany
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69738464T
Other languages
English (en)
Other versions
DE69738464T2 (de
Inventor
Koichi Kawamura
Noriaki Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP30335496A external-priority patent/JP3627887B2/ja
Priority claimed from JP31651796A external-priority patent/JP3627888B2/ja
Priority claimed from JP34374096A external-priority patent/JP3672140B2/ja
Priority claimed from JP34852696A external-priority patent/JP3630257B2/ja
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of DE69738464D1 publication Critical patent/DE69738464D1/de
Application granted granted Critical
Publication of DE69738464T2 publication Critical patent/DE69738464T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE69738464T 1996-11-14 1997-11-13 Photoempfindliche Zusammensetzung Expired - Lifetime DE69738464T2 (de)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP30335496 1996-11-14
JP30335496A JP3627887B2 (ja) 1996-11-14 1996-11-14 感光性組成物
JP31651796A JP3627888B2 (ja) 1996-11-27 1996-11-27 感光性組成物
JP31651796 1996-11-27
JP34374096 1996-12-24
JP34374096A JP3672140B2 (ja) 1996-12-24 1996-12-24 感光性組成物
JP34852696 1996-12-26
JP34852696A JP3630257B2 (ja) 1996-12-26 1996-12-26 感光性組成物

Publications (2)

Publication Number Publication Date
DE69738464D1 true DE69738464D1 (de) 2008-03-06
DE69738464T2 DE69738464T2 (de) 2008-05-21

Family

ID=27479845

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69738464T Expired - Lifetime DE69738464T2 (de) 1996-11-14 1997-11-13 Photoempfindliche Zusammensetzung

Country Status (3)

Country Link
US (2) US6110640A (de)
EP (1) EP0843218B1 (de)
DE (1) DE69738464T2 (de)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69738464T2 (de) * 1996-11-14 2008-05-21 Fujifilm Corp. Photoempfindliche Zusammensetzung
EP0949539B1 (de) * 1998-04-06 2003-03-19 Fuji Photo Film Co., Ltd. Lichtempfindliche Harzzusammensetzung
US6849377B2 (en) 1998-09-23 2005-02-01 E. I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
AU6056099A (en) 1998-09-23 2000-04-10 E.I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
US6420082B1 (en) * 1998-11-13 2002-07-16 Fuji Photo Film Co., Ltd. Positive resist fluid and positive resist composition
JP2000181053A (ja) * 1998-12-16 2000-06-30 Fuji Photo Film Co Ltd 感光性平版印刷版
DE60014536T2 (de) 1999-08-02 2005-03-24 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Zusammensetzungen für Druckplatten mit verbesserter chemischer Beständigkeit und Entwickler-Beständigkeit und mit diesen Zusammensetzungen hergestellte Druckplatten
JP3672780B2 (ja) 1999-11-29 2005-07-20 セントラル硝子株式会社 ポジ型レジスト組成物およびパターン形成方法
TW553959B (en) * 2000-02-16 2003-09-21 Shinetsu Chemical Co Polymeric compound, resist material and pattern-forming method
JP2002055446A (ja) * 2000-08-11 2002-02-20 Fuji Photo Film Co Ltd 平版印刷版原版
US6391521B1 (en) * 2000-08-16 2002-05-21 International Business Machines Corporation Resist compositions containing bulky anhydride additives
JP2002072474A (ja) * 2000-08-29 2002-03-12 Fuji Photo Film Co Ltd 平版印刷版原版
WO2002022565A1 (en) * 2000-09-15 2002-03-21 Iconix Pharmaceuticals, Inc. Inhibitors of rho c
US6660445B2 (en) * 2000-10-13 2003-12-09 Fuji Photo Film Co., Ltd. Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compound
US6730452B2 (en) * 2001-01-26 2004-05-04 International Business Machines Corporation Lithographic photoresist composition and process for its use
US6740470B2 (en) * 2001-02-08 2004-05-25 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
US6787286B2 (en) * 2001-03-08 2004-09-07 Shipley Company, L.L.C. Solvents and photoresist compositions for short wavelength imaging
US6649319B2 (en) 2001-06-11 2003-11-18 Kodak Polychrome Graphics Llc Method of processing lithographic printing plate precursors
JP4141120B2 (ja) * 2001-08-16 2008-08-27 富士フイルム株式会社 平版印刷版用原版
JP2003066607A (ja) * 2001-08-30 2003-03-05 Fuji Photo Film Co Ltd 赤外線レーザ用平版印刷版
JP4068892B2 (ja) * 2002-05-20 2008-03-26 富士フイルム株式会社 画像形成材料
JP2005178238A (ja) * 2003-12-22 2005-07-07 Konica Minolta Medical & Graphic Inc 印刷方法とそれに用いる印刷版材料
JP2005275231A (ja) * 2004-03-26 2005-10-06 Fuji Photo Film Co Ltd 感光性平版印刷版
JP4673310B2 (ja) * 2004-08-11 2011-04-20 クラレメディカル株式会社 歯科用重合性組成物
US20060165919A1 (en) * 2005-01-27 2006-07-27 Fuji Photo Film Co., Ltd. Coating composition, optical film, anti-reflection film, polarizing plate and image display device using the same
US7198834B2 (en) 2005-03-22 2007-04-03 Hewlett-Packard Development Company, L.P. Imaging media including interference layer for generating human-readable marking on optical media
US7270944B2 (en) * 2005-03-29 2007-09-18 Hewlett-Packard Development Company, L.P. Compositions, systems, and methods for imaging
US20070231741A1 (en) * 2006-04-04 2007-10-04 Shin-Etsu Chemical Co., Ltd. Resist composition and patterning process
JP5002323B2 (ja) * 2007-04-27 2012-08-15 東京応化工業株式会社 含フッ素高分子化合物、液浸露光用ポジ型レジスト組成物、及びレジストパターン形成方法
US9469941B2 (en) 2011-07-01 2016-10-18 Empire Technology Development Llc Paraben derivatives for preserving cellulosic materials
JP5743783B2 (ja) * 2011-07-27 2015-07-01 富士フイルム株式会社 感光性組成物、平版印刷版原版、及びポリウレタン
EP2753662B1 (de) 2011-09-07 2020-06-24 MicroChem Corp. Epoxidformulierungen und verfahren zur herstellung von reliefmustern auf substraten mit niedriger oberflächenenergie
JP5866179B2 (ja) 2011-11-10 2016-02-17 イーストマン コダック カンパニー 平版印刷版前駆体及び平版印刷版の作製方法
US11635688B2 (en) * 2012-03-08 2023-04-25 Kayaku Advanced Materials, Inc. Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates
CN107850843B (zh) 2015-08-21 2022-02-01 默克专利有限公司 基底上的图案化堤岸结构和形成方法
TW201802588A (zh) * 2016-03-24 2018-01-16 陶氏全球科技責任有限公司 具有高介電強度之光可成像薄膜
JP6730417B2 (ja) 2017-12-31 2020-07-29 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ フォトレジスト組成物および方法
JP7790865B2 (ja) 2019-12-18 2025-12-23 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法

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US2566162A (en) * 1950-08-18 1951-08-28 Eastman Kodak Co Acrylyl sulfanilamides and polymers thereof
US4098742A (en) * 1977-01-24 1978-07-04 Ciba-Geigy Corporation Fluorine and silicone containing polymers
DE3421511A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Polymerisierbare, perfluoralkylgruppen aufweisende verbindungen, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
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JPH083630B2 (ja) * 1986-01-23 1996-01-17 富士写真フイルム株式会社 感光性組成物
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US4942164A (en) * 1989-05-08 1990-07-17 Fluorochem Inc. Polyfluorinated diisocyanates and fluorinated polyurethanes prepared therefrom
JPH03170931A (ja) * 1989-08-07 1991-07-24 Konica Corp 感光性塗布液
JPH03172849A (ja) * 1989-12-01 1991-07-26 Fuji Photo Film Co Ltd 感光性組成物
US5204441A (en) * 1990-03-12 1993-04-20 Fluorochem Inc. Polyfluorinated, branched-chain diols and diisocyanantes and fluorinated polyurethanes prepared therefrom
JP3030672B2 (ja) * 1991-06-18 2000-04-10 和光純薬工業株式会社 新規なレジスト材料及びパタ−ン形成方法
IT1250739B (it) * 1991-08-02 1995-04-21 Ausimont Spa Impiego di poliuretani fluorurati per il trattamento di film o fogli di cellulosa, mica, caolino e simili materiali naturali
JP3378359B2 (ja) * 1994-06-30 2003-02-17 コダックポリクロームグラフィックス株式会社 感光性組成物
US5491261A (en) * 1994-07-01 1996-02-13 Ciba-Geigy Corporation Poly-perfluoroalkyl-substituted alcohols and acids, and derivatives thereof
US5827919A (en) * 1995-10-06 1998-10-27 E. I. Du Pont De Nemours And Company Fluorourethane additives for water-dispersed coating compositions
DE69738464T2 (de) * 1996-11-14 2008-05-21 Fujifilm Corp. Photoempfindliche Zusammensetzung
US5789513A (en) * 1997-02-26 1998-08-04 E. I. Du Pont De Nemours And Company Polyfluorourethane additives for curable coating compositions
US6001923A (en) * 1997-03-27 1999-12-14 Pilkington Aerospace Inc. Transparent fluorinated polyurethane coating compositions and methods of use thereof

Also Published As

Publication number Publication date
EP0843218A1 (de) 1998-05-20
US6110640A (en) 2000-08-29
EP0843218B1 (de) 2008-01-16
US6132931A (en) 2000-10-17
DE69738464T2 (de) 2008-05-21

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Legal Events

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