DE69800779D1 - Photopolymerisierbare Zusammensetzung - Google Patents
Photopolymerisierbare ZusammensetzungInfo
- Publication number
- DE69800779D1 DE69800779D1 DE69800779T DE69800779T DE69800779D1 DE 69800779 D1 DE69800779 D1 DE 69800779D1 DE 69800779 T DE69800779 T DE 69800779T DE 69800779 T DE69800779 T DE 69800779T DE 69800779 D1 DE69800779 D1 DE 69800779D1
- Authority
- DE
- Germany
- Prior art keywords
- photopolymerizable composition
- photopolymerizable
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/127—Spectral sensitizer containing
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04096497A JP3723312B2 (ja) | 1997-02-25 | 1997-02-25 | 光重合性組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69800779D1 true DE69800779D1 (de) | 2001-06-21 |
DE69800779T2 DE69800779T2 (de) | 2001-08-30 |
Family
ID=12595174
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69800779T Expired - Lifetime DE69800779T2 (de) | 1997-02-25 | 1998-02-25 | Photopolymerisierbare Zusammensetzung |
Country Status (4)
Country | Link |
---|---|
US (1) | US6051367A (de) |
EP (1) | EP0860741B1 (de) |
JP (1) | JP3723312B2 (de) |
DE (1) | DE69800779T2 (de) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU7672796A (en) * | 1995-11-08 | 1997-05-29 | Francis H. Kirkpatrick | Methods and reagents for gel electrophoresis |
US6740464B2 (en) * | 2000-01-14 | 2004-05-25 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor |
CN1462284A (zh) | 2000-08-16 | 2003-12-17 | 部鲁尔科学公司 | 用于滤色片应用的光敏树脂组合物 |
US6482571B1 (en) * | 2000-09-06 | 2002-11-19 | Gary Ganghui Teng | On-press development of thermosensitive lithographic plates |
JP4414607B2 (ja) * | 2001-03-14 | 2010-02-10 | 富士フイルム株式会社 | ラジカル重合性化合物 |
JP2003063161A (ja) * | 2001-08-23 | 2003-03-05 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
EP1685957B1 (de) | 2005-01-26 | 2013-12-11 | FUJIFILM Corporation | Flachdruckverfahrenstapel |
EP3086177B1 (de) | 2005-02-28 | 2018-11-14 | Fujifilm Corporation | Verfahren zur herstellung eines lithografiedruckplattenvorläufers |
US20070032562A1 (en) * | 2005-08-04 | 2007-02-08 | Jose Sosa | Redox polymerization of vinyl aromatic monomers by photosynthesis |
JP4694324B2 (ja) | 2005-09-09 | 2011-06-08 | 富士フイルム株式会社 | 感光性平版印刷版の製造方法 |
KR100763744B1 (ko) * | 2005-11-07 | 2007-10-04 | 주식회사 엘지화학 | 옥심 에스테르를 포함하는 트리아진계 광활성 화합물 |
WO2008059670A1 (fr) * | 2006-11-15 | 2008-05-22 | Taiyo Ink Mfg. Co., Ltd. | Composition de résine photodurcissable/thermodurcissable, object durci et plaque de câblage imprimée |
JP5010941B2 (ja) * | 2007-02-20 | 2012-08-29 | 富士フイルム株式会社 | 硬化性組成物及びそれを用いた硬化皮膜の製造方法 |
KR101007440B1 (ko) | 2007-07-18 | 2011-01-12 | 주식회사 엘지화학 | 옥심 에스테르를 포함하는 수지상 광활성 화합물 및 이의제조방법 |
US20100021844A1 (en) * | 2008-07-22 | 2010-01-28 | Jianfei Yu | Negative-working imageable elements and method of use |
CN103842338B (zh) | 2011-05-25 | 2017-06-30 | 美洲染料资源公司 | 具有肟酯基和/或酰基的化合物 |
JP2019199436A (ja) * | 2018-05-16 | 2019-11-21 | 東洋インキScホールディングス株式会社 | モルホリン環含有(メタ)アクリレート化合物およびそれを用いた重合性組成物 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3498869B2 (ja) * | 1995-01-30 | 2004-02-23 | 富士写真フイルム株式会社 | 光重合性組成物を有する画像形成材料 |
-
1997
- 1997-02-25 JP JP04096497A patent/JP3723312B2/ja not_active Expired - Lifetime
-
1998
- 1998-02-23 US US09/027,737 patent/US6051367A/en not_active Expired - Lifetime
- 1998-02-25 EP EP98103280A patent/EP0860741B1/de not_active Expired - Lifetime
- 1998-02-25 DE DE69800779T patent/DE69800779T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0860741A1 (de) | 1998-08-26 |
JPH10237118A (ja) | 1998-09-08 |
EP0860741B1 (de) | 2001-05-16 |
US6051367A (en) | 2000-04-18 |
JP3723312B2 (ja) | 2005-12-07 |
DE69800779T2 (de) | 2001-08-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP |