DE69616104D1 - Lichtempfindliche Zusammensetzung - Google Patents

Lichtempfindliche Zusammensetzung

Info

Publication number
DE69616104D1
DE69616104D1 DE69616104T DE69616104T DE69616104D1 DE 69616104 D1 DE69616104 D1 DE 69616104D1 DE 69616104 T DE69616104 T DE 69616104T DE 69616104 T DE69616104 T DE 69616104T DE 69616104 D1 DE69616104 D1 DE 69616104D1
Authority
DE
Germany
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69616104T
Other languages
English (en)
Other versions
DE69616104T2 (de
Inventor
Yoshimasa Aotani
Tadahiro Sorori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE69616104D1 publication Critical patent/DE69616104D1/de
Publication of DE69616104T2 publication Critical patent/DE69616104T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/02—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing an odd number of >CH- or >C[alkyl]- groups
    • C09B23/04—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing an odd number of >CH- or >C[alkyl]- groups one >CH- group, e.g. cyanines, isocyanines, pseudocyanines
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00—Dyes not provided for by a single group of this subclass
    • C09B69/10—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
    • C09B69/105—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds containing a methine or polymethine dye
DE69616104T 1995-02-10 1996-02-09 Lichtempfindliche Zusammensetzung Expired - Lifetime DE69616104T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02308195A JP3400586B2 (ja) 1995-02-10 1995-02-10 光重合性組成物

Publications (2)

Publication Number Publication Date
DE69616104D1 true DE69616104D1 (de) 2001-11-29
DE69616104T2 DE69616104T2 (de) 2002-03-14

Family

ID=12100476

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69616104T Expired - Lifetime DE69616104T2 (de) 1995-02-10 1996-02-09 Lichtempfindliche Zusammensetzung

Country Status (4)

Country Link
US (1) US5721288A (de)
EP (1) EP0726497B1 (de)
JP (1) JP3400586B2 (de)
DE (1) DE69616104T2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3843154B2 (ja) * 1996-09-25 2006-11-08 関西ペイント株式会社 光重合性組成物
US6140384A (en) * 1996-10-02 2000-10-31 Fuji Photo Film Co., Ltd. Photopolymerizable composition containing a sensitizing dye with cyano or substituted carbonyl groups
US6248804B1 (en) * 1997-02-27 2001-06-19 Acushnet Company Ultraviolet and or/ visible light curable inks with photoinitiators for game balls, golf balls and the like
NL1013854C2 (nl) * 1999-03-03 2001-05-30 Sumitomo Chemical Co Kleurfilter, werkwijze voor het vervaardigen van een kleurfilter en fotogevoelig kleurenmengsel.
SG78412A1 (en) 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
US6692896B2 (en) * 2000-03-01 2004-02-17 Fuji Photo Film Co., Ltd. Heat mode-compatible planographic printing plate
WO2002044285A1 (fr) * 2000-11-30 2002-06-06 Mitsubishi Rayon Co., Ltd. Composition durcissable par rayonnement energetique actif pour le revetement d'un disque optique, et disque optique resultant
JP2003221517A (ja) * 2002-01-30 2003-08-08 Fuji Photo Film Co Ltd 増感色素の製造方法及びそれを用いた感光性組成物
CN1705913B (zh) * 2003-09-25 2011-11-30 日本合成化学工业株式会社 负型青紫色激光感光性组合物、图像形成材料、图像形成元件和图像形成方法
JP5374403B2 (ja) 2009-02-13 2013-12-25 三菱製紙株式会社 感光性平版印刷版材料
JP5850863B2 (ja) 2010-02-24 2016-02-03 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ 潜在性酸及びそれらの使用
US8647813B2 (en) 2010-03-29 2014-02-11 Mitsubishi Paper Mills Limited Photosensitive composition and photosensitive lithographic printing plate material
EP3041060B1 (de) 2014-12-19 2021-06-16 Samsung Electronics Co., Ltd. Bildsensor und elektronische vorrichtung damit
EP3253735B1 (de) 2015-02-02 2021-03-31 Basf Se Latente säuren und ihre verwendung

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4162162A (en) * 1978-05-08 1979-07-24 E. I. Du Pont De Nemours And Company Derivatives of aryl ketones and p-dialkyl-aminoarylaldehydes as visible sensitizers of photopolymerizable compositions
US4282309A (en) * 1979-01-24 1981-08-04 Agfa-Gevaert, N.V. Photosensitive composition containing an ethylenically unsaturated compound, initiator and sensitizer
US4252887A (en) * 1979-08-14 1981-02-24 E. I. Du Pont De Nemours And Company Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators
CA1323949C (en) * 1987-04-02 1993-11-02 Michael C. Palazzotto Ternary photoinitiator system for addition polymerization
US4987056A (en) * 1988-06-02 1991-01-22 Toyo Boseki Kabushiki Kaisha Photopolymerizable composition
US4971892A (en) * 1988-11-23 1990-11-20 Minnesota Mining And Manufacturing Company High sensitivity photopolymerizable composition
US5112721A (en) * 1990-01-29 1992-05-12 E. I. Du Pont De Nemours And Company Photopolymerizable compositions containing sensitizer mixtures
CA2053761A1 (en) * 1990-10-25 1992-04-26 Gregory C. Weed Borate coinitiators for photopolymerizable compositions
JPH05210240A (ja) * 1992-01-31 1993-08-20 Mitsubishi Kasei Corp 光重合性組成物
JPH05216226A (ja) * 1992-02-05 1993-08-27 Mitsubishi Kasei Corp 光重合性組成物
US5609992A (en) * 1994-11-01 1997-03-11 Fuji Photo Film Co., Ltd. Photopolymerizable composition

Also Published As

Publication number Publication date
DE69616104T2 (de) 2002-03-14
EP0726497B1 (de) 2001-10-24
EP0726497A3 (de) 1997-10-01
JP3400586B2 (ja) 2003-04-28
US5721288A (en) 1998-02-24
EP0726497A2 (de) 1996-08-14
JPH08220755A (ja) 1996-08-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP