DE69604601D1 - Fotopolymerisierbare Zusammensetzung - Google Patents

Fotopolymerisierbare Zusammensetzung

Info

Publication number
DE69604601D1
DE69604601D1 DE69604601T DE69604601T DE69604601D1 DE 69604601 D1 DE69604601 D1 DE 69604601D1 DE 69604601 T DE69604601 T DE 69604601T DE 69604601 T DE69604601 T DE 69604601T DE 69604601 D1 DE69604601 D1 DE 69604601D1
Authority
DE
Germany
Prior art keywords
photopolymerizable composition
photopolymerizable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69604601T
Other languages
English (en)
Other versions
DE69604601T2 (de
Inventor
Kazuto Kunita
Syunichi Kondo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE69604601D1 publication Critical patent/DE69604601D1/de
Publication of DE69604601T2 publication Critical patent/DE69604601T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE69604601T 1995-01-30 1996-01-25 Fotopolymerisierbare Zusammensetzung Expired - Lifetime DE69604601T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP01310895A JP3498869B2 (ja) 1995-01-30 1995-01-30 光重合性組成物を有する画像形成材料

Publications (2)

Publication Number Publication Date
DE69604601D1 true DE69604601D1 (de) 1999-11-18
DE69604601T2 DE69604601T2 (de) 2000-03-23

Family

ID=11823963

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69604601T Expired - Lifetime DE69604601T2 (de) 1995-01-30 1996-01-25 Fotopolymerisierbare Zusammensetzung

Country Status (4)

Country Link
US (1) US5703140A (de)
EP (1) EP0724197B1 (de)
JP (1) JP3498869B2 (de)
DE (1) DE69604601T2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3723312B2 (ja) * 1997-02-25 2005-12-07 富士写真フイルム株式会社 光重合性組成物
US20010010893A1 (en) * 1998-03-05 2001-08-02 Hiroshi Takanashi Negative-working photosensitive resin composition and photosensitive resin plate using the same
SG97168A1 (en) * 1999-12-15 2003-07-18 Ciba Sc Holding Ag Photosensitive resin composition
US7014988B2 (en) * 2000-06-15 2006-03-21 3M Innovative Properties Company Multiphoton curing to provide encapsulated optical elements
US7026103B2 (en) * 2000-06-15 2006-04-11 3M Innovative Properties Company Multicolor imaging using multiphoton photochemical processes
DE60138930D1 (de) * 2000-06-15 2009-07-16 3M Innovative Properties Co Mikroherstellungsverfahren für organische optische Bauteile
WO2001096958A2 (en) * 2000-06-15 2001-12-20 3M Innovative Properties Company Process for producing microfluidic articles
US6852766B1 (en) * 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
JP2004503928A (ja) 2000-06-15 2004-02-05 スリーエム　イノベイティブ　プロパティズ　カンパニー 多方向光反応吸収方法
ATE440308T1 (de) 2000-06-15 2009-09-15 3M Innovative Properties Co Methode und gerät zur erzielung wiederholter multiphotonabsorption
US20040012872A1 (en) * 2001-06-14 2004-01-22 Fleming Patrick R Multiphoton absorption method using patterned light
US20030155667A1 (en) * 2002-12-12 2003-08-21 Devoe Robert J Method for making or adding structures to an article
JP2006160836A (ja) 2004-12-03 2006-06-22 Fuji Photo Film Co Ltd 放射線の照射により硬化可能なインクジェット記録用インク及びこれを用いた平版印刷版作製方法
EP1798031A3 (de) 2005-01-26 2007-07-04 FUJIFILM Corporation Flachdruckplattenvorläufer und Flachdruckverfahren
US7858291B2 (en) 2005-02-28 2010-12-28 Fujifilm Corporation Lithographic printing plate precursor, method for preparation of lithographic printing plate precursor, and lithographic printing method
CN101349865B (zh) * 2007-07-17 2012-10-03 富士胶片株式会社 感光性组合物、可固化组合物、滤色器和制备滤色器的方法
TWI436163B (zh) 2007-07-17 2014-05-01 Fujifilm Corp 混合物、可光聚合的組成物、彩色濾鏡以及平版印刷的印刷板前驅物
JP5496482B2 (ja) * 2007-08-27 2014-05-21 富士フイルム株式会社 新規化合物、光重合性組成物、カラーフィルタ用光重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版
JP5507054B2 (ja) 2008-03-28 2014-05-28 富士フイルム株式会社 重合性組成物、カラーフィルタ、カラーフィルタの製造方法、及び固体撮像素子

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1180846A (en) * 1967-08-08 1970-02-11 Agfa Gevaert Nv Photopolymerisation of Ethylenically Unsaturated Organic Compounds
DE2558812C2 (de) * 1975-12-27 1987-04-30 Hoechst Ag, 6230 Frankfurt Photopolymerisierbares Gemisch
US4590145A (en) * 1985-06-28 1986-05-20 Daicel Chemical Industries, Ltd. Photopolymerization initiator comprised of thioxanthones and oxime esters
DE4219385A1 (de) * 1992-06-13 1993-12-16 Basf Ag Copolymerisierbare Oximether und diese enthaltende Copolymerisate
DE4309193A1 (de) * 1993-03-22 1994-09-29 Basf Ag Copolymerisierbare Oximether und diese enthaltende Copolymerisate

Also Published As

Publication number Publication date
US5703140A (en) 1997-12-30
DE69604601T2 (de) 2000-03-23
EP0724197A1 (de) 1996-07-31
EP0724197B1 (de) 1999-10-13
JPH08202035A (ja) 1996-08-09
JP3498869B2 (ja) 2004-02-23

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP