DE69618854D1 - Fotopolymerisierbare Zusammensetzung - Google Patents

Fotopolymerisierbare Zusammensetzung

Info

Publication number
DE69618854D1
DE69618854D1 DE69618854T DE69618854T DE69618854D1 DE 69618854 D1 DE69618854 D1 DE 69618854D1 DE 69618854 T DE69618854 T DE 69618854T DE 69618854 T DE69618854 T DE 69618854T DE 69618854 D1 DE69618854 D1 DE 69618854D1
Authority
DE
Germany
Prior art keywords
photopolymerizable composition
photopolymerizable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69618854T
Other languages
English (en)
Other versions
DE69618854T2 (de
Inventor
Yasuo Okamoto
Shunichi Kondo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69618854D1 publication Critical patent/DE69618854D1/de
Application granted granted Critical
Publication of DE69618854T2 publication Critical patent/DE69618854T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
DE69618854T 1995-06-07 1996-06-05 Fotopolymerisierbare Zusammensetzung Expired - Lifetime DE69618854T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16458395A JP3441246B2 (ja) 1995-06-07 1995-06-07 光重合性組成物

Publications (2)

Publication Number Publication Date
DE69618854D1 true DE69618854D1 (de) 2002-03-14
DE69618854T2 DE69618854T2 (de) 2002-07-11

Family

ID=15795936

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69618854T Expired - Lifetime DE69618854T2 (de) 1995-06-07 1996-06-05 Fotopolymerisierbare Zusammensetzung

Country Status (4)

Country Link
US (1) US5801212A (de)
EP (1) EP0747771B1 (de)
JP (1) JP3441246B2 (de)
DE (1) DE69618854T2 (de)

Families Citing this family (46)

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USRE37962E1 (en) * 1995-02-28 2003-01-07 Fuji Photo Film Co., Ltd. Photopolymerizable composition containing a sensitizing dye and a titanocene compound
US6140384A (en) * 1996-10-02 2000-10-31 Fuji Photo Film Co., Ltd. Photopolymerizable composition containing a sensitizing dye with cyano or substituted carbonyl groups
JP3770436B2 (ja) * 1997-12-15 2006-04-26 富士写真フイルム株式会社 光重合性組成物
EP0985683A1 (de) * 1998-09-09 2000-03-15 Fuji Photo Film Co., Ltd. Fotoempfindliche Zusammensetzung und Verfahren zur Herstellung einer Flachdruckplatte
SG78412A1 (en) 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
US6436605B1 (en) * 1999-07-12 2002-08-20 International Business Machines Corporation Plasma resistant composition and use thereof
EP1313734B1 (de) 2000-09-01 2009-11-11 Novartis Vaccines and Diagnostics, Inc. Aza heterocyclische derivate und ihre therapeutische verwendung
US20030028018A1 (en) * 2000-09-11 2003-02-06 Chiron Coporation Quinolinone derivatives
AU9327501A (en) * 2000-09-11 2002-03-26 Chiron Corp Quinolinone derivatives
JP2002122986A (ja) * 2000-10-16 2002-04-26 Kansai Paint Co Ltd ポジ型感光性樹脂組成物、ポジ型感光性ドライフィルム、その組成物を使用して得られる材料及びパターン形成方法
JP2002122987A (ja) * 2000-10-16 2002-04-26 Kansai Paint Co Ltd ネガ型感光性樹脂組成物、ネガ型感光性ドライフィルム、その組成物を使用して得られる材料及びパターン形成方法
JP2003107697A (ja) * 2001-09-28 2003-04-09 Fuji Photo Film Co Ltd 感光性転写材料、フォトマスク材料、フォトマスクおよびフォトマスクの製造方法
EP1388538B1 (de) 2002-07-09 2010-09-01 Merck Patent GmbH Polymerizationsinitiator
CA2496164C (en) * 2002-08-23 2010-11-09 Chiron Corporation Benzimidazole quinolinones and uses thereof
US7825132B2 (en) * 2002-08-23 2010-11-02 Novartis Vaccines And Diagnostics, Inc. Inhibition of FGFR3 and treatment of multiple myeloma
US20050256157A1 (en) * 2002-08-23 2005-11-17 Chiron Corporation Combination therapy with CHK1 inhibitors
EP1565187A4 (de) * 2002-11-13 2010-02-17 Novartis Vaccines & Diagnostic Verfahren zur behandlung von krebs undverwandte verfahren
JP2005122113A (ja) * 2003-08-28 2005-05-12 Fuji Photo Film Co Ltd 光重合性組成物及び画像記録材料
JP4724665B2 (ja) 2003-11-07 2011-07-13 ノバルティス バクシンズ アンド ダイアグノスティックス，インコーポレーテッド キノリノン化合物を合成する方法
JP2005215147A (ja) * 2004-01-28 2005-08-11 Fuji Photo Film Co Ltd 重合性組成物
BRPI0507891A (pt) * 2004-02-20 2007-07-24 Chiron Corp modulação dos processos inflamatório e metastático
JP2006065074A (ja) 2004-08-27 2006-03-09 Fuji Photo Film Co Ltd 感光性平版印刷版
JP5089866B2 (ja) 2004-09-10 2012-12-05 富士フイルム株式会社 平版印刷方法
MX2007009099A (es) 2005-01-27 2007-09-13 Novartis Vaccines & Diagnostic Tratamiento de tumores con metastasis.
JP4538350B2 (ja) 2005-03-18 2010-09-08 富士フイルム株式会社 感光性組成物および画像記録材料並びに画像記録方法
WO2006124413A2 (en) 2005-05-13 2006-11-23 Novartis Ag Methods for treating drug resistant cancer
RU2437878C2 (ru) 2005-05-17 2011-12-27 Новартис Аг Способы получения гетероциклических соединений
CN102070614B (zh) 2005-05-23 2014-01-15 诺华股份有限公司 4-氨基-5-氟-3-[6-(4-甲基哌嗪-1-基)-1h-苯并咪唑-2-基]-1h-喹啉-2-酮乳酸盐的结晶和其它形式
JP4701042B2 (ja) 2005-08-22 2011-06-15 富士フイルム株式会社 感光性平版印刷版
MY148529A (en) 2005-11-29 2013-04-30 Novartis Ag Formulations of quinolinones
JP4777226B2 (ja) 2006-12-07 2011-09-21 富士フイルム株式会社 画像記録材料、及び新規化合物
JP4860525B2 (ja) 2007-03-27 2012-01-25 富士フイルム株式会社 硬化性組成物及び平版印刷版原版
EP2048539A1 (de) 2007-09-06 2009-04-15 FUJIFILM Corporation Verarbeitetes Pigment, pigmentverstreute Zusammensetzung, farbige, lichtempfindliche Zusammensetzung, Farbfilter, Flüssigkristallanzeigeelement und Festbildaufnahmeelement
JP2009091555A (ja) 2007-09-18 2009-04-30 Fujifilm Corp 硬化性組成物、画像形成材料及び平版印刷版原版
US9442372B2 (en) 2007-09-26 2016-09-13 Fujifilm Corporation Pigment dispersion composition, photocurable composition and color filter
US7955781B2 (en) 2007-09-28 2011-06-07 Fujifilm Corporation Negative-working photosensitive material and negative-working planographic printing plate precursor
JP4890408B2 (ja) 2007-09-28 2012-03-07 富士フイルム株式会社 重合性組成物及びそれを用いた平版印刷版原版、アルカリ可溶性ポリウレタン樹脂、並びに、ジオール化合物の製造方法
WO2009116442A1 (ja) 2008-03-17 2009-09-24 富士フイルム株式会社 顔料分散組成物、着色感光性組成物、光硬化性組成物、カラーフィルタ、液晶表示素子、及び固体撮像素子
US7923197B2 (en) 2008-03-25 2011-04-12 Fujifilm Corporation Lithographic printing plate precursor
JP5444933B2 (ja) 2008-08-29 2014-03-19 富士フイルム株式会社 ネガ型平版印刷版原版及びそれを用いる平版印刷方法
JP5554106B2 (ja) 2009-03-31 2014-07-23 富士フイルム株式会社 着色硬化性組成物、カラーフィルタの製造方法、カラーフィルタ、固体撮像素子、および液晶表示装置
CN102781911B (zh) 2010-02-24 2015-07-22 巴斯夫欧洲公司 潜酸及其用途
WO2013039235A1 (ja) 2011-09-15 2013-03-21 富士フイルム株式会社 製版処理廃液のリサイクル方法
WO2013065853A1 (ja) 2011-11-04 2013-05-10 富士フイルム株式会社 製版処理廃液のリサイクル方法
KR20160102225A (ko) * 2013-12-20 2016-08-29 코베스트로 도이칠란트 아게 개선된 감광성을 갖는 홀로그래픽 매체
CN107207456B (zh) 2015-02-02 2021-05-04 巴斯夫欧洲公司 潜酸及其用途

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8515475D0 (en) * 1985-06-19 1985-07-24 Ciba Geigy Ag Forming images
EP0277915B1 (de) * 1987-02-02 1991-09-04 Ciba-Geigy Ag Photoinitiatorengemische enthaltend ein Titanocen und ein 3-Ketocoumarin
JPH0699497B2 (ja) * 1987-04-16 1994-12-07 富士写真フイルム株式会社 光重合性組成物
DE4007428A1 (de) * 1990-03-09 1991-09-12 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JPH04184344A (ja) * 1990-11-19 1992-07-01 Toyobo Co Ltd 光重合性組成物
US5322762A (en) * 1992-04-13 1994-06-21 Mitsubishi Rayon Co., Ltd. Photopolymerizable composition
DE59403359D1 (de) * 1993-05-14 1997-08-21 Ocg Microelectronic Materials Verfahren zur Herstellung von Reliefstrukturen durch i-Linien-Bestrahlung
KR0147207B1 (ko) * 1993-07-28 1998-08-17 단노 다께시 광개시제 조성물 및 그를 사용한 감광성 물질
US5738974A (en) * 1994-09-05 1998-04-14 Mitsubishi Chemical Corporation Photopolymerizable composition and photosensitive lithographic printing plate
US5609992A (en) * 1994-11-01 1997-03-11 Fuji Photo Film Co., Ltd. Photopolymerizable composition
EP0723167A3 (de) * 1995-01-17 1997-04-02 Mitsubishi Chem Corp Photopolymerisierbare Zusammensetzung für Farbfilter

Also Published As

Publication number Publication date
EP0747771A3 (de) 1998-03-18
JPH08334897A (ja) 1996-12-17
DE69618854T2 (de) 2002-07-11
US5801212A (en) 1998-09-01
EP0747771A2 (de) 1996-12-11
JP3441246B2 (ja) 2003-08-25
EP0747771B1 (de) 2002-01-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP